Transparent conductive films with embedded metal grids

US10550490B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10550490-B2
Application numberUS-201615097919-A
CountryUS
Kind codeB2
Filing dateApr 13, 2016
Priority dateMay 22, 2015
Publication dateFeb 4, 2020
Grant dateFeb 4, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A transparent conductive film with a metal mesh embedded in a substrate and a method of fabrication thereof is provided. The metal mesh has a cap that is pressed and embedded in a substrate or a deformable material on a substrate, providing superior mechanical stability by mechanical interlocking. The embedding mechanism also provides superior chemical and environmental stability. A fabrication method is provided and includes a vacuum-free and low-cost process for large-volume manufacturing of the transparent conductive film with tunable performance.

First claim

Opening claim text (preview).

What is claimed is: 1. A transparent conductive film, comprising: a transparent substrate; and a metal mesh comprising a plurality of metal lines embedded in the transparent substrate, wherein the metal mesh has a cap embedded in the substrate, the cap being disposed between two metal lines, of the plurality of metal lines, respectively extending away from the cap, wherein the cap has a linewidth that is 1.2 to 1.5 times greater than the linewidth of each of the two metal lines extending away from the cap, wherein a side surface of the metal mesh is entirely embedded in the transparent substrate such that the side surface of the metal mesh is not exposed, and wherein the transparent substrate is a thermoplastic film such that the metal mesh is pressed into the transparent substrate when heated. 2. The transparent conductive film according to claim 1 , wherein the transparent substrate is a flexible plastic film. 3. The transparent conductive film according to claim 1 , further comprising a rigid glass panel on which the transparent substrate is disposed. 4. The transparent conductive film according to claim 2 , wherein a surface of the cap has a rounded shape. 5. The transparent conductive film according to claim 1 , wherein the transparent substrate is a cyclic olefin copolymer film. 6. The transparent conductive film according to claim 1 , wherein the transparent substrate is an ultraviolet light curable material. 7. The transparent conductive film according to claim 1 , wherein the metal grid lines have a linewidth between 100 nm and 5000 nm, a grid opening size between 1 μm and 100 μm, and the ratio between the grid opening and the linewidth is between 5 and 100. 8. The transparent conductive film according to claim 1 , wherein the metal mesh is tapered in a direction that is opposite the cap. 9. The transparent conductive film according to claim 1 , wherein a linewidth of the metal grid gradually increases going away from the cap in one direction. 10. The transparent conductive film according to claim 1 , wherein a side of the metal grid is flush with the transparent substrate. 11. The transparent conductive film according to claim 1 , wherein a height of the metal grid is from 0.3 to 3 times its linewidth. 12. The transparent conductive film according to claim 1 , wherein the metal grid is made of one of copper, gold, silver, nickel, zinc, tin, and alloy of any of these metals. 13. A transparent conductive film, comprising: a transparent substrate; and a metal mesh that is embedded in the transparent substrate, the metal mesh comprising a plurality of metal lines, wherein the metal mesh has a portion that is suitable for anchoring the metal mesh in the substrate, wherein the portion of the metal mesh is disposed between two metal lines, of the plurality of metal lines, respectively extending away from the portion, wherein the portion of the metal mesh has a linewidth that is 1.2 to 1.5 times greater than the linewidth of each of the two metal lines extending away from the portion, wherein a side surface of the metal mesh is entirely embedded in the transparent substrate such that the side surface of the metal mesh is not exposed, and wherein the transparent substrate is a thermoplastic film such that the metal mesh is pressed into the transparent substrate when heated. 14. The transparent conductive film of claim 13 , wherein the metal mesh has an exposed top surface. 15. The transparent conductive film of claim 14 , wherein a linewidth of the mesh decreases going towards the exposed top surface.

Assignees

Inventors

Classifications

  • Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal · CPC title

  • mainly consisting of metals or alloys · CPC title

  • Wires; Strips; Foils · CPC title

  • After-treatment of electroplated surfaces · CPC title

  • Perforated or foraminous objects, e.g. sieves (C25D1/10 takes precedence) · CPC title

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What does patent US10550490B2 cover?
A transparent conductive film with a metal mesh embedded in a substrate and a method of fabrication thereof is provided. The metal mesh has a cap that is pressed and embedded in a substrate or a deformable material on a substrate, providing superior mechanical stability by mechanical interlocking. The embedding mechanism also provides superior chemical and environmental stability. A fabrication…
Who is the assignee on this patent?
Versitech Ltd
What technology area does this patent fall under?
Primary CPC classification C25D5/54. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 04 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).