Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter device

Patent metadata

Field	Value
Publication number	US-10525418-B2
Application number	US-201615772931-A
Country	US
Kind code	B2
Filing date	Oct 28, 2016
Priority date	Nov 10, 2015
Publication date	Jan 7, 2020
Grant date	Jan 7, 2020

Abstract

To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane. A purification method for purifying a liquid, which comprises a step in which some or all of the liquid is caused to permeate through a polyimide and/or polyamide imide porous membrane having communicating pores from one side to the other side by means of differential pressure, and wherein the liquid is a silylating agent liquid, a film forming material or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.

First claim

The invention claimed is:

1. A purification method for purifying a silicon compound-containing liquid as an object to be purified, the method comprising:
allowing some or all of the silicon compound-containing liquid to permeate through a polyimide and/or polyamideimide porous membrane having communicating pores from one side to the other side by way of a differential pressure,
wherein the silicon compound-containing liquid comprises a silicon compound capable of producing a silanol group by hydrolysis.

2. The purification method according to claim 1 , wherein the silicon compound-containing liquid is a silylating agent liquid, a film forming material, or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.

3. The purification method according to claim 1 , wherein the object to be purified is a silylating agent liquid,
the silicon compound is a silylating agent represented by the following general formula (1):
(R a1 ) a Si(H) b X 1 4-a-b   (1)

wherein in the formula (1), R a1 each independently represents a monovalent organic group comprising a monovalent hydrocarbon group having 1 to 18 carbon atoms in which some or all of hydrogen atoms may be substituted with a fluorine atom; X 1 each independently represents a monovalent functional group in which an atom bonded to a silicon atom is nitrogen; a is an integer of 1 to 3; b is an integer of 0 to 2; and a total of a and b is 1 to 3.

4. The purification method according to claim 1 , wherein the object to be purified is a film forming material, and
the silicon compound is represented by the following general formula (2):
R a2 4-n2 SiX n2   (2)

wherein in the formula (2), R a2 is a hydrogen atom or a monovalent hydrocarbon group;
X is a group selected from the group consisting of a linear or branched alkoxy group having 1 to 5 carbon atoms, an isocyanate group, and a halogen atom; and
n2 is an integer of 1 to 4.

5. The purification method according to claim 1 , wherein the silicon compound is represented by the following general formula (3):
R a3 4-n3 —Si(NCO) n3   (3)

wherein in the formula (3), R a3 is a hydrogen atom or a monovalent hydrocarbon group, and n3 is 2 to 4.

6. The purification method according to claim 5 , wherein the object to be purified is used for forming a flattened film, an insulating film, a high refractive film, a resin layer for imprinting, or an etching mask.

7. The purification method according to claim 1 , wherein the object to be purified is a diffusing agent composition further comprising a dopant and to be used for diffusing the dopant into a semiconductor substrate.

8. The purification method according to claim 7 , wherein the silicon compound is a compound represented by the following general formula (4):
R a4 4-n4 Si(NCO) n4   (4)

wherein in the formula (4), R a4 is a hydrocarbon group, and n4 is an integer of 3 or 4.

9. The purification method according to claim 1 , wherein some or all of impurities, comprising elements being solid at ordinary temperature temperature, contained in the object to be purified is removed from the object to be purified by the porous membrane.

10. The purification method according to claim 1 , wherein the differential pressure is applied by using at least one selected from the group consisting of a hydraulic pressure, a vacuum, and a positive pressure of inert gas or nonreactive gas.

11. The purification method according to claim 1 , wherein the communicating pores have a structure comprising substantially spherical pores that have an average spherical diameter of 50 to 5000 nm and are mutually connected to one another.

12. The purification method according to claim 11 , wherein the substantially spherical pores further comprise a recess in an inner surface.

13. The purification method according to claim 1 , wherein the communicating pores comprise a communicating pore having a pore diameter of 1 to 200 nm.

14. A method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, wherein the method uses the purification method as defined in claim 1 .

15. A method of forming a flattened film, an insulating film, a high refractive film, a resin layer for imprinting, or an etching mask, which comprises: using the object purified by the purification method according to claim 1 .

16. A method of forming a flattened film, an insulating film, a high refractive film, a resin layer for imprinting, or an etching mask, the method comprising: purifying a silicon compound-containing liquid by the purification method according to claim 1 .

17. A purification method for purifying a silicon compound-containing liquid as an object to be purified, the method comprising:
allowing some or all of the silicon compound-containing liquid to permeate through a filter medium comprising a polyimide and/or polyamideimide porous membrane having communicating pores from one side to the other side by way of a differential pressure,
wherein the silicon compound-containing liquid comprises a silicon compound capable of producing a silanol group by hydrolysis.

18. A purification method for purifying a silicon compound-containing liquid as an object to be purified, the method comprising:
allowing some or all of the silicon compound-containing liquid to permeate through a filter device comprising a polyimide and/or polyamideimide porous membrane having communicating pores from one side to the other side by way of a differential pressure,
wherein the silicon compound-containing liquid comprises a silicon compound capable of producing a silanol group by hydrolysis.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Sawada Yoshihiro
• Sugawara Tsukasa

Classifications

• H10P32/19

  Diffusion sources · CPC title

• H10P32/14

  within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase · CPC title

• C08G73/14

  Polyamide-imides · CPC title

• B01D61/14

  Ultrafiltration; Microfiltration · CPC title

• C07F7/10 Primary

  containing nitrogen {having a Si-N linkage} · CPC title