Underlayer composition and method of manufacturing a semiconductor device
US-2024369932-A1 · Nov 7, 2024 · US
US10545404B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10545404-B2 |
| Application number | US-201414897478-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 6, 2014 |
| Priority date | Jun 11, 2013 |
| Publication date | Jan 28, 2020 |
| Grant date | Jan 28, 2020 |
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To provide a production method of a pattern-formed body, which can simply provide a pattern with surface free energy differences. A cured resin layer, to which a pattern of a master (20) has been transferred, is formed on a base (11), by applying a resin composition (12) containing a first compound exhibiting low surface free energy, and a second compound exhibiting surface free energy higher than the surface free energy of the first compound, on the base (11), and curing the resin composition (12) with bringing the resin composition into contact with a master (20), to which a pattern has been formed with surface free energy differences.
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The invention claimed is: 1. A production method of a pattern-formed body, comprising: applying an ultraviolet rays curable resin composition, which contains a polymerizable resin, a radical photopolymerization initiator, a first compound exhibiting low surface free energy, and a second compound exhibiting surface free energy higher than the surface free energy of the first compound, onto a base; and contacting the ultraviolet rays curable resin composition with a master, to which a pattern has been formed with surface free energy differences, the curing the ultraviolet rays curable resin composition by irradiation with ultraviolet rays, to thereby form, on the base, a cured resin layer to which the pattern of the master has been transferred, wherein the master contains a higher surface free energy region which has higher surface free energy than surface free energy of a low surface free energy region, and the low surface free energy region which has lower surface free energy than surface free energy of the higher surface free energy region at the surface thereof, wherein the surface free energy differences is based on the higher surface free energy region and the low surface free energy region, and wherein the higher surface free energy region is a region of glass, metal, or silicon. 2. The production method of a pattern-formed body according to claim 1 , wherein the first compound is a fluororesin-based compound, or a silicone resin-based compound. 3. The production method of a pattern-formed body according to claim 1 , wherein the resin composition is a radical polymerizable resin composition. 4. The production method of a pattern-formed body according to claim 1 , wherein a base of the master is glass. 5. The production method of a pattern-formed body according to claim 1 , wherein a surface of the cured resin layer is smooth. 6. The production method of a pattern-formed body according to claim 1 , further comprising applying an ink composition onto the cured resin layer, and curing the ink composition. 7. A resin composition for transferring surface free energy, comprising: a first compound exhibiting low surface free energy; a second compound exhibiting surface free energy higher than the surface free energy of the first compound; and a photopolymerization initiator, wherein the first compound contains perfluoropolyether-containing acrylate, and wherein the second compound contains hydroxyl group-containing acrylate and the hydroxyl group-containing acrylate contains polyethylene glycol monoacrylate. 8. The production method of a pattern-formed body according to claim 1 , wherein the low surface free energy region is a region of a fluorine coating, or silicone coating. 9. The production method of a pattern-formed body according to claim 1 , wherein the higher surface free energy region is a region of glass or metal. 10. The production method of a pattern-formed body according to claim 1 , wherein the first compound contains perfluoropolyether-containing acrylate. 11. The production method of a pattern-formed body according to claim 1 , wherein the second compound contains hydroxyl group-containing acrylate. 12. The production method of a pattern-formed body according to claim 11 , wherein the hydroxyl group-containing acrylate contains at least one of pentaerythritol triacrylate or polyethylene glycol monoacrylate.
Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title
with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title
Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title
with silicon-containing compounds · CPC title
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