Rotational plasma generator and methods for treating thin-film fluids
US-2024424468-A1 · Dec 26, 2024 · US
US10589252B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10589252-B2 |
| Application number | US-201816205941-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 30, 2018 |
| Priority date | Mar 14, 2013 |
| Publication date | Mar 17, 2020 |
| Grant date | Mar 17, 2020 |
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A reactor system that includes a single reactor or a plurality of parallel reactors. A method that includes injecting a mixture including liquid water and a gas, into at least one electrically-conductive inlet capillary tube of a continuously-flowing plasma reactor to generate a flowing liquid film region on one or more internal walls of the continuously-flowing plasma reactor with a gas stream flowing through the flowing liquid film region; propagating a plasma discharge along the flowing liquid film region from at least one electrically-conductive inlet capillary to an electrically-conductive outlet capillary tube at an opposing end of the continuously-flowing plasma reactor; dissociating the liquid water in the plasma discharge to form a plurality of dissociation products; producing hydrogen peroxide and nitrogen oxides from the plurality of dissociation products.
Opening claim text (preview).
What is claimed is: 1. A method comprising: injecting a mixture comprising liquid water and a gas, into at least one electrically-conductive inlet capillary tube of a continuously-flowing plasma reactor to generate a flowing liquid film region on one or more internal walls of the continuously-flowing plasma reactor with a gas stream flowing through the flowing liquid film region; propagating a plasma discharge along the flowing liquid film region from the at least one electrically-conductive inlet capillary tube to at least one electrically-conductive outlet capillary tube at an opposing end of the continuously-flowing plasma reactor; dissociating the liquid water in the plasma discharge to form a plurality of dissociation products; producing hydrogen peroxide and nitrogen oxides from the plurality of dissociation products; dissolving the hydrogen peroxide and the nitrogen oxides into the flowing liquid film region; and recovering at least a portion of the hydrogen peroxide and the nitrogen oxides from the at least one electrically conductive outlet capillary tube. 2. The method according to claim 1 , wherein the nitrogen oxides and the hydrogen peroxide dissolved into the flowing liquid film region are protected from degradation as the hydrogen peroxide and the nitrogen oxides flow through the flowing liquid film region and exit the continuously-flowing plasma reactor via the at least one electrically conductive outlet capillary tube. 3. The method according to claim 1 , wherein the injected liquid water has a temperature of from greater than 0 to less than 100 degrees Celsius, and wherein the reactor has a pressure of from approximately 0.1 to 2 bar. 4. The method according to claim 1 , wherein the injected liquid water has a conductivity of near 1 microSiemens/cm to 500 microSiemens/cm. 5. The method according to claim 1 , wherein the gas is air. 6. The method according to claim 1 , wherein the at least one electrically-conductive inlet capillary tube and the at least one electrically-conductive outlet capillary tube comprise an electrically conductive material. 7. The method according to claim 6 , wherein the electrically conductive material comprises one selected from the group consisting of stainless steel, nickel alloys, chromium alloys, titanium alloys, molybdenum alloys, copper alloys, gold alloys, platinum alloys, zinc alloys, zirconium alloys, and combinations thereof. 8. The method according to claim 1 , wherein the mixture is injected into a plurality of electrically-conductive inlet capillary tubes. 9. The method according to claim 1 , wherein the flowing liquid film region has an annular shape. 10. The method according to claim 1 , wherein the plasma discharge has a nominal frequency of 500 Hz. 11. The method according to claim 10 , wherein plasma discharge has a frequency of from about 100 to 10,000 Hz.
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