Kit and laminate

Patent metadata

Field	Value
Publication number	US-10580640-B2
Application number	US-201715712595-A
Country	US
Kind code	B2
Filing date	Sep 22, 2017
Priority date	Mar 23, 2015
Publication date	Mar 3, 2020
Grant date	Mar 3, 2020

Abstract

Provided are a kit and a laminate which are capable of suppressing residues derived from a temporary adhesive in manufacture of a semiconductor. The kit for manufacturing a semiconductor device includes a composition which contains a solvent A; a composition which contains a solvent B; and a composition which contains a solvent C, in which the kit is used when a temporary adhesive layer is formed on a first substrate using a temporary adhesive composition containing a temporary adhesive and the solvent A, at least some of an excessive amount of the temporary adhesive on the first substrate is washed using the composition containing the solvent B, a laminate is manufactured by bonding the first substrate and a second substrate through the temporary adhesive layer, one of the first substrate and the second substrate is peeled off from the laminate at a temperature of lower than 40° C., and then the temporary adhesive remaining on at least one of the first substrate or the second substrate is washed using the composition containing the solvent C, and the solvent A, the solvent B, and the solvent C respectively satisfy a predetermined vapor pressure and a predetermined saturated solubility.

First claim

What is claimed is:

1. A kit for manufacturing a semiconductor device comprising:
a composition which contains a solvent A;
a composition which contains a solvent B; and
a composition which contains a solvent C,
wherein the kit is used when a temporary adhesive layer is formed on a first substrate using a temporary adhesive composition containing a temporary adhesive and the solvent A, the composition containing the solvent A is the temporary adhesive composition containing the temporary adhesive and the solvent A, at least some of an excessive amount of the temporary adhesive on the first substrate is washed using the composition containing the solvent B, a laminate is manufactured by bonding the first substrate and a second substrate through the temporary adhesive layer, one of the first substrate and the second substrate is peeled off from the laminate at a temperature of lower than 40° C., and then the temporary adhesive remaining on at least one of the first substrate and the second substrate is washed using the composition containing the solvent C, and
the solvent A satisfies Formula 1, the solvent B satisfies Formula 2, and the solvent C satisfies Formula 3,
√{square root over (( C A −35) 2 +(10 log P A −27) 2 )}<7.3  Formula 1

√{square root over (( C B −31) 2 +(10 log P B −29) 2 )}<5.0  Formula 2

√{square root over (( C C −32) 2 +(10 log P C −30) 2 )}<6.5  Formula 3

in Formulae 1 to 3, P A , P B , and P C each represent a vapor pressure of the solvent A, the solvent B, and the solvent C at 25° C., and C A , C B , and C C each represent a saturated solubility of the temporary adhesive in the solvent A, the solvent B, and the solvent C at 25° C.,
where the unit of the vapor pressure is Pa and the unit of the saturated solubility is % by mass.

2. The kit according to claim 1 ,
wherein when a solubility parameter of the solvent A is set as sp A and a solubility parameter of the solvent B is set as sp B , an in equation of |sp A −sp B |≤3.0 is satisfied,
where the unit of the solubility parameter is (MPa) 0.5 .

3. The kit according to claim 1 ,
wherein the laminate includes one or more temporary adhesive layers on the surface of the first substrate and the second substrate on the surface of the temporary adhesive layer.

4. The kit according to claim 3 ,
wherein the temporary adhesive layer is formed of one layer.

5. The kit according to claim 1 ,
wherein the temporary adhesive layer is formed by coating the first substrate with a temporary adhesive composition that contains the temporary adhesive and the solvent A.

6. The kit according to claim 1 ,
wherein an excessive amount of the temporary adhesive in the laminate is present on at least one of an edge portion of the first substrate and a bevel portion of the first substrate, which is a surface of the first substrate on a side far from the second substrate.

7. The kit according to claim 1 ,
wherein the temporary adhesive contains an elastomer.

8. The kit according to claim 7 ,
wherein the elastomer has a repeating unit derived from styrene.

9. The kit according to claim 7 ,
wherein the elastomer is a hydrogenated material.

10. The kit according to a claim 7 ,
wherein the elastomer has a styrene block at one terminal or both terminals.

11. The kit according to claim 1 ,
wherein a saturated solubility C C of the solvent C at 25° C. is in a range of 26 to 35% by mass.

12. The kit according to claim 1 ,
wherein the solvent A, the solvent B, and the solvent respectively include hydrocarbons having at least one of an alicycle and an aromatic ring.

13. The kit according to claim 1 ,
wherein a boiling point of each of the solvents A to C at 101300 Pa is in a range of 155° C. to 206° C.

14. The kit according to claim 1 ,
wherein 90% by mass or greater of the composition containing the solvent A is formed of the solvent A.

15. The kit according to claim 1 ,
wherein 90% by mass or greater of the composition containing the solvent B is formed of the solvent B, and
90% by mass or greater of the composition containing the solvent C is formed of the solvent C.

Assignees

• Fujifilm Corp

Inventors

• Kamochi Yoshitaka
• Iwai Yu
• Koyama Ichiro
• Nakamura Atsushi

Classifications

• H10P72/7442

  Separation by peeling · CPC title

• H10P72/7422

  used to protect an active side of a device or wafer · CPC title

• H10P72/7416

  used during dicing or grinding · CPC title

• H10P72/74

  using temporarily an auxiliary support · CPC title

• H10P70/20

  Cleaning during device manufacture · CPC title