Gas distribution showerhead for semiconductor processing

US10577690B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10577690-B2
Application numberUS-201715492928-A
CountryUS
Kind codeB2
Filing dateApr 20, 2017
Priority dateMay 20, 2016
Publication dateMar 3, 2020
Grant dateMar 3, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of processing gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas distribution assembly, comprising: a gas distribution plate, comprising: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of channels and through the gas distribution plate; a blocker plate coupled to the gas distribution plate, comprising: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner zone from the outer zone; a dual zone showerhead coupled to the blocker plate, comprising: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a trench disposed between the inner zone and the outer zone, wherein the trench is configured to accept the first barrier wall such that the inner zone of the dual zone showerhead is physically separated from the outer zone of the dual zone showerhead; and wherein the second plurality of gas holes and the fourth plurality of gas holes are patterned to avoid a co-axial flow, and wherein the third plurality of gas holes and the fifth plurality of gas holes are patterned to avoid a co-axial flow. 2. The gas distribution assembly of claim 1 , wherein the inner zone of the dual zone showerhead is aligned with the inner zone of the blocker plate. 3. The gas distribution assembly of claim 1 , wherein the outer zone of the dual zone showerhead is aligned with the outer zone of the blocker plate. 4. The gas distribution assembly of claim 1 , wherein the plurality of channels are distributed symmetrically around the gas supply inlet. 5. The gas distribution assembly of claim 1 , further comprising: a first plenum disposed between the gas distribution plate and the outer zone of the blocker plate; and a second plenum disposed between the gas distribution plate and the inner zone of the blocker plate. 6. The gas distribution assembly of claim 1 , further comprising: a third plenum disposed between the dual zone showerhead and the outer zone of the blocker plate; and a fourth plenum disposed between the dual zone showerhead and the inner zone of the blocker plate. 7. The gas distribution assembly of claim 1 , further comprising: a first O-ring disposed between the first barrier wall and the gas distribution plate; and a second O-ring disposed between the first barrier wall and the dual zone showerhead. 8. The gas distribution assembly of claim 7 , wherein the first O-ring and the second O-ring comprise a perfluoroelastomer material. 9. The gas distribution assembly of claim 1 , wherein the gas distribution plate, the blocker plate, or the dual zone showerhead comprise an aluminum material, a ceramic material, a dielectric material, quartz material, or a stainless steel material. 10. The gas distribution assembly of claim 9 , wherein the aluminum material is a 6061-T6 aluminum material. 11. The gas distribution assembly of claim 1 , wherein the first plurality of gas holes is at least eight gas holes. 12. The gas distribution assembly of claim 1 , wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a longitudinal axis that is aligned with a longitudinal axis of the dual zone showerhead. 13. The gas distribution assembly of claim 1 , wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes, respectively, each have a uniform width. 14. The gas distribution assembly of claim 1 , wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a longitudinal axis that is misaligned with a longitudinal axis of the dual zone showerhead. 15. The gas distribution assembly of claim 1 , wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes, respectively, each have a variable width. 16. A gas distribution assembly, comprising: a gas distribution plate, comprising: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of channels and through the gas distribution plate; a blocker plate coupled to the gas distribution plate, comprising: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner zone from the outer zone; a dual zone showerhead coupled to the blocker plate, comprising: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a trench disposed between the inner zone and the outer zone, wherein the trench is configured to accept the first barrier wall such that the inner zone of the dual zone showerhead is physically separated from the outer zone of the dual zone showerhead; and a mixing manifold operatively coupled to the gas distribution plate, comprising: a plurality of mixing channels, the mixing channels comprising a first portion and a second portion, wherein a diameter of a choke channel disposed between the first portion and the second portion is less than any diameter of the first portion or the second portion. 17. The gas distribution assembly of claim 16 , wherein the second plurality of gas holes and the fourth plurality of gas holes are patterned to avoid a co-axial flow, and wherein the third plurality of gas holes and the fifth plurality of gas holes are patterned to avoid a co-axial flow. 18. The gas distribution assembly of claim 16 , further comprising: a first plenum disposed between the gas distribution plate and the outer zone of the blocker plate; and a second plenum disposed between the gas distribution plate and the inner zone of the blocker plate. 19. The gas distribution assembly of claim 16 , further comprising: a third plenum disposed between the dual zone showerhead and the outer zone of the blocker plate; and a fourth plenum disposed between the dual zone showerhead and the inner zone of the blocker plate. 20. A gas distribution assembly, comprising: a mixing manifold, comprising: a plurality of mixing channels, the mixing channels comprising a first portion and a second portion, wherein a diameter of a choke channel disposed between the first portion and the second portion is less than any diameter of the first portion or the second portion a gas distribution plate coupled to the mixing manifold, comprising: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of channels and through the gas distribution plate; a blocker plate coupled to the gas distribution plate, comprising: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner zone from the outer zone; a dual zone showerhead coupled to the blocker plate, comprising: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a f

Assignees

Inventors

Classifications

  • Porous nozzles · CPC title

  • Expansion of gas before it reaches the substrate · CPC title

  • Premixing before introduction in the reaction chamber · CPC title

  • Mechanical means for changing the gas flow · CPC title

  • Shower nozzles · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10577690B2 cover?
Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of processing gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two prec…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/45582. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 03 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).