Method and device for characterizing an electron beam

Patent metadata

Field	Value
Publication number	US-10586683-B2
Application number	US-201715630199-A
Country	US
Kind code	B2
Filing date	Jun 22, 2017
Priority date	Jan 21, 2015
Publication date	Mar 10, 2020
Grant date	Mar 10, 2020

Abstract

A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

First claim

The invention claimed is:

1. A device for detecting X-rays emanating from a substrate surface, said device comprising:
at least one first X-ray detector;
a patterned aperture resolver; and
a patterned aperture modulator,
wherein:
said patterned aperture resolver includes at least one opening facing towards said X-ray detector, the patterned aperture resolver being positioned in front of said X-ray detector, the at least one opening defining a first pattern;
said patterned aperture modulator is positioned between said patterned aperture resolver and said substrate at a predetermined distance from said patterned aperture resolver and said substrate, where said patterned aperture modulator has a plurality of openings in at least a first direction, the plurality of openings defining a second pattern, the second pattern being different, other than in a relative scale, from the first pattern, the plurality of openings comprising a first opening comprising a first micro-pattern and a second opening comprising a second micro-pattern different than the first micro-pattern, wherein the first micro-pattern is arranged in a first non-periodic pattern and the second micro-pattern is arranged in a second non-periodic pattern that is different than the first non-periodic pattern; and
said x-rays emanating from said substrate surface are intensity modulated with said patterned aperture modulator and patterned aperture resolver before being detected by said X-ray detector.

2. The device according to claim 1 , wherein said first and second patterns are each either a 1-dimensional pattern or a 2-dimensional pattern.

3. The device according to claim 2 , wherein:
an opening at a first position of said patterned aperture resolver is configured with a first type of micro-pattern; and
an opening at a second position of said patterned aperture resolver is configured with a second type of micro-pattern, said second type of micro-pattern being different relative to said first type of micro-pattern.

4. The device according to claim 3 , wherein said first type of micro-pattern is a plurality of slots in a first direction.

5. The device according to claim 4 , wherein said second type of micro-pattern is a plurality of slots in a second direction, said second direction being different relative to said first direction.

6. The device according to claim 1 , wherein a base material of said patterned aperture modulator and said patterned aperture resolver is designed for shielding x-ray radiation.

7. The device according to claim 1 , wherein a vacuum window is positioned between said X-ray detector and said patterned aperture resolver with the X-ray detector disposed external of the vacuum window and the patterned aperture resolver disposed internal of the vacuum window.

8. The device according to claim 1 , wherein said substrate is provided with a reference pattern.

9. The device according to claim 1 , wherein said patterned aperture resolver is arranged at a distance from said X-ray detector.

10. The device according to claim 1 , wherein said patterned aperture resolver is replaced by a patterned detector.

11. The device according to claim 1 , further comprising at least one second X-ray detector arranged with a patterned aperture resolver and a patterned aperture modulator, said patterned aperture resolver having at least one opening facing towards said at least one second X-ray detector being arranged in front of said at least one second X-ray detector, said patterned aperture modulator being provided between said patterned aperture resolver and said substrate at a predetermined distance from said patterned aperture resolver and said substrate, said patterned aperture modulator having a plurality of openings in at least a first direction, said x-rays from said surface being intensity modulated with said patterned aperture modulator and said patterned aperture resolver before being detected by said at least one second X-ray detector, said at least one first X-ray detector and said at least one second X-ray detector being arranged at a predetermined distance from each other for detecting height variations in a surface of said substrate.

12. The device according to claim 11 , wherein said first and second x-ray detectors are positioned in a plane in parallel with the substrate and said height information is determined by triangulation.

13. The device according to claim 11 , wherein said first detector is essentially in parallel with said substrate and said second detector is essentially perpendicular with the substrate.

14. The device according to claim 11 , wherein said at least one first and said at least one second detectors are configured as a single unit.

15. The device according to claim 11 , wherein said at least one first and said at least one second detectors are configured as separate units.

16. The device according to claim 1 , wherein:
said at least one opening in said patterned aperture resolver comprises two or more openings; and
said first pattern defined by said two or more openings is a non-periodic pattern.

17. The device according to claim 16 , wherein said non-periodic pattern of said two or more openings in said patterned aperture resolver is either a one-dimensional pattern or a two-dimensional pattern.

18. The device according to claim 16 , wherein:
said first pattern is defined by a first set of spacing between each of the two or more openings of said patterned aperture resolver; and
said second pattern is defined by a second set of spacing between each of the plurality of openings of said pattern aperture modulator, the second set of spacing being different, other than in a relative spacing scale, from the first set of spacing.

19. The device according to claim 1 , wherein:
said second pattern defined by said plurality of openings in said patterned aperture modulator is a non-periodic pattern, and
the non-periodic pattern is either a 1-dimensional pattern or a 2-dimensional pattern.

20. The device according to claim 1 , wherein:
the first micro-pattern comprises a plurality of slits in a first direction; and
the second micro-pattern comprises a plurality of slits in a second direction different than the first direction.

21. The device of claim 1 , wherein the substrate is configured to receive the X-rays in a first direction and to emanate said X-rays in a second direction toward the patterned aperture modulator and the patterned aperture resolver, wherein the second direction is opposite the first direction.

22. The device of claim 7 , wherein the vacuum window forms a vacuum chamber such that the patterned aperture resolver disposed internally of the vacuum window is sealed within the vacuum chamber.

Assignees

• Arcam Ab

Inventors

• Lock Tomas

Classifications

• B28B17/00

  Details of, or accessories for, apparatus for shaping the material; Auxiliary measures taken in connection with such shaping (moulds B28B7/00; after-treatment B28B11/00; feeding or discharging B28B13/00; arrangements for embedding elements in the material B28B23/00) · CPC title

• H01J37/3045 Primary

  Object or beam position registration · CPC title

• B33Y30/00

  Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title

• H01J37/305

  for casting, melting, evaporating, or etching · CPC title

• G01T1/295

  using coded aperture devices, e.g. Fresnel zone plates (handling of radiation of particles, e.g. using diaphragms, collimators, diffraction G21K1/00) · CPC title