Exhaust gas purification device

US10626765B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10626765-B2
Application numberUS-201716090723-A
CountryUS
Kind codeB2
Filing dateMar 21, 2017
Priority dateApr 7, 2016
Publication dateApr 21, 2020
Grant dateApr 21, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An exhaust gas purification device includes: a substrate of wall-flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer provided inside the partition wall and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate; and a downstream catalyst layer provided inside the partition wall and disposed in a downstream portion, including an exhaust gas outflow end section, of the substrate. The downstream catalyst layer contains a carrier, and Rh supported on the carrier. The upstream catalyst layer contains a carrier, and Pd and/or Pt supported on the carrier.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gasoline engine exhaust gas purification device that is disposed in an exhaust passage of a gasoline engine and that purifies exhaust gas emitted by the gasoline engine, the device comprising: a substrate of wall-flow structure having an inlet cell in which only an exhaust gas inflow end section is open, an outlet cell which is adjacent to the inlet cell and in which only an exhaust gas outflow end section is open, and a porous partition wall that partitions the inlet cell and the outlet cell from each other; an upstream catalyst layer provided inside the partition wall, such that out of a total amount of the upstream catalyst layer provided on a surface of the partition wall and inside the partition wall, an amount of the upstream catalyst layer that is present inside the partition wall is 95% or higher of the total amount, and disposed in an upstream portion of the substrate in a direction of exhaust gas flow, the upstream portion including the exhaust gas inflow end section; and a downstream catalyst layer provided inside the partition wall, such that out of a total amount of the downstream catalyst layer provided on a surface of the partition wall and inside the partition wall, an amount of the upstream catalyst layer that is present inside the partition wall is 95% or higher of the total amount, and disposed in a downstream portion of the substrate in the direction of exhaust gas flow, the downstream portion including the exhaust gas outflow end section, wherein the downstream catalyst layer contains a first carrier, and Rh supported on the first carrier; and the upstream catalyst layer contains a second carrier, and at least one of Pd and Pt supported on the second carrier. 2. The exhaust gas purification device according to claim 1 , wherein a proportion of a coating amount of the upstream catalyst layer is 30% to 60%, with respect to 100% as a total of the coating amount of the upstream catalyst layer and a coating amount of the downstream catalyst layer per L of volume of the substrate. 3. The exhaust gas purification device according to claim 1 , wherein the upstream catalyst layer is formed in a portion corresponding to 20% to 80% of a length of the substrate, from the exhaust gas inflow end section of the substrate towards the downstream side, and the downstream catalyst layer is formed in a portion corresponding to 20% to 80% of the length of the substrate, from the exhaust gas outflow end section of the substrate towards the upstream side. 4. The exhaust gas purification device according to claim 1 , wherein the upstream catalyst layer is formed so as not to overlap the downstream catalyst layer, in a length direction of the substrate. 5. The exhaust gas purification device according to claim 1 , wherein in a thickness direction of the partition wall, the upstream catalyst layer is unevenly distributed within the partition wall, so as to be in contact with the inlet cell and not in contact with the outlet cell, and the downstream catalyst layer is unevenly distributed within the partition wall, so as to be in contact with the outlet cell and not in contact with the inlet cell. 6. The exhaust gas purification device according to claim 5 , wherein the upstream catalyst layer is formed in a portion corresponding to 30% to 70% of the thickness of the partition wall, from a surface of the partition wall in contact with the inlet cell towards the outlet cell, and the downstream catalyst layer is formed in a portion corresponding to 30% to 70% of the thickness of the partition wall, from a surface of the partition wall in contact with the outlet cell towards the inlet cell.

Assignees

Inventors

Classifications

  • in different zones · CPC title

  • Iridium · CPC title

  • by means of filters · CPC title

  • Coatings comprising several layers · CPC title

  • characterised by structure, by material or by manufacturing of catalyst support · CPC title

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What does patent US10626765B2 cover?
An exhaust gas purification device includes: a substrate of wall-flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer provided inside the partition wall and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate; and a downstream catalyst layer provided inside the partition wall and disposed in a down…
Who is the assignee on this patent?
Cataler Corp
What technology area does this patent fall under?
Primary CPC classification F01N3/022. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Apr 21 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).