Nadic anhydride polymers and photosensitive compositions derived therefrom

US10591818B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10591818-B2
Application numberUS-201715662372-A
CountryUS
Kind codeB2
Filing dateJul 28, 2017
Priority dateJul 28, 2016
Publication dateMar 17, 2020
Grant dateMar 17, 2020

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.

First claim

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What is claimed is: 1. A copolymer consisting of a first repeat unit which is derived from a monomer selected from the group consisting of: 3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione (nadic anhydride); and 5-methyl-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione; and a second repeat unit which is derived from a monomer selected from the group consisting of: 2-(bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethyl acetate (NBCH 2 GlyOAc); 2-(bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethanol (NBCH 2 GlyOH); trioxanonanenorbornene (NBTON); tetraoxadodecanenorbomnene (NBTODD); 5-(3-methoxybutoxy)methyl-2-norbornene (NB-3-MBM); 5-(3-methoxypropoxy)methyl-2-norbornene (NB-3-MPM); 5-(2-(2-ethoxyethoxy)ethyl)bicyclo[2.2.1]hept-2-ene; 5-(2-(2-(2-propoxyethoxy)ethoxy)ethoxy)bicyclo[2.2.1]hept-2-ene; 2-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1,3,3,3-hexafluoropropan-2-ol (HFANB); 4-(bicyclo[2.2.1]hept-5-en-2-yl)-1,1,1-trifluoro-2-(trifluoromethyl)butan-2-ol (HFACH 2 NB); 5-(bicyclo[2.2.1]hept-5-en-2-yl)-1,1,1-trifluoro-2-(trifluoromethyl)pentan-2-ol (HFACH 2 CH 2 NB); 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)-1,1,1,3,3,3-hexafluoropropan-2-ol; and 2-((2-(bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethoxy)methyl)-1,1,1,3,3,3-hexafluoropropan-2-ol (GlyHFIPNB). 2. A terpolymer consisting of a first repeat unit which is derived from a monomer selected from the group consisting of: 3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione (nadic anhydride); and 5-methyl-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione; and a second re eat unit which is derived from a monomer selected from the group consisting of: 2-(bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethyl acetate (NBCH 2 GlyOAc); 2-(bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethanol (NBCH 2 GlyOH); trioxanonanenorbornene (NBTON); tetraoxadodecanenorbornene (NBTODD); 5-(3-methoxybutoxy)methyl-2-norbornene (NB-3-MBM); 5-(3-methoxypropoxy)methyl-2-norbornene (NB3-MPM); 5-(2-(2-(2-propoxyethoxy)ethoxy)ethoxy)bicyclo[2.2.1]hept-2-ene; 2-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1,3,3,3-hexafluoropropan-2-ol (HFANB); 4-(bicyclo[2.2.1]hept-5-en-2-yl)-1,1,1-trifluoro-2-(trifluoromethyl)butan-2-ol (HFACH 2 NB); 5-bicyclo[2.2.1]hept-5-en-2-yl)-1,1,1-trifluoro-2-(trifluoromethyl)pentan-2-ol (HFACH 2 CH 2 NB); 2-((bicyclo[2.2.1]hept-5-en-2-ylmethoxy)methyl)-1,1,1,3,3,3-hexafluoropropan-2-ol; and 2-((2-bicyclo[2.2.1]hept-5-en-2-ylmethoxy)ethoxy)methyl)-1,1,1,3,3,3-hexafluoropropan-2-ol (GlyHFIPNB); and a third repeat unit which is derived from a monomer selected from the group consisting of: bicyclo[2.2.1]hept-2-ene (NB); 5-methylbicyclo[2.2.1]hept-2-ene (MeNB); 5-ethylbicyclo[2.2.1]hept-2-ene (EtNB); 5-hexylbicyclo[2.2.1]hept-2-ene (HexNB); 5-octylbicyclo[2.2.1]hept-2-ene (OctNB); 5-decylbicyclo[2.2.1]hept-2-ene (DecNB); 5-(hex-5-en-1-yl)bicyclo[2.2.1]hept-2-ene (HexenylNB); bicyclo[2.2.1]hept-5-en-2-ylmethanamine; tert-butyl (bicyclo[2.2.1]hept-5-en-2-ylmethyl)carbamate; tert-butyl 4-((bicyclo[2.2.1]hept-5-en-2-ylmethyl)amino)-4-oxobutanoate; (E)-4-((bicyclo[2.2.1]hept-5-en-2-ylmethyl)amino)-2,3-di methyl-4-oxobut-2-enoic acid; N-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-2,3,4,5,7-pentahydroxyheptan

Assignees

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Classifications

  • Photolithographic processes · CPC title

  • Treatment after imagewise removal, e.g. baking · CPC title

  • characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides · CPC title

  • Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

  • Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence) · CPC title

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What does patent US10591818B2 cover?
Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhi…
Who is the assignee on this patent?
Promerus Llc
What technology area does this patent fall under?
Primary CPC classification C08F232/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).