Conductive structure and method for manufacturing same
US-9766652-B2 · Sep 19, 2017 · US
US10528167B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10528167-B2 |
| Application number | US-201615738557-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 14, 2016 |
| Priority date | Jul 14, 2015 |
| Publication date | Jan 7, 2020 |
| Grant date | Jan 7, 2020 |
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The present specification relates to a conductive structure body, a manufacturing method thereof, a touch panel including the same, and a display device including the same.
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The invention claimed is: 1. A conductive structure body comprising: a substrate; a metal layer including copper, which is provided on the substrate; a discoloration preventing layer provided on the metal layer and including copper and nickel; and a light reflection reducing layer provided on the discoloration preventing layer and including at least one of copper oxide, copper nitride, copper oxynitride, aluminum oxide, aluminum nitride, and aluminum oxynitride, wherein a nickel content of the discoloration preventing layer is in the range of 50 at % to 80 at %, wherein a difference between an average reflectance at a wavelength in the range of 380 nm to 780 nm on the surface of the light reflectance reducing layer after a heat-treatment at 150° C. for 24 hours and an average reflectance at the wavelength in the range of 380 nm to 780 nm on the surface of the light reflectance reducing layer before the heat-treatment is 12% or less. 2. The conductive structure body of claim 1 , wherein the nickel content of the discoloration preventing layer is 57 at % to 80 at %. 3. The conductive structure body of claim 1 , wherein a thickness of the discoloration preventing layer is in the range of 10 nm to 30 nm. 4. The conductive structure body of claim 1 , wherein the light reflection reducing layer includes copper oxide, and an oxygen content of the light reflection reducing layer is in the range of 30 at % to 50 at %. 5. The conductive structure body of claim 1 , wherein the thickness of the light reflection reducing layer is in the range of 10 nm to 100 nm. 6. The conductive structure body of claim 1 , wherein the metal layer is a metal pattern layer including a plurality of openings and a conductive line partitioning the plurality of openings. 7. The conductive structure body of claim 6 , wherein a line width of the metal pattern layer is in the range of 0.1 μm to 100 μm. 8. The conductive structure body of claim 6 , wherein a line interval between adjacent conductive lines of the metal pattern layer is in the range of 0.1 μm to 100 μm. 9. The conductive structure body of claim 1 , wherein a transparent conductive layer is further provided between the substrate and the metal layer. 10. The conductive structure body of claim 1 , wherein surface resistance of the conductive structure body is in the range of 0.1 Ω/square to 100 Ω/square. 11. A method for manufacturing a conductive structure body of claim 1 , the method comprising: preparing a substrate; forming a metal layer including copper on the substrate; forming a discoloration preventing layer including copper and nickel on the metal layer; and forming a light reflection reducing layer on the discoloration preventing layer. 12. The method of claim 11 , further comprising: simultaneously patterning the metal layer, the discoloration preventing layer, and the light reflection reducing layer. 13. The method of claim 12 , wherein in the simultaneous patterning, the metal layer, the discoloration preventing layer, and the light reflection reducing layer are batch-etched by using an etchant. 14. A touch panel comprising a conductive structure body of claim 1 . 15. A display device comprising a conductive structure body of claim 1 . 16. A conductive structure body comprising: a substrate; a metal layer including copper, which is provided on the substrate; a discoloration preventing layer provided on the metal layer and including copper and nickel, and a light reflection reducing layer provided on the discoloration preventing layer and including at least one of copper oxide, copper nitride, copper oxynitride, aluminum oxide, aluminum nitride, and aluminum oxynitride, wherein: a nickel content of the discoloration preventing layer is in the range of 50 at % to 80 at %; and a difference between an average reflectance at the wavelength in the range of 380 nm to 780 nm on the surface of the light reflectance reducing layer after a heat-treatment at 150° C. for 24 hours and an average reflectance at the wavelength in the range of 380 nm to 780 nm on the surface of the light reflectance reduction layer before the heat-treatment is 10% or less. 17. A touch panel comprising a conductive structure body of claim 16 . 18. A display device comprising a conductive structure body of claim 16 .
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by capacitive means · CPC title
using a single layer of sensing electrodes · CPC title
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