Enhanced electron screening through plasmon oscillations

Patent metadata

Field	Value
Publication number	US-10566094-B2
Application number	US-201715668436-A
Country	US
Kind code	B2
Filing date	Aug 3, 2017
Priority date	Aug 3, 2017
Publication date	Feb 18, 2020
Grant date	Feb 18, 2020

Abstract

Enhanced Coulomb repulsion screening around light element nuclei is achieved by way of utilizing electromagnetic (EM) radiation to induce plasmon oscillations in target structures (e.g., nanoparticles) in a way that produces high density electron clouds in localized regions of the target structures, thereby generating charge density variations around light element atoms located in the localized regions. Each target structure includes an electrically conductive body including light elements (e.g., a metal hydride/deuteride/tritide) that is configured to undergo plasmon oscillations in response to the applied EM radiation. The induced oscillations causes free electrons to converge in the localized region, thereby producing transient high electron charge density levels that enhance Coulomb repulsion screening around light element (e.g., deuterium) atoms located in the localized regions. Various systems capable of implementing enhanced Coulomb repulsion screening are described, and various nanostructure compositions and configurations are disclosed that serve to further enhance fusion reaction rates.

First claim

The invention claimed is:

1. A system for enhancing electron screening effects around light element atoms, the system including:
an electromagnetic (EM) radiation subsystem including an optical subsystem having one or more optical elements configured to direct electromagnetic (EM) radiation along an emission path such that said EM radiation has an excitation frequency; and
a target structure located in the emission path such that the target structure receives the directed EM radiation,
wherein said target structure has an integral body consisting essentially of an electrically conductive material, said integral body and being configured to undergo plasmon oscillations in response to said EM radiation in a manner that causes free electrons to move between at least two localized regions of said integral body, thereby generating electron density variations of at least 10% around said light element atoms located in said at least two localized regions, where said light element atoms consist of the group including hydrogen, helium, beryllium, boron, lithium and isotopes thereof.

2. The system of claim 1 , wherein the EM radiation subsystem includes an EM generating device comprising one of a laser, a lamp, a light-emitting diode (LED), and a terahertz (THz) light source.

3. The system of claim 2 , wherein the optical subsystem comprises at least one of a focusing lens and a spectrally selective filter.

4. The system of claim 1 , wherein EM radiation subsystem comprises:
a broadband EM generating source configured to generate broadband EM radiation; and
an optical system including a spectrally selective filter disposed between the broadband EM generating source and the plurality of target structures.

5. The system of claim 1 , wherein the optical system comprises a spectrally selective filter configured to only transmit EM radiation at the desired excitation frequency.

6. The system of claim 1 , wherein said plurality of target structures are fixedly mounted on a target fixture in a spaced-apart configuration.

7. The system of claim 1 , further comprising a detector configured to detect particles generated by nuclear fusion involving one or more of the light element atoms disposed in said target structure.

8. The system of claim 1 , wherein said integral body of said target structure comprises a nanostructure.

9. The system of claim 8 , wherein said integral body of said nanostructure comprises one of a spherical body, a rod-shaped body, a prism-shaped body, an octahedron-shaped body, a disc-shaped body, and an cube-shaped body.

10. The system of claim 1 , further comprising an ion source configured to generate a beam that directs at least some of said light element atoms into said target structure during said plasmon oscillations.

11. A method for enhancing electron screening effects around light element atoms, the method comprising:
positioning at least one electrically conductive target structure in a reaction region, each said at least one electrically conductive target structure including a first localized region and a second localized region that is spaced from the first localized region; and
utilizing one or more optical elements to direct electromagnetic (EM) radiation into the reaction region such that said target structure undergoes plasmon oscillations in response to said EM radiation, thereby causing free electrons to move between said first and second localized regions during each cycle of said plasmon oscillations such that a first dense electron cloud is generated around a first group of said light element atoms located in the first localized region during a first phase of each said plasmon oscillation cycle, and a second dense electron cloud is generated around a second group of said light element atoms located in the second localized region during a second phase of each said plasmon oscillation cycle, where said light element atoms consist of the group including hydrogen, helium, beryllium, boron, lithium and isotopes thereof.

12. The method of claim 11 ,
wherein each said electrically conductive target structure consists essentially of an electrically conductive material, and
wherein directing said EM radiation comprises generating said EM radiation with an excitation frequency in a range of 10 12 Hz and 10 16 Hz.

13. The method of claim 12 ,
wherein said electrically conductive material has an associated plasma frequency; and
wherein generating said EM radiation comprises generating said EM radiation with at an excitation frequency in a range of 0.001 to 10 times said plasma frequency of the electrically conductive material.

14. The method of claim 12 ,
wherein said electrically conductive material has an associated static conduction electron carrier density; and
wherein generating said EM radiation comprises generating said EM radiation at an intensity required to induce said plasmon oscillations at an amplitude in the range of 0.1 to fifty times said static conduction electron carrier density of the electrically conductive material.

15. The method of claim 12 , wherein generating said EM radiation comprises generating said EM radiation with power density that is below 1 MW/cm 2 .

16. The method of claim 11 , wherein directing EM radiation onto said plurality of target structures comprises utilizing a first triangular-shaped metal structure and a second triangular-shaped metal structure respectively located on opposite sides of each of the plurality of target structures to enhance said plasmon oscillations in said each target structure.

17. The method of claim 11 , further comprising directing light element ions toward said plurality of target structures.

18. A method for enhancing electron screening effects around light element atoms, the method comprising:
positioning a plurality of electrically conductive target structures in a reaction region, each said electrically conductive target structure including a first localized region and a second localized region that is spaced from the first localized region; and
exciting said plurality of electrically conductive target structures using electromagnetic (EM) radiation directed by one or more optical elements such that each said target structure undergoes resonant plasmon oscillations such that free electrons move between said first and second localized regions during each resonant plasmon oscillation cycle, whereby a first dense electron cloud is generated around a first group of said light element atoms located in the first localized region during a first phase of each said resonant plasmon oscillation cycle, and a second dense electron cloud is generated around a second group of said light element atoms located in the second localized region during a second phase of each said resonant plasmon oscillation cycle, where said light element atoms consist of the group including hydrogen, helium, beryllium, boron, lithium and isotopes thereof.

19. The method of claim 18 ,
wherein each said electrically conductive target structure consists essentially of an electrically conductive material,
wherein said electrically conductive material has an associated static conduction electron carrier density; and
wherein exciting said plurality of target structures comprises generating said EM radiation at an intensity required to induce said plasmon oscillations at an amplitude in the range of 0.1 to fifty times said static conduction electron carrier density of the electrically conductive material.

20. The method of claim 18 , wherein exciting said plurali

Assignees

• Google Inc
• Univ Maryland

Inventors

• Fork David K
• Munday Jeremy N
• Narayan Tarun
• Murray Joseph B

Classifications

• G21B1/19

  Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams · CPC title

• G21B1/23 Primary

  Optical systems, e.g. for irradiating targets, for heating plasma or for plasma diagnostics · CPC title

• G02B5/008

  Surface plasmon devices (diffractive gratings with a pitch less than or comparable to the wavelength G02B5/1809; surface plasmons in integrated optics G02B6/1226; optical analysis of materials by means of surface plasmons G01N21/553) · CPC title

• Y02E30/10

  Nuclear fusion reactors · CPC title