Heater, image forming apparatus, and manufacturing method of heater

US10627753B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10627753-B2
Application numberUS-201715457415-A
CountryUS
Kind codeB2
Filing dateMar 13, 2017
Priority dateJun 24, 2016
Publication dateApr 21, 2020
Grant dateApr 21, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A heater according to an embodiment includes a substrate that is formed of a heat resistant insulating material, a heating resistor that is provided on the substrate, a conductor that is provided on the substrate and that is electrically connected to the heating resistor, and a coating film that covers the heating resistor and the conductor. A plurality of groove portions are arranged on an end surface of the substrate along an outer periphery of the substrate, and a coefficient A=100×D/(T×P) satisfies 0.4≤A≤0.9 where T [μm] is the thickness of the substrate, D [μm] is the depth of the groove portion in a thickness direction of the substrate, and P [μm] is a pitch between the groove portions.

First claim

Opening claim text (preview).

What is claimed is: 1. A heater comprising: a substrate that is formed of a heat resistant insulating ceramic material, and is provided with one main surface and an other main surface opposite to the one main surface; a heating resistor that is provided on the one main surface of the substrate; a conductor that is provided on the one main surface of the substrate and that is electrically connected to the heating resistor; and a coating film that covers the heating resistor and the conductor, wherein a plurality of grooves are formed on an end surface of the substrate in a direction from the other main surface to the one main surface, and are arranged along an outer periphery of the substrate, and wherein a coefficient A=100×D/(T×P) satisfies 0.4≤A≤0.9 where T [μm] is the thickness of the substrate, D [μm] is the depth of the groove in a thickness direction of the substrate, and P [μm] is a pitch between the plurality of grooves, wherein the plurality of grooves satisfies (D/T)×100≤31. 2. An image forming apparatus comprising: the heater according to claim 1 that heats a medium; and a pressure roller that pressurizes the medium which is heated by the heater, wherein a toner, which is adhered to the medium, is fixed by the heater and the pressure roller. 3. The heater according to claim 1 , wherein material of the substrate is any one of alumina, aluminum nitride, or silicon nitride. 4. The heater according to claim 1 , wherein the thickness T [μm] of the substrate is 500 [μm] to 1000 [μm]. 5. A manufacturing method of a heater, comprising: forming a heating resistor and a conductor, which is electrically connected to the heating resistor, on one main surface of a substrate, which has the one main surface and an other main surface opposite to the one main surface and which is formed of a heat resistant insulating ceramic material, and covering the heating resistor and the conductor with a coating film; forming a plurality of grooves in a direction from the other main surface to the one main surface, and forming a groove line, in which the plurality of grooves are arranged, by irradiating the other main surface of the substrate with laser light; and splitting the substrate along the groove line, wherein a groove in which a coefficient A=100×D/(T×P) satisfies 0.4<A<0.9 is formed in the forming of the groove line where T [pm] is the thickness of the substrate, D [pm] is the depth of the groove in a thickness direction of the substrate, and P [pm] is a pitch between the grooves, wherein the plurality of grooves satisfies (D/T)×100≤31.

Assignees

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Classifications

  • Structural details of heat elements, e.g. structure of roller or belt, eddy current, induction heating · CPC title

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What does patent US10627753B2 cover?
A heater according to an embodiment includes a substrate that is formed of a heat resistant insulating material, a heating resistor that is provided on the substrate, a conductor that is provided on the substrate and that is electrically connected to the heating resistor, and a coating film that covers the heating resistor and the conductor. A plurality of groove portions are arranged on an end…
Who is the assignee on this patent?
Toshiba Lighting & Technology
What technology area does this patent fall under?
Primary CPC classification G03G15/2053. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 21 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).