Fast biofilm formation method for organic filler during treatment of sewage with low C/N ratio

US10577267B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10577267-B2
Application numberUS-201715632358-A
CountryUS
Kind codeB2
Filing dateJun 25, 2017
Priority dateNov 22, 2016
Publication dateMar 3, 2020
Grant dateMar 3, 2020

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Abstract

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The invention discloses a fast biofilm formation method for an organic filler during treatment of sewage with a low C/N ratio, and belongs to the field of biofilm process for sewage treatment. The invention improves the effect of biofilm culturing by changing the micro-interface acting force of the filler and accelerating the attachment and colonization of microorganisms on the filler through increase of bacterial quorum-sensing molecules. As compared with a conventional biofilm culturing method, in the invention the biofilm culturing is rapid and operated conveniently, has strong practicality, and is a fast biofilm formation method for an organic filler, which is adapted for treatment of sewage with a low C/N ratio under an aerobic, anoxic or anaerobic condition.

First claim

Opening claim text (preview).

We claim: 1. A biofilm formation method for an organic filler during treatment of sewage, comprising steps of: (1) adding seed sludge and an organic filler according to a volume ratio of 1:(10-15) into a reactor, aerating for 24 h at a temperature controlled at 50-58° C., and then discharging all of the seed sludge; (2) dosing anionic polyacrylamide (APAM) and rhamnolipid into sewage, wherein the dosage of APAM is 1-5 mg/L, the dosage of rhamnolipid is 20-30 mg/L, and the dosing manner is directly dosing into the sewage daily; (3) inoculating a solution of a bacterial strain of Acinetobacter sp. TW for synthesizing an autoinducer-2 (AI-2) signal molecule, wherein the volume ratio of the strain solution to the reactor is 1%-3%, the inoculation is performed 2-3 days after the reactor starts running, having an inoculation concentration of 3-5 g/L and SV30 of 18%-30%; (4) controlling pH at 6.0-8.0, the water temperature at 16-40° C., and the volume load of inlet water at 0.3-1.0 kg COD/(m 3 ·day) in the system; (5) gradually increasing the load of the inlet water according to a proportion of 6%-15% when a removal rate of COD reaches 30%-40% and a removal rate of NH 4+ —N reaches 20%-30%, continuously running for 2-3 days, and then stopping the increase of the inlet-water load; and (6) continually running for 3-18 days. 2. The biofilm formation method for an organic filler during treatment of sewage of claim 1 , wherein the rhamnolipid of step (2) is a mixed structure of mono-rhamnolipid and di-rhamnolipid. 3. The biofilm formation method for an organic filler during treatment of sewage of claim 1 , wherein when the removal rates of COD and NH 4+ —N respectively reach 70% and 60% stably, a biofilm mainly consisting of protozoa and metazoan is formed on the surface of the filler, then the dosing of APAM, rhamnolipid and the strain for synthesizing the AI-2 signal molecule is stopped to complete the biofilm culturing.

Assignees

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Classifications

  • characterised by the microorganisms used · CPC title

  • C02F3/301Primary

    Aerobic and anaerobic treatment in the same reactor · CPC title

  • Nutrients for stimulating the growth of microorganisms · CPC title

  • from the pharmaceutical industry, e.g. containing antibiotics · CPC title

  • from the manufacture of organic compounds · CPC title

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What does patent US10577267B2 cover?
The invention discloses a fast biofilm formation method for an organic filler during treatment of sewage with a low C/N ratio, and belongs to the field of biofilm process for sewage treatment. The invention improves the effect of biofilm culturing by changing the micro-interface acting force of the filler and accelerating the attachment and colonization of microorganisms on the filler through i…
Who is the assignee on this patent?
Nanjing University Of Technology
What technology area does this patent fall under?
Primary CPC classification C02F3/301. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 03 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).