Production method for a layer structure and layer structure

Patent metadata

Field	Value
Publication number	US-10563306-B2
Application number	US-201715401706-A
Country	US
Kind code	B2
Filing date	Jan 9, 2017
Priority date	Jan 13, 2016
Publication date	Feb 18, 2020
Grant date	Feb 18, 2020

Abstract

A production method for a layer structure, including providing a substrate, wherein at least a top surface of the substrate is made from a non-conductive material; depositing a catalyst structure onto the top surface of the substrate; depositing a graphene structure onto the catalyst structure; and at least partially removing the catalyst structure situated between the substrate and the graphene structure.

First claim

What is claimed is:

1. A production method for a layer structure, comprising:
providing a substrate, at least a top surface of the substrate being made from an electrically non-conductive material;
depositing a catalyst structure onto the top surface of the substrate;
depositing a graphene structure onto the catalyst structure;
at least partially removing the catalyst structure situated between the substrate and the graphene structure;
exposing the substrate from the direction of an underside that lies opposite from the top surface of the substrate so that the catalyst structure is at least regionally exposed, the graphene structure being at least regionally exposed during the partial removal of the catalyst structure, and
developing a lower protective coating of an insulating material on at least a subregion of the underside of the substrate and the exposed graphene structure.

2. The production method as recited in claim 1 , further comprising:
developing at least one electrically conductive contact on at least a subregion of the graphene structure.

3. The production method as recited in claim 2 , further comprising:
developing an upper protective coating on at least one of: a subregion of the electrically conductive contact and the graphene structure.

4. The production method as recited in claim 3 , further comprising:
removing a subregion of the graphene structure not covered by the upper protective coating prior to the at least partial removal of the catalyst structure.

5. A production method for a layer structure, comprising:
providing a substrate, at least a top surface of the substrate being made from an electrically non-conductive material;
depositing a catalyst structure onto the top surface of the substrate;
depositing a graphene structure onto the catalyst structure;
at least partially removing the catalyst structure situated between the substrate and the graphene structure;
exposing the substrate from the direction of an underside that lies opposite from the top surface of the substrate so that the catalyst structure is at least regionally exposed, the graphene structure being at least regionally exposed during the partial removal of the catalyst structure, and
developing a contact coating of an electrically conductive material on at least one of: a subregion of the underside of the substrate and the exposed graphene structure.

Assignees

• Bosch Gmbh Robert

Inventors

• Purkl Fabian
• Rohlfing Franziska
• Roelver Robert
• Lutz Theresa

Classifications

• C23C16/56 Primary

  After-treatment · CPC title

• C23C16/26

  Deposition of carbon only · CPC title

• C23C16/0281

  of metallic sub-layers (C23C16/029 takes precedence) · CPC title

• H01B1/04 Primary

  mainly consisting of carbon-silicon compounds, carbon or silicon · CPC title

• H01B5/14

  comprising conductive layers or films on insulating-supports · CPC title