Exposure apparatus and exposure method

Patent metadata

Field	Value
Publication number	US-10578971-B2
Application number	US-201616071984-A
Country	US
Kind code	B2
Filing date	Dec 28, 2016
Priority date	Jan 25, 2016
Publication date	Mar 3, 2020
Grant date	Mar 3, 2020

Abstract

An exposure apparatus 10 is an exposure apparatus for forming a pattern by exposure by irradiating a set master 1 with laser light, comprising: an optical pickup 12 which is capable of adjusting the focus of laser light and a control unit 19 which adjusts the focus of laser light emitted from the optical pickup 12 using integrated surface profile data indicating the relative positional relationship between the surface of the master 1 and the optical pickup 12 according to at least one of the surface roughness of the master 1, the inclination of the master 1, and the decentering of the master 1.

First claim

The invention claimed is:

1. An exposure apparatus for forming a pattern by exposure by irradiating a set master with laser light, comprising:
a light source unit emitting the laser light and capable of adjusting a focus of the laser light; and
a control unit adjusting a focus of laser light emitted from the light source unit using integrated surface profile data indicating a relative positional relationship between a surface of the master and the light source unit depending on at least one of surface roughness of the master, inclination of the master, and decentering of the master, wherein
the control unit comprises:
an error detection unit performing output corresponding to a focus error of the laser light;
an adder adding a target value corresponding to an output from the error detection unit with the laser light focusing on the surface of the master and an offset value based on a correction signal generated based on the integrated surface profile data; and
a control computing unit adjusting a focus of the laser light based on a difference between a sum obtained by the adder and the output from the error detection unit.

2. The exposure apparatus according to claim 1 , wherein
the correction signal is one of a table and a function corresponding to the position of the surface of the master.

3. An exposure apparatus for forming a pattern by exposure by irradiating a set master with laser light, comprising:
a light source unit emitting the laser light and capable of adjusting a focus of the laser light; and
a control unit adjusting a focus of laser light emitted from the light source unit using integrated surface profile data indicating a relative positional relationship between a surface of the master and the light source unit depending on at least one of surface roughness of the master, inclination of the master, and decentering of the master, wherein
the control unit comprises:
an error detection unit performing output corresponding to a focus error of the laser light;
a computing unit calculating an offset value for correcting a target value corresponding to an output from the error detection unit with the laser light focusing on the surface of the master by performing predetermined computations on the output from the error detection unit based on the integrated surface profile data;
an adder adding the target value and the offset value calculated by the computing unit; and
a control computing unit adjusting a focus of the laser light based on a difference between a sum obtained by the adder and the output from the error detection unit.

4. The exposure apparatus according to claim 1 , wherein
the light source unit is an optical pickup, and
the integrated surface profile data are measured by the optical pickup.

5. The exposure apparatus according to claim 4 , wherein
the optical pickup includes an optical sensor outputting a voltage corresponding to a focus error of the laser light, and
the integrated surface profile data are measured based on the output from the optical sensor.

6. The exposure apparatus according to claim 4 , wherein
the optical pickup comprises:
an object lens directing the laser light to the master; and
an actuator displacing the object lens, and
wherein the integrated surface profile data are measured based on a current flowing in the actuator.

7. The exposure apparatus according to claim 1 , wherein
the integrated surface profile data are measured by a displacement meter.

8. The exposure apparatus according to claim 1 , wherein
the master is one of a cylindrical master and a columnar master.

9. The exposure apparatus according to claim 1 , wherein
the master is a plate-like master.

10. An exposure method using an exposure apparatus which includes a light source emitting laser light and is capable of adjusting a focus of the laser light, and emits the laser light to a set master, the method comprising:
adjusting a focus of laser light emitted from the light source unit using integrated surface profile data indicating a relative positional relationship between a surface of the master and the light source unit depending on at least one of surface roughness of the master, inclination of the master, and decentering of the master, wherein adjusting the focus of laser light emitted from the light source unit further comprises:
performing, by an error detection unit, output corresponding to a focus error or the laser light;
adding, by an adder, a target value corresponding to an output from the error detection unit with the laser light focusing on the surface of the master and an offset value based on a correction signal generated based on the integrated surface profile data;
adjusting a focus of the laser light based on a difference between a sum obtained by the adder and the output from the error detection unit.

11. An exposure method using an exposure apparatus which includes a light source emitting laser light and is capable of adjusting a focus of the laser light, and emits the laser light to a set master, the method comprising:
adjusting a focus of laser light emitted from the light source unit using integrated surface profile data indicating a relative positional relationship between a surface of the master and the light source unit depending on at least one of surface roughness of the master, inclination of the master, and decentering of the master, wherein adjusting the focus of laser light emitted from the light source unit further comprises:
performing, by an error detection unit, output corresponding to a focus error of the laser light;
calculating, by a computing unit, an offset value for correcting a target value corresponding to an output from the error detection unit with the laser light focusing on the surface of the master by performing predetermined computations on the output from the error detection unit based on the integrated surface profile data;
adding, by an adder, the target value and the offset value calculated by the computing unit; and
adjusting a focus of the laser light based on a difference between a sum obtained by the adder and the output from the error detection unit.

12. The exposure apparatus according to claim 3 , wherein
the light source unit is an optical pickup, and
the integrated surface profile data are measured by the optical pickup.

13. The exposure apparatus according to claim 12 , wherein
the optical pickup includes an optical sensor outputting a voltage corresponding to a focus error of the laser light, and
the integrated surface profile data are measured based on the output from the optical sensor.

14. The exposure apparatus according to claim 12 , wherein
the optical pickup comprises:
an object lens directing the laser light to the master; and
an actuator displacing the object lens, and
wherein the integrated surface profile data are measured based on a current flowing in the actuator.

15. The exposure apparatus according to claim 3 , wherein
the integrated surface profile data are measured by a displacement meter.

16. The exposure apparatus according to claim 3 , wherein
the master is one of a cylindrical master and a columnar master.

17. The exposure apparatus according to claim 3 , wherein
the master is a plate-like master.

Assignees

• Dexerials Corp

Inventors

• Nogami Asahiko

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• H01S3/1305

  Feedback control systems · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/2053 Primary

  using a laser (ablative removal B41C) · CPC title

• H01S3/106

  by controlling devices placed within the cavity ({H01S3/10076,} H01S3/13 take precedence) · CPC title