Liquid processing apparatus

Patent metadata

Field	Value
Publication number	US-10654730-B2
Application number	US-201916262239-A
Country	US
Kind code	B2
Filing date	Jan 30, 2019
Priority date	May 16, 2018
Publication date	May 19, 2020
Grant date	May 19, 2020

Abstract

A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.

First claim

What is claimed is:

1. A liquid processing apparatus comprising:
a cylindrical processing tank of which a first end is closed;
a rod-shaped first electrode that is disposed at the first end of the processing tank;
an insulator that covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank;
a liquid introduction port that causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid;
a discharge portion that is disposed at a second end of the processing tank and discharges the liquid introduced from the liquid introduction port;
a plate-shaped second electrode that is disposed at the second end of the processing tank;
an opening portion that is formed in the second electrode with a central axis of the processing tank as a center; and
a power supply that applies a voltage between the first electrode and the second electrode,
wherein an outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.

2. The liquid processing apparatus of claim 1 ,
wherein the first electrode includes an exposed portion protruding from the insulator into the processing tank.

3. The liquid processing apparatus of claim 1 ,
wherein the outer diameter of the insulator is 0.1 mm or more, and is larger than 0% and 30% or less of a diameter of the opening portion.

4. The liquid processing apparatus of claim 2 ,
wherein the outer diameter of the insulator is 0.1 mm or more, and is larger than 0% and 30% or less of the diameter of the opening portion.

5. The liquid processing apparatus of claim 1 , further comprising:
an electrode support cylinder that supports the first electrode disposed to protrude from the inner wall of the first end of the processing tank into the processing tank,
wherein in the first electrode supported by the electrode support cylinder, a side surface of the first electrode in a vicinity of the electrode support cylinder, which is protruded from the electrode support cylinder, is covered with the insulator.

6. The liquid processing apparatus of claim 2 , further comprising:
an electrode support cylinder that supports the first electrode disposed to protrude from the inner wall of the first end of the processing tank into the processing tank,
wherein in the first electrode supported by the electrode support cylinder, a side surface of the first electrode in a vicinity of the electrode support cylinder, which is protruded from the electrode support cylinder, is covered with the insulator.

7. The liquid processing apparatus of claim 3 , further comprising:
an electrode support cylinder that supports the first electrode disposed to protrude from the inner wall of the first end of the processing tank into the processing tank,
wherein in the first electrode supported by the electrode support cylinder, a side surface of the first electrode in a vicinity of the electrode support cylinder, which is protruded from the electrode support cylinder, is covered with the insulator.

8. The liquid processing apparatus of claim 4 , further comprising:
an electrode support cylinder that supports the first electrode disposed to protrude from the inner wall of the first end of the processing tank into the processing tank,
wherein in the first electrode supported by the electrode support cylinder, a side surface of the first electrode in a vicinity of the electrode support cylinder, which is protruded from the electrode support cylinder, is covered with the insulator.

Assignees

• Panasonic Ip Man Co Ltd

Inventors

• Matsuda Genichiro
• MIYAKE Gaku
• Matsumoto Hiromi
• Yamada Yoshio
• Kitahara Yukiko

Classifications

• B01J2219/0877

  Liquid · CPC title

• B01J19/123

  Ultraviolet light · CPC title

• C02F1/4608 Primary

  using electrical discharges · CPC title

• B01J2219/0809

  employing two or more electrodes · CPC title

• C02F2303/04

  Disinfection · CPC title