Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw material

Patent metadata

Field	Value
Publication number	US-10526698-B2
Application number	US-201916277789-A
Country	US
Kind code	B2
Filing date	Feb 15, 2019
Priority date	May 12, 2015
Publication date	Jan 7, 2020
Grant date	Jan 7, 2020

Abstract

The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which a cyclopentadienyl and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, the chemical deposition raw material being represented by the following formula. In the following formula, the first transition metal (M 1 ) and the second transition metal (M 2 ) are mutually different. The number of cyclopentadienyls (L) is 1 or more and 2 or less, and to the cyclopentadienyl is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents R 1 to R 5 . With the chemical deposition raw material of the present invention, a composite metal thin film or a composite metal compound thin film containing plural metals can be formed from a single raw material.

First claim

The invention claimed is:

1. A method for chemical deposition of a composite metal thin film or a composite metal compound thin film, comprising vaporizing a raw material including a heterogeneous polynuclear complex consisting of Ru and Mn as central metals to prepare a raw material gas, and while introducing the raw material gas to a substrate surface, the gas is heated to have both Ru and Mn deposited,
wherein the method uses as a raw material a heterogeneous polynuclear complex as represented by Chemical Formula 1, in which cyclopentadienyl (L) and carbonyl are coordinated to a first transition metal (M 1 ) being a central metal, and carbonyl is coordinated to a second transition metal (M 2 ) being a central metal:

wherein M 1 is Ru, and M 2 is Mn; n is 3 or more and 5 or less; R 1 , R 2 , R 3 , and R 5 are hydrogen;
and R 4 is an alkyl group with a carbon number of 1 or more and 5 or less.

2. The method for chemical deposition according to claim 1 , wherein the total carbon number of all the substituents R 1 to R 5 of the raw material for chemical deposition is 1 or more and 4 or less.

Assignees

• Tanaka Precious Metal Ind
• Tanaka Kikinzoku K K

Inventors

• Harada Ryosuke
• SHIGETOMI Toshiyuki
• Nabeya Shunichi
• Suzuki Kazuharu
• Kumakura Akiko
• Aoyama Tatsutaka
• Sone Takayuki

Classifications

• C07F17/00

  Metallocenes · CPC title

• C07F15/00

  Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table · CPC title

• C23C16/18 Primary

  from metallo-organic compounds · CPC title

• C07F15/0046

  Ruthenium compounds · CPC title

• C07F15/02

  Iron compounds · CPC title