Non-transitory computer-readable medium and sewing data generation device

US10655260B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10655260-B2
Application numberUS-201816053319-A
CountryUS
Kind codeB2
Filing dateAug 2, 2018
Priority dateFeb 29, 2016
Publication dateMay 19, 2020
Grant dateMay 19, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A non-transitory computer-readable medium stores computer-readable instructions. The instructions, when executed, cause a processor of a sewing data generation device configured to generate sewing data to perform processes. The processes include acquiring pattern data to sew an embroidery pattern. The processes further include setting an outline having an offset portion and a complementary portion on the basis of the pattern data. The outline is a single line surrounding the outside of a contour of the embroidery pattern. The offset portion is a part of the single line and is offset from the contour toward the outside of the embroidery pattern by a predetermined amount. The complementary portion is another part of the single line and being offset from the contour toward the outside of the embroidery pattern by an amount larger than the predetermined amount. The processes also include generating sewing data to sew the outline.

First claim

Opening claim text (preview).

What is claimed is: 1. A non-transitory computer-readable medium storing computer-readable instructions that, when executed, instruct a processor of a sewing data generation device to perform processes comprising: acquiring pattern data to sew an embroidery pattern; setting an outline having an offset portion and a complementary portion based on the pattern data, the outline being a single line surrounding an outside of a contour of the embroidery pattern, the offset portion being a part of the single line and being offset from the contour toward the outside of the embroidery pattern by a predetermined amount, and the complementary portion being another part of the single line and being offset from the contour toward the outside of the embroidery pattern by an amount larger than the predetermined amount, the setting of the outline including: identifying a contour line of the embroidery pattern based on the pattern data, setting a virtual line on an outside of the contour line with respect to the embroidery pattern, and setting the outline having the offset portion that is offset from the contour line toward the outside of the embroidery pattern by the predetermined amount, and the complementary portion that is set based on the virtual line; and generating sewing data to sew the outline. 2. The non-transitory computer-readable medium according to claim 1 , wherein the setting of the virtual line includes setting the virtual line having a shape corresponding to a shape of the embroidery pattern. 3. The non-transitory computer-readable medium according to claim 2 , wherein the setting of the virtual line includes setting the virtual line having one of a circular shape or an arc shape. 4. The non-transitory computer-readable medium according to claim 1 , wherein: the setting of the virtual line includes setting the virtual line having a shape that intersects with a graphic corresponding to the contour line of the embroidery pattern, and the setting of the outline includes setting the outline by connecting the offset portion and the complementary portion at positions corresponding to intersection points of the graphic and the virtual line. 5. The non-transitory computer-readable medium according to claim 1 , wherein: the computer-readable instructions further instruct the processor to perform a process comprising identifying a size of a mask area that encompasses the embroidery pattern, and the setting of the virtual line includes setting the virtual line representing a graphic, the graphic having a size corresponding to the size of the mask area. 6. The non-transitory computer-readable medium according to claim 1 , wherein: the computer-readable instructions further instruct the processor to perform a process comprising detecting a concave portion included in a graphic corresponding to the contour line, and the setting of the virtual line includes setting the virtual line for the detected concave portion. 7. The non-transitory computer-readable medium according to claim 6 , wherein the setting of the virtual line includes setting the virtual line representing a virtual graphic, the virtual graphic having a size corresponding to a size of the concave portion. 8. The non-transitory computer-readable medium according to claim 1 , wherein the setting of the outline includes: identifying a convex hull graphic represented by a convex hull of an offset pattern, the offset pattern being offset from the contour of the embroidery pattern toward the outside of the embroidery pattern by the predetermined amount, and setting, as the offset portion, a portion of the convex hull graphic that overlaps with the offset pattern, and setting, as the complementary portion, a portion of the convex hull graphic that does not overlap with the offset pattern. 9. The non-transitory computer-readable medium according to claim 1 , wherein: the computer-readable instructions further instruct the processor to perform a process comprising detecting a concave portion included in a graphic corresponding to the contour line, and the setting of the outline includes setting the complementary portion at a position of the detected concave portion. 10. A sewing data generation device comprising: a processor; a memory configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes comprising: acquiring pattern data to sew an embroidery pattern; setting an outline having an offset portion and a complementary portion based on the pattern data, the outline being a single line surrounding an outside of a contour of the embroidery pattern, the offset portion being a part of the single line and being offset from the contour toward an outside of the embroidery pattern by a predetermined amount, and the complementary portion being another part of the single line and being offset from the contour toward the outside of the embroidery pattern by an amount larger than the predetermined amount, the setting of the outline including: identifying a contour line of the embroidery pattern based on the pattern data, setting a virtual line on an outside of the contour line with respect to the embroidery pattern, and setting the outline having the offset portion that is offset from the contour line toward the outside of the embroidery pattern by the predetermined amount, and the complementary portion that is set based on the virtual line; and generating sewing data to sew the outline. 11. The sewing data generation device according to claim 10 , wherein the setting of the virtual line includes setting the virtual line having a shape corresponding to a shape of the embroidery pattern. 12. The sewing data generation device according to claim 11 , wherein the setting of the virtual line includes setting the virtual line having one of a circular shape or an arc shape. 13. The sewing data generation device according to claim 10 , wherein: the setting of the virtual line includes setting the virtual line having a shape that intersects with a graphic corresponding to the contour line of the embroidery pattern, and the setting of the outline includes setting the outline by connecting the offset portion and the complementary portion at positions corresponding to intersection points of the graphic and the virtual line. 14. The sewing data generation device according to claim 10 , wherein: the computer-readable instructions further instruct the processor to perform a process comprising identifying a size of a mask area that encompasses the embroidery pattern, and the setting of the virtual line includes setting the virtual line representing a graphic, the graphic having a size corresponding to the size of the mask area. 15. The sewing data generation device according to claim 10 , wherein: the computer-readable instructions further instruct the processor to perform a process comprising detecting a concave portion included in a graphic corresponding to the contour line, and the setting of the virtual line includes setting the virtual line for the detected concave portion. 16. The sewing data generation device according to claim 15 , wherein the setting of the virtual line includes setting the virtual line representing a virtual graphic, the virtual having a size corresponding to a size of the concave portion. 17. The sewing data generation device according to claim 10 , wherein the setting of the outline includes: identifying a convex hull graphic represented by a convex hull of an offset pattern, the offset pattern being offset from the con

Assignees

Inventors

Classifications

  • electric · CPC title

  • Screens · CPC title

  • Operator to the machine · CPC title

  • D05C5/02Primary

    by electrical or magnetic control devices · CPC title

  • Arrangements for inputting stitch or pattern data to memory {; Editing stitch or pattern data} · CPC title

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What does patent US10655260B2 cover?
A non-transitory computer-readable medium stores computer-readable instructions. The instructions, when executed, cause a processor of a sewing data generation device configured to generate sewing data to perform processes. The processes include acquiring pattern data to sew an embroidery pattern. The processes further include setting an outline having an offset portion and a complementary port…
Who is the assignee on this patent?
Brother Ind Ltd
What technology area does this patent fall under?
Primary CPC classification D05C5/02. Mapped technology areas include Textiles & Paper.
When was this patent published?
Publication date Tue May 19 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).