Structure and method of metal wraparound for low via resistance

US10636737B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10636737-B2
Application numberUS-201816106679-A
CountryUS
Kind codeB2
Filing dateAug 21, 2018
Priority dateAug 21, 2018
Publication dateApr 28, 2020
Grant dateApr 28, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device includes a contact via and a metal interconnect on the contact via. The metal interconnect has a portion extending in a lengthwise direction that is wrapped around and in contact with a sidewall of the contact via. Along a widthwise direction, the metal interconnect does not contact the sidewall of the contact via.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device, comprising: a contact via; and a metal interconnect on the contact via, the metal interconnect having a portion extending in a lengthwise direction wrapped around and in contact with a sidewall of the contact via, wherein along a widthwise direction the metal interconnect does not contact the sidewall of the contact via. 2. The semiconductor device of claim 1 , wherein the portion of the metal interconnect extending in the lengthwise direction wrapped around and in contact with the sidewall of the contact via overlaps the contact via by a wrap depth in the range of 1 nm to 40 nm. 3. The semiconductor device of claim 1 , wherein the metal interconnect is comprised of a metal selected from the group consisting of tungsten, cobalt, ruthenium, and copper. 4. The semiconductor device of claim 1 , wherein the metal interconnect is a first back-end-of-line metal layer, and the contact via couples the metal interconnect with a middle-of-line contact. 5. The semiconductor device of claim 1 integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, and/or a fixed location data unit.

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Frequently asked questions

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What does patent US10636737B2 cover?
A semiconductor device includes a contact via and a metal interconnect on the contact via. The metal interconnect has a portion extending in a lengthwise direction that is wrapped around and in contact with a sidewall of the contact via. Along a widthwise direction, the metal interconnect does not contact the sidewall of the contact via.
Who is the assignee on this patent?
Qualcomm Inc
What technology area does this patent fall under?
Primary CPC classification H01L23/5226. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 28 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).