High energy/power density nickel oxide/hydroxide materials and nickel cobalt oxide/hydroxide materials and production thereof

US10547046B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10547046-B2
Application numberUS-201615043226-A
CountryUS
Kind codeB2
Filing dateFeb 12, 2016
Priority dateNov 30, 2011
Publication dateJan 28, 2020
Grant dateJan 28, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to one embodiment, a method includes forming a nickel oxide/hydroxide active film onto a substrate from a solution including a nickelous salt and an electrolyte, where the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 80% charge over greater than 500 charge/discharge cycles, and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at greater than about 0.5 electron per nickel atom.

First claim

Opening claim text (preview).

What is claimed is: 1. A method, comprising: forming a nickel oxide/hydroxide active film via anodic electrodeposition onto a substrate from a solution including a nickelous salt and an electrolyte; wherein the substrate comprises ordered, pyrolytic graphite; wherein the electrolyte comprises at least one constituent selected from the group consisting of: an acetate, a nitrate, a sulfate; a hydroxide, and a fluoride; wherein the nickelous salt and the electrolyte are each present in a concentration from about 0.45 molar to about 1.2 molar; wherein the nickel oxide/hydroxide active film has a physical characteristic of exhibiting an increase in capacitance relative to an initial capacitance of the nickel oxide/hydroxide active film, over greater than 500 charge/discharge cycles; and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at about 1.33 electrons per nickel atom. 2. The method of claim 1 , wherein the nickelous salt comprises NiCl 2 . 3. The method of claim 1 , wherein the electrolyte is NaNO 3 . 4. The method of claim 1 , wherein the nickelous salt is present in an amount of about 1.2M; wherein the nickelous salt comprises NiAc; wherein the electrolyte is present in an amount of about 1.2M; and wherein the electrolyte is selected from the group consisting of: LiAc, KAc, NaAc, KF, NaF, LiOH; and combinations thereof. 5. The method of claim 1 , wherein the electrolyte is selected from a group consisting of: LiAc, KAc NaF, and KF. 6. The method of claim 1 , wherein the electrolyte comprises one or more species selected from the group consisting of: LiAc, KAc, NaAc, KF, NaF, and LiOH. 7. A method, comprising: forming a nickel oxide/hydroxide active film via anodic electrodeposition onto a substrate from an acidic solution including a nickelous salt and an electrolyte; wherein the substrate comprises ordered, pyrolytic graphite; wherein the electrolyte comprises at least one constituent selected from the group consisting of: an acetate, a nitrate, a sulfate; a hydroxide, and a fluoride; wherein the nickel oxide/hydroxide active film has a physical characteristic of exhibiting an increase in capacitance relative to an initial capacitance of the nickel oxide/hydroxide active film, over greater than 500 charge/discharge cycles; and wherein the nickel oxide/hydroxide active film has a physical characteristic of storing electrons at greater than about 1.0 electrons per nickel atom. 8. The method of claim 1 , wherein the nickel oxide/hydroxide active film formed on the substrate has a thickness in a range from about 20 to about 200 nm. 9. The method of claim 8 , wherein the thickness of the nickel oxide/hydroxide active film varies less than about ±1 nm along all codeposited portions thereof. 10. The method of claim 1 , wherein the nickel oxide/hydroxide active film includes cobalt. 11. The method of claim 10 , wherein the nickel oxide/hydroxide active film comprises a cobalt (Co) to nickel (Ni) ratio of about 2:1 to about 1:2. 12. The method of claim 1 , wherein the nickelous salt comprises NiAc. 13. The method of claim 1 , wherein each of the charge/discharge cycles is characterized by a charge rate of about 10 C and a depth of discharge of about 100%. 14. The method of claim 1 , comprising either charging or discharging the nickel oxide/hydroxide active film in a second solution of KOH, wherein the KOH is present in an amount from 3 M to about 6 M. 15. The method as recited in claim 7 , wherein the nickelous salt comprises 0.45 M Ni(NO 3 ) 2 ; and wherein the electrolyte comprises 0.3 M Ni(Ac) 2 . 16. The method of claim 7 , wherein the nickelous salt comprises a nickelous component and a pH-neutral anionic component; wherein the electrolyte comprises at least one pH-neutral component; wherein the nickelous component comprises NiAc; and wherein the electrolyte comprises one or more species selected from the group consisting of: LiAc, KAc, NaAc, KF, NaF, and LiOH. 17. The method of claim 7 , wherein each of the charge/discharge cycles is characterized by a charge rate of about 10 C and a depth of discharge of about 100%. 18. The method of claim 1 , wherein the substrate is porous. 19. The method of claim 1 , further comprising charging and discharging the nickel oxide/hydroxide active film, wherein the charging and discharging is characterized by a charge/discharge rate in a range from about 100 C to about 1000 C. 20. The method of claim 13 , comprising either charging or discharging the nickel oxide/hydroxide active film in a second solution of KOH, wherein the KOH is present in an amount from 3 M to about 6 M; wherein the nickelous salt comprises Ni present in an amount of about 1.2M; and wherein the electrolyte comprises at least one material selected from a group consisting of: LiAc, KAc; NaAc, NaF, LiOH, and KF; wherein the electrolyte is present in an amount of about 1.2M; wherein the substrate is porous; wherein some or all pores of the substrate are characterized by a pore size of 0.1 μm; wherein the pores of the substrate are characterized by a substantially uniform distance therebetween; and wherein the nickel oxide/hydroxide active film: comprises cobalt; exhibits a cobalt (Co) to nickel (Ni) ratio of about 2:1 to about 1:2; has a thickness in a range from about 20 to about 200 nm, wherein the thickness of the nickel oxide/hydroxide active film varies less than about ±1 nm along all codeposited portions thereof; and has physical characteristics of: a charge/discharge rate of greater than about 100 C; and about 97% charge efficiency.

Assignees

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Classifications

  • Nickel accumulators (H01M10/34 takes precedence) · CPC title

  • Batteries in portable systems, e.g. mobile phone, laptop · CPC title

  • Nanosheet or quantum barrier/well, i.e. layer structure having one dimension or thickness of 100 nm or less · CPC title

  • of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy · CPC title

  • of elements or alloys · CPC title

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What does patent US10547046B2 cover?
According to one embodiment, a method includes forming a nickel oxide/hydroxide active film onto a substrate from a solution including a nickelous salt and an electrolyte, where the nickel oxide/hydroxide active film has a physical characteristic of maintaining greater than about 80% charge over greater than 500 charge/discharge cycles, and wherein the nickel oxide/hydroxide active film has a p…
Who is the assignee on this patent?
L Livermore Nat Security Llc
What technology area does this patent fall under?
Primary CPC classification H01M4/0452. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 28 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).