Cold gas dynamic spraying using a mask

US10648085B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10648085-B2
Application numberUS-201615546440-A
CountryUS
Kind codeB2
Filing dateJan 13, 2016
Priority dateFeb 4, 2015
Publication dateMay 12, 2020
Grant dateMay 12, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to coating a carrier component by means of cold gas dynamic spraying. For example, a method for coating a carrier component may include: laying a mask with an opening on the component; depositing a material through the opening to completely fill up the mask opening; removing any material located above the upper side to form a flat surface even with the upper side of the mask; laying a second mask on the first mask; depositing the material again; removing any deposited material located above the upper side of the second mask to form a flat surface even with the upper side of the second mask; repeating layers of additional masks and material deposition until the deposited material reaches a required thickness on the carrier component; and after completion of the coating to the required thickness, removing the masks.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for coating a carrier component with cold gas dynamic spraying, the method comprising: laying a first mask with a first opening upon the carrier component; depositing a material through the first opening of the first mask onto the carrier component; after deposition of the material, removing any deposited material located above a level of an upper side of the first mask forming a flat surface in the region of the first opening even with the level of the upper side of the first mask; determining whether the sprayed surface inside the first opening of the first mask aligns with the upper side of the first mask and, if not, depositing additional material through the first opening; laying a second mask with a second opening on the upper side of the first mask; depositing the material upon the material previously deposited; after deposition of the material through the second mask, removing any deposited material located above a level of the upper side of the second mask forming a flat surface in the region of the second opening even with the level of the upper side of the second mask; determining whether the sprayed surface inside the second opening of the second mask aligns with the upper side of the second mask and, if not, depositing additional material through the second opening; repeating layers of additional masks and material deposition until the deposited material reaches a required thickness on the carrier component; and after the deposited material reaches the required thickness, removing the masks and leaving a coating in place; wherein at least one of the masks comprises a multiplicity of parts, and parting lines extend from an outer edge of the mask to the respective mask opening so that the multiplicity of parts can be pulled apart in a direction parallel to their upper side and reused in later material deposition processes. 2. The method as claimed in claim 1 , further comprising separating the coating from the carrier component. 3. The method as claimed in claim 1 , wherein at least some of the masks have a thickness of at most 1 mm. 4. The method as claimed in claim 3 , wherein: the openings of each mask have widths of at most 1 mm at least in one direction; and each of the masks has a thickness of at most 1 mm. 5. The method as claimed in claim 1 , wherein each of the masks has a ratio of at most 1 between thickness of the mask and smallest width of the mask opening. 6. The method as claimed in claim 1 , wherein consecutive masks have congruent openings. 7. The method as claimed in claim 1 , wherein at least one of the masks is filled up in more than one deposition step, and, after the respective steps of depositing the material any deposited material located above the level of the upper side of the respective mask is removed. 8. The method as claimed in claim 1 , wherein a thickness of at least one of the masks corresponds to the deposition process used to completely fill up the respective opening with the material; and further comprising subsequently testing the coating formed in comparison to a required quality. 9. The method as claimed in claim 8 , wherein the determined, suitable thickness of the masks together with testing parameters of the coating are stored in a data bank. 10. The method as claimed in claim 1 , wherein a shape of the mask openings, including a mask thickness, depends at least in part on geometry of the component broken down by computer calculation into disks lying one on top of the other. 11. The method as claimed in claim 1 , wherein consecutive masks have openings which lie completely one on top of the other and reduce in size as the additional masks are added.

Assignees

Inventors

Classifications

  • C23C24/04Primary

    Impact or kinetic deposition of particles · CPC title

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Frequently asked questions

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What does patent US10648085B2 cover?
The present disclosure relates to coating a carrier component by means of cold gas dynamic spraying. For example, a method for coating a carrier component may include: laying a mask with an opening on the component; depositing a material through the opening to completely fill up the mask opening; removing any material located above the upper side to form a flat surface even with the upper side …
Who is the assignee on this patent?
Siemens Ag
What technology area does this patent fall under?
Primary CPC classification C23C24/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 12 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).