Resonant network for plasma power supply and power supply device for plasma generator

Patent metadata

Field	Value
Publication number	US-10548211-B2
Application number	US-201816136691-A
Country	US
Kind code	B2
Filing date	Sep 20, 2018
Priority date	May 17, 2018
Publication date	Jan 28, 2020
Grant date	Jan 28, 2020

Abstract

Provided is a resonant network for plasma power supply, which is connected between a power supply unit and an output unit. The resonant network includes a resonant inductor connected in series with the power supply unit, a resonant capacitor connected in parallel with the output unit and connected in series with the resonant inductor, and a passive element connected in series with the output unit and the resonant inductor and connected in parallel with the resonant capacitor.

First claim

What is claimed is:

1. A resonant network for plasma power supply, which is connected between a power supply unit and an output unit, the resonant network comprising:
a resonant inductor connected in series with the power supply unit;
a resonant capacitor connected in parallel with the output unit and connected in series with the resonant inductor; and
a passive element connected in series with the output unit and the resonant inductor and connected in parallel with the resonant capacitor.

2. The resonant network of claim 1 , further comprising an additional inductor connected in series with the passive element and the output unit.

3. The resonant network of claim 1 , wherein the passive element comprises a capacitor to expand a zero-voltage switching (ZVS) region of the power supply unit.

4. The resonant network of claim 3 , wherein the capacitor of the passive element is configured to have a smaller device value than the resonant capacitor.

5. The resonant network of claim 3 , wherein a voltage and a current magnitude of the power supply unit, and a phase difference of a resonance frequency are adjusted by the passive element.

6. The resonant network of claim 5 , wherein a phase shift control of the resonance frequency is performed and a voltage of the power supply unit is adjusted by the phase shift control.

7. A power supply device for igniting a plasma into a plasma generator, the power supply device comprising:
a power supply unit;
a transformer comprising a ferrite core coupled to the plasma generator and a primary winding wound on the ferrite core; and
a resonant network connected between the power supply unit and the primary winding,
wherein the resonant network comprises:
a resonant inductor connected in series with the power supply unit;
a resonant capacitor connected in parallel with the primary winding and connected in series with the resonant inductor; and
a passive element connected in series with the primary winding and the resonant inductor and connected in parallel with the resonant capacitor.

8. The power supply device of claim 7 , further comprising an additional inductor connected in series with the passive element and the output unit.

9. The power supply device of claim 7 , wherein the passive element comprises a capacitor to expand a zero-voltage switching (ZVS) region of the power supply unit.

10. The power supply device of claim 9 , wherein the power supply unit comprises a rectifier and an inverter,
wherein a voltage and a current magnitude of the inverter, and a phase difference of a resonance frequency are adjusted by the passive element.

11. The power supply device of claim 10 , wherein a phase shift control of the resonance frequency is performed and a voltage of the inverter is adjusted by the phase shift control.

Assignees

• New Power Plasma Co Ltd
• Research & Business Found Sungkyunkwan Univ
• Res & Business Foundation Sungkyunkwan Univer

Inventors

• Ryu Seung Hee
• Lim Chang Seob
• Moon Hong Kweon
• Sung Won Yong
• Koo Geun Wan
• Lee Byoung Kuk

Classifications

• H02J50/70

  involving the reduction of electric, magnetic or electromagnetic leakage fields · CPC title

• H05H1/46 Primary

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• H02M5/42

  by static converters · CPC title

• G01R23/02

  Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage · CPC title

• H01J37/32009 Primary

  Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title