System and method for adjusting a material bed depth in a pulverizer mill

US10646877B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10646877-B2
Application numberUS-201715457106-A
CountryUS
Kind codeB2
Filing dateMar 13, 2017
Priority dateMar 13, 2017
Publication dateMay 12, 2020
Grant dateMay 12, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system for adjusting a depth of a material bed in a pulverizer mill is provided. The system includes a rotatable bowl, an extension ring, and an extension mechanism. The rotatable bowl has a surface operative to support the material bed while the bowl rotates such that particles of the material bed are pulverized against the surface by one or more grinding rollers of the pulverizer mill. The extension ring is disposed about a circumference of the rotatable bowl extending away from the surface and defines a depth of the material bed. The extension mechanism adjusts at least one of the extension ring and the rotatable bowl while the rotatable bowl rotates. Adjusting at least one of the extension ring and the rotatable bowl via the extension mechanism moves the extension ring in relation to the surface so as to adjust the depth of the material bed.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for adjusting a depth of a material bed in a pulverizer mill comprising: a rotatable bowl having a surface operative to support the material bed while the bowl rotates such that particles of the material bed are pulverized against the surface by one or more grinding rollers of the pulverizer mill; an extension ring disposed about a circumference of the rotatable bowl extending away from the surface and operative to define the depth of the material bed with respect to the surface; an extension mechanism operative to adjust the extension ring while the rotatable bowl rotates; and wherein adjusting the extension ring via the extension mechanism moves the extension ring in relation to the surface of the rotatable bowl so as to adjust the depth of the material bed. 2. The system of claim 1 , wherein the extension mechanism includes at least one of a hydraulic lift and a pneumatic lift. 3. The system of claim 1 , wherein the extension mechanism includes at least one of an electric motor and a hydraulic motor. 4. The system of claim 1 , wherein a vane wheel of the pulverizer mill is secured to the rotatable bowl. 5. The system of claim 1 , wherein the rotatable bowl rotates in a fixed location with respect to a body of the mill, and the extension mechanism adjusts the extension ring. 6. The system of claim 1 further comprising: a controller operative to adjust the depth of the material bed via the extension mechanism based at least in part on data collected by one or more sensors disposed within the pulverizer mill and in electronic communication with the controller, wherein the data concerns at least one of: a mill pressure drop; a mill drive motor power level; a classifier drive motor power level; a material flow rate; a primary air flow rate; a primary air temperature; a vibration level; a desired material fineness; a moisture content of the material bed; a bowl pressure drop; and a journal grinding force. 7. The system of claim 6 , wherein the controller is further operative to regulate the depth of the material bed so as to optimize the material flow rate while minimizing at least one of: the mill pressure drop; the mill drive motor power level; the classifier drive motor power level; the primary air flow rate; the vibration level; and the journal grinding force. 8. The system of claim 1 , wherein the extension mechanism includes at least one of a hydraulic lift and a pneumatic lift. 9. The system of claim 1 , wherein the extension mechanism includes at least one of an electric motor and a hydraulic motor. 10. A system for adjusting a depth of a material bed in a pulverizer mill comprising: a rotatable bowl having a surface operative to support the material bed while the bowl rotates such that particles of the material bed are pulverized against the surface by one or more grinding rollers of the pulverizer mill; an extension ring disposed about a circumference of the rotatable bowl extending away from the surface and operative to define the depth of the material bed with respect to the surface; an extension mechanism operative to adjust the extension ring, the extension mechanism including at least one of a hydraulic lift, a pneumatic lift, an electric motor, and a hydraulic motor; and wherein adjusting the extension ring via the extension mechanism moves the extension ring in relation to the surface so as to adjust the depth of the material bed. 11. The system of claim 10 , wherein a vane wheel of the pulverizer mill is secured to the rotatable bowl. 12. The system of claim 11 , wherein the rotatable bowl rotates in a fixed location with respect to a body of the mill, and the extension mechanism adjusts the extension ring. 13. The system of claim 12 further comprising: a controller operative to adjust the depth of the material bed via the extension mechanism based at least in part on data collected by one or more sensors disposed within the pulverizer mill and in electronic communication with the controller, wherein the data concerns at least one of: a mill pressure drop; a mill drive motor power level; a classifier drive motor power level; a material flow rate; a primary air flow rate; a primary air temperature; a vibration level; a desired material fineness; a moisture content of the material bed; a bowl pressure drop; and a journal grinding force. 14. The system of claim 13 , wherein the controller is further operative to regulate the depth of the material bed so as to optimize the material flow rate while minimizing at least one of: the mill pressure drop; the mill drive motor power level; the classifier drive motor power level; the primary air flow rate; the vibration level; and the journal grinding force. 15. A system for adjusting a depth of a material bed in a pulverizer mill comprising: a rotatable bowl having a surface operative to support the material bed while the bowl rotates such that particles of the material bed are pulverized against the surface by one or more grinding rollers of the pulverizer mill; an extension ring disposed about a circumference of the rotatable bowl extending away from the surface and operative to define the depth of the material bed with respect to the surface; an extension mechanism operative to adjust the rotatable bowl while the rotatable bowl rotates; and wherein adjusting the rotatable bowl via the extension mechanism moves the surface of the rotatable bowl in relation to the extension ring so as to adjust the depth of the material bed.

Assignees

Inventors

Classifications

  • B02C15/007Primary

    Mills with rollers pressed against a rotary horizontal disc (with pendularly mounted rollers B02C15/04) · CPC title

  • pressed against the interior of a ring rotating in a vertical plane · CPC title

  • Air flow directing means positioned on the periphery of the horizontally rotating milling surface · CPC title

  • Control arrangements specially adapted for crushing or disintegrating · CPC title

  • combined with a classifier · CPC title

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What does patent US10646877B2 cover?
A system for adjusting a depth of a material bed in a pulverizer mill is provided. The system includes a rotatable bowl, an extension ring, and an extension mechanism. The rotatable bowl has a surface operative to support the material bed while the bowl rotates such that particles of the material bed are pulverized against the surface by one or more grinding rollers of the pulverizer mill. The …
Who is the assignee on this patent?
General Electric Technology Gmbh
What technology area does this patent fall under?
Primary CPC classification B02C15/007. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 12 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).