Nanostructured layer for graded index freeform optics

Patent metadata

Field	Value
Publication number	US-10612145-B2
Application number	US-201715625258-A
Country	US
Kind code	B2
Filing date	Jun 16, 2017
Priority date	Jun 16, 2017
Publication date	Apr 7, 2020
Grant date	Apr 7, 2020

Abstract

The present disclosure relates to a method for creating an optical component having a spatially controlled refractive index. The method may involve applying a thin metal material layer to a substrate. The thin metal material layer may then be heated to create a mask having a spatially varying nano-particle distribution. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate.

First claim

What is claimed is:

1. A method for creating an optical component having a spatially controlled, varying pattern of refractive index over an area of the optical component, the method comprising:
applying a thin metal material layer to a substrate;
heating the thin metal material layer using a predetermined, spatially controlled irradiation profile, using pixels representing specific 2D areas, to create a mask having a controlled, varying nano-particle distribution which varies spatially over the area of the mask; and
etching the substrate through the mask to imprint a spatially patterned and spatially varying nanostructure pattern on a surface of the substrate, in accordance with the controlled, spatially varying nano-particle distribution of the mask, to thus transfer the nanostructured pattern of the mask onto the substrate, to form the optical component with a refractive index which varies over its area.

2. The method of claim 1 , further comprising removing the mask from the substrate.

3. The method of claim 1 , wherein the de-wetting of the thin metal material layer comprises using a laser to apply the spatially controlled irradiation to achieve de-wetting of the thin metal layer to form the mask.

4. The method of claim 3 , wherein the laser is raster scanned over the mask.

5. The method of claim 4 , wherein overlapping raster scanned passes of the laser are used to irradiate the thin metal layer to de-wet the thin metal layer.

6. The method of claim 1 , wherein the de-wetting of the thin metal layer is performed using at least one light emitting diode (LED).

7. The method of claim 1 , wherein the de-wetting of the thin metal layer is performed using thermal processing.

8. The method of claim 1 , wherein the etching comprises performing a dry etching process to imprint the spatially patterned nanostructure pattern on the surface.

9. The method of claim 8 , wherein the dry etching process comprises a reactive ion etching (RIE) process.

10. The method of claim 1 , wherein the etching comprises performing a wet etching process.

11. A method for creating an optical component having a spatially controlled, varying refractive index which varies controllably over an area of the optical component, the method comprising:
applying a thin metal layer to a substrate;
de-wetting the thin metal layer by using an optical signal having an energy temporal deposition profile which is controlled to vary over an area of the thin metal layer, using pixels representing specific 2D areas, to create a mask having a controlled, spatially varying nano-particle distribution that varies spatially in a controlled pattern over an area of the mask, such that the controlled, spatially varying nano-particle distribution imparts different mask 16 and masked area throughout the mask;
etching the substrate using the mask to imprint a spatially patterned, and spatially varying nanostructure pattern on a surface of the substrate, in accordance with the controlled, spatially varying nano-particle distribution of the mask, to thus transfer the mask to the surface of the substrate; and
removing the mask to form an optical component having a refractive index which varies over its area.

12. The method of claim 11 , wherein the de-wetting of the thin metal material layer comprises using a laser to generate the optical signal to achieve de-wetting of the thin metal layer to form the mask.

13. The method of claim 12 , wherein the laser is raster scanned over the mask.

14. The method of claim 13 , wherein overlapping raster scanned passes of the laser are used to irradiate the thin metal layer to de-wet the thin metal layer.

15. The method of claim 11 , wherein the de-wetting of the thin metal layer is performed using at least one light emitting diode (LED).

16. The method of claim 11 , wherein the etching comprises performing a dry etching process to imprint the spatially patterned nanostructure pattern on the surface.

17. The method of claim 16 , wherein the dry etching process comprises a reactive ion etching (RIE) process.

18. The method of claim 11 , wherein the etching comprises a wet etching process.

19. A method for creating an optical component having a spatially controlled and spatially varying refractive index over an area of the optical component, the method comprising:
applying a thin metal layer to a substrate;
using a laser having a controlled energy temporal deposition profile, using pixels representing specific 2D areas, to perform de-wetting of the thin metal layer to create a mask having a spatially controlled and spatially varying nano-particle distribution which is varied controllably over an area of the mask, to create different thicknesses and widths throughout the mask;
using reactive ion etching to dry etch the substrate, and using the mask to control the etching, to imprint a spatially controlled, graded index surface on the substrate which varies spatially over the area of the optical component, in accordance with the controlled, spatially varying nano-particle distribution of the mask, to thus transfer the mask to the surface of the substrate; and
removing the mask to form an optical component having a refractive index which varies over its area.

Assignees

• L Livermore Nat Security Llc

Inventors

• Feigenbaum Eyal

Classifications

• B41J2/1629

  wet etching · CPC title

• C23F1/00 Primary

  Etching metallic material by chemical means (manufacture of printing surfaces B41C; manufacture of printed circuits H05K) · CPC title

• B41J2/1626

  etching · CPC title

• B41J2/1628

  dry etching · CPC title

• G02B1/00

  Optical elements characterised by the material of which they are made; Optical coatings for optical elements · CPC title