Anti-glare substrates with low sparkle, DOI and transmission haze

US10656454B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10656454-B2
Application numberUS-201515506053-A
CountryUS
Kind codeB2
Filing dateSep 4, 2015
Priority dateSep 8, 2014
Publication dateMay 19, 2020
Grant dateMay 19, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments of anti-glare substrates and articles including the same are disclosed. In one or more embodiments, the anti-glares substrate includes a textured surface with a plurality of features having an average cross-sectional dimension of about 30 micrometers or less. The substrate or article exhibits a transmission haze of 10% or less, a PPDr of about 7% or less or 6% or less, and a DOI of about 80 or less. Method for forming the anti-glare substrates are also disclosed and include etching a surface of a substrate with an etchant having low water solubility to provide an etched surface, and removing a portion of the etched surface. The method includes generating a plurality of insoluble crystals (e.g., any one or more of K 2 SiF 6 and K 3 AlF 6 ) on the surface while etching the surface. The etchant may include a potassium salt, an organic solvent and a fluoride containing acid.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming an antiglare surface comprising: etching a portion of a surface of a substrate with an etchant to provide an etched surface, the etchant exhibiting a water solubility of about 50 g/100 g water or less; and removing a portion of the etched surface to provide the anti-glare surface, wherein the substrate with the anti-glare surface exhibits a transmission haze 10% or less, and a pixel power deviation reference (PPDr) of about 6% or less, and the anti-glare surface exhibits a distinctiveness of image (DOI) of about 80 or less. 2. The method of claim 1 , further comprising generating a plurality of insoluble crystals on the surface while etching a portion of the surface. 3. The method of claim 2 , wherein the insoluble crystals comprise potassium. 4. The method of claim 2 , wherein the insoluble crystals exhibit a water solubility of less than about 10 g/100 g water. 5. The method of claim 2 , wherein the insoluble crystals comprise any one or more of K 2 SiF 6 and K 3 AlF 6 . 6. The method of claim 1 , wherein removing the portion of the etched surface comprises removing a thickness up to about 100 micrometers of the surface. 7. The method of claim 1 , wherein removing the portion of the etched surface comprises exposing the surface to a chemical polishing solution. 8. The method of claim 1 , wherein the etchant is removed prior to removing the portion of the etched surface. 9. The method of claim 1 , wherein the etchant comprises a potassium salt in an amount in the range from about 1 wt % to about 20 wt %, and the potassium salt comprises any one or more of potassium chloride (KCl), potassium nitrate (KNO 3 ), potassium sulfate (K 2 SO 4 ) and potassium acetate. 10. The method of claim 1 , wherein the etchant further comprises an organic solvent and a fluoride containing acid, and wherein the organic solvent is present in an amount in the range from about 0 wt % to about 40 wt %. 11. The method of claim 1 , wherein the etchant is substantially free of ammonium salt. 12. The method of claim 1 , wherein the etchant further comprises any one or more of ammonium fluoride (NH 4 F), an insoluble particle and a surfactant. 13. The method of claim 1 , wherein the substrate comprises an amorphous substrate or a crystalline substrate, and wherein the amorphous substrate comprises a glass selected from the group consisting of soda lime glass, alkali aluminosilicate glass, alkali containing borosilicate glass and alkali aluminoborosilicate glass. 14. The method of claim 13 , wherein the glass is chemically strengthened and comprises a compressive stress (CS) layer with a surface CS of at least 250 MPa extending within the chemically strengthened glass from a surface of the glass to a depth of layer (DOL) of at about 10 μm or greater. 15. The method of claim 14 , wherein the anti-glare surface comprises a textured surface comprising plurality of concave features having an opening facing outwardly from the surface, wherein the opening comprises an average cross-sectional dimension of about 30 micrometers or less.

Assignees

Inventors

Classifications

  • adapted to provide an additional optical effect, e.g. anti-reflection or filter · CPC title

  • Antiglare, refractive index matching layers · CPC title

  • C03C15/00Primary

    Surface treatment of glass, not in the form of fibres or filaments, by etching (etching or surface-brightening compositions, in general C09K13/00) · CPC title

  • to perform ion-exchange between alkali ions (C03C21/005 takes precedence) · CPC title

  • containing calcium oxide, e.g. common sheet or container glass · CPC title

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What does patent US10656454B2 cover?
Embodiments of anti-glare substrates and articles including the same are disclosed. In one or more embodiments, the anti-glares substrate includes a textured surface with a plurality of features having an average cross-sectional dimension of about 30 micrometers or less. The substrate or article exhibits a transmission haze of 10% or less, a PPDr of about 7% or less or 6% or less, and a DOI of …
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification G02F1/133502. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 19 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).