Method for producing a first electrode/active layer/second electrode stack

US10559771B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10559771-B2
Application numberUS-201615736266-A
CountryUS
Kind codeB2
Filing dateJun 16, 2016
Priority dateJun 16, 2015
Publication dateFeb 11, 2020
Grant dateFeb 11, 2020

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  5. First independent claim

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Abstract

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A process for producing a stack of a first electrode/active layer/second electrode, which stack is intended for an electronic device, in particular an organic photodetector or an organic solar cell, the process comprises the following steps: (a) depositing a first conductor layer on the front side of a substrate, in order to form the first electrode; and (b) depositing an active layer taking the form of a thin organic semiconductor layer, this layer including discontinuous zones; wherein this process further comprises the following steps: (d) depositing a resist layer on that side of the stack which is opposite the substrate, which is at least partially transparent; (e) exposing the resist layer via the back side of the substrate; (f) developing the resist layer; and (g) depositing a second conductor layer in order to form the conductive second electrode.

First claim

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The invention claimed is: 1. A process for producing a stack of a first electrode/active layer/second electrode, wherein the stack is intended for an electronic device, in particular an organic photodetector or an organic solar cell, said process comprising following steps: (a) depositing a first conductor layer on a front side of a substrate, in order to form the first electrode; and (b) depositing an active layer taking a form of a thin organic semiconductor layer, the thin organic semiconductor layer comprising discontinuous zones; wherein the depositing active layer (b) further includes following steps, (d), (e), (f) and (g) wherein: (d) depositing a resist layer of positive resist on a side of the stack which is opposite to the substrate, wherein the substrate is at least partially transparent; (e) exposing the resist layer via a back side of said substrate; (f) developing the resist layer; and (g) depositing a second conductor layer in order to form the conductive second electrode wherein the discontinuous zones are defects that pass through the active layer. 2. The process as claimed in claim 1 , step (f) leading to formation of holes in the resist layer level with the discontinuous zones, and step (g) being carried out between steps (b) and (d), a step (h) of etching the conductive second electrode being carried out after step (f). 3. The process as claimed in claim 2 , comprising an additional step (i) of removing the resist after the etching step (h). 4. The process as claimed in claim 2 , comprising an additional step of depositing a passivating layer on the conductive second electrode, before step (d) of depositing the resist layer. 5. The process as claimed in claim 1 , step (f) leading to formation of holes in the resist layer level with the discontinuous zones, the process including two additional steps between steps (f) and (g), a step (j) of depositing a passivating layer on the resist layer and a step (k) of removing the resist. 6. The process as claimed in claim 5 , wherein before step (j), a step ( 1 ) of etching the active layer through the holes formed in the resist is provided. 7. The process as claimed in claim 5 , wherein a buffer layer is deposited on the active layer between steps (b) and (d), a step of etching the buffer layer then being provided between steps (k) and (g). 8. The process as claimed in claim 1 , wherein a step (c) of removing the conductive first layer locally via chemical attack, through the discontinuous zones of the active layer, is carried out after step (b).

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What does patent US10559771B2 cover?
A process for producing a stack of a first electrode/active layer/second electrode, which stack is intended for an electronic device, in particular an organic photodetector or an organic solar cell, the process comprises the following steps: (a) depositing a first conductor layer on the front side of a substrate, in order to form the first electrode; and (b) depositing an active layer taking th…
Who is the assignee on this patent?
Commissariat Energie Atomique, Isorg, Trixell
What technology area does this patent fall under?
Primary CPC classification H01L51/442. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 11 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).