Film forming apparatus

Patent metadata

Field	Value
Publication number	US-10526704-B2
Application number	US-201514609758-A
Country	US
Kind code	B2
Filing date	Jan 30, 2015
Priority date	Jan 30, 2015
Publication date	Jan 7, 2020
Grant date	Jan 7, 2020

Abstract

A film forming apparatus includes a chamber having a processing space, a stage provided in the processing space and having a substrate placed thereon, a diffusion tube connected to the chamber so that a diffusion space communicating with the processing space is provided right above the stage, and a gas supply tube extending from the outside of the diffusion tube into the diffusion space through a portion of the diffusion tube and having a gas supply orifice in a portion thereof inside of the diffusion space. The gas supply orifice is formed so as to eject a material gas in a direction away from the stage.

First claim

What is claimed is:

1. A film forming apparatus comprising:
a chamber having a processing space;
a stage provided in the processing space and having a substrate placed thereon;
an electrode provided above the stage and having openings formed therein;
an intermediate plate provided above the electrode, having openings formed therein, and formed of an insulating material;
a diffusion tube positioned above the electrode and the intermediate plate and connected to the chamber so that a diffusion space communicating with the processing space is provided right above the stage; and
a gas supply tube extending from the outside of the diffusion tube into the diffusion space through a portion of the diffusion tube and having a gas supply orifice in a portion thereof inside of the diffusion space,
wherein the gas supply orifice is formed so as to eject a material gas in a direction away from the stage, and
the gas supply orifice is provided only at a center of the diffusion space as viewed in plan.

2. The film forming apparatus according to claim 1 , wherein the gas supply orifice is formed so as to eject a gas toward an upper wall surface of the diffusion tube.

3. The film forming apparatus according to claim 1 , wherein the opening area of the gas supply orifice is smaller than the sectional area of a hollow space in the gas supply tube.

4. The film forming apparatus according to claim 1 ,
wherein the apparatus is constructed as a plasma film forming apparatus that applies a voltage between the electrode and the stage.

Assignees

• Asm Ip Holding Bv

Inventors

• Nonaka Yuya
• Ikedo Yozo

Classifications

• C23C16/45578 Primary

  Elongated nozzles, tubes with holes · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title