Transparent conductive film-equipped glass substrate and method for manufacturing same

US10651404B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10651404-B2
Application numberUS-201615535744-A
CountryUS
Kind codeB2
Filing dateJan 8, 2016
Priority dateMar 10, 2015
Publication dateMay 12, 2020
Grant dateMay 12, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a transparent conductive film-equipped glass substrate that, during patterning by laser of a transparent conductive film formed on an underlying glass layer, can prevent the transparent conductive film or the underlying glass layer from being discolored or damaged, and a manufacturing method thereof. A transparent conductive film-equipped glass substrate 6 includes a glass substrate, an underlying glass layer provided on the glass substrate, and a transparent conductive film 3 provided on the underlying glass layer and subjected to patterning by laser. The underlying glass layer has an absorptance of a wavelength of the laser lower than the transparent conductive film 3 and higher than the glass substrate. A patterned region 10 formed by removing part of the transparent conductive film 3 by the patterning by laser includes a first linear portion 11 , a second linear portion 12 , and a connecting portion 13 connecting between the first linear portion 11 and the second linear portion 12 . The first linear portion 11 and the second linear portion 12 form an angle of 120° or less with each other. The connecting portion 13 has a radius of curvature of 0.5 mm or more.

First claim

Opening claim text (preview).

The invention claimed is: 1. A transparent conductive film-equipped glass substrate including a glass substrate, an underlying glass layer provided on the glass substrate, and a transparent conductive film provided on the underlying glass layer and subjected to patterning by laser, the underlying glass layer having an absorptance of a wavelength of the laser lower than the transparent conductive film and higher than the glass substrate, wherein a patterned region formed by removing part of the transparent conductive film by the patterning by laser includes a first linear portion, a second linear portion, and a connecting portion connecting between the first linear portion and the second linear portion, the first linear portion and the second linear portion form an angle of 120° or less with each other, and the connecting portion has a radius of curvature of 0.5 mm or more, and a refractive index of the underlying glass layer is higher than a refractive index of the glass substrate such that the refractive index of the underlying glass layer is closer to a refractive index of the transparent conductive film than is the refractive index of the glass substrate so that light reflected at an interface between the underlying glass layer and the transparent conductive film is reduced. 2. The transparent conductive film-equipped glass substrate according to claim 1 , wherein the underlying glass layer contains bismuth-based glass. 3. The transparent conductive film-equipped glass substrate according to claim 1 , wherein the laser is femtosecond laser. 4. The transparent conductive film-equipped glass substrate according to claim 1 , wherein asperities are formed on a surface of the glass substrate on which the underlying glass layer is provided. 5. The transparent conductive film-equipped glass substrate according to claim 1 , being a glass substrate for an organic electroluminescent device. 6. The transparent conductive film-equipped glass substrate according to claim 1 , wherein the angle formed by the first linear portion and the second linear portion is within a range of 80° to 120°. 7. The transparent conductive film-equipped glass substrate according to claim 1 , wherein the radius of curvature of the connecting portion is within a range of 0.5 mm to 5.0 mm. 8. A method for manufacturing the transparent conductive film-equipped glass substrate according to claim 1 , the method comprising the steps of: producing the glass substrate on which the transparent conductive film before being subjected to the patterning is formed on the underlying glass layer; and applying the laser to the transparent conductive film to scan the first linear portion, the connecting portion, and the second linear portion in this order or reverse order with the laser, thus forming the patterned region.

Assignees

Inventors

Classifications

  • characterised by the composition or arrangement of the conductive material used as an electrode · CPC title

  • Transparent · CPC title

  • Partly or completely removing a coating · CPC title

  • Coatings having a rough surface · CPC title

  • for trimming or tuning of electrical components · CPC title

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Frequently asked questions

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What does patent US10651404B2 cover?
Provided is a transparent conductive film-equipped glass substrate that, during patterning by laser of a transparent conductive film formed on an underlying glass layer, can prevent the transparent conductive film or the underlying glass layer from being discolored or damaged, and a manufacturing method thereof. A transparent conductive film-equipped glass substrate 6 includes a glass substra…
Who is the assignee on this patent?
Nippon Electric Glass Co
What technology area does this patent fall under?
Primary CPC classification C03C3/064. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 12 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).