Pump apparatus and substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-10507484-B2
Application number	US-201715429610-A
Country	US
Kind code	B2
Filing date	Feb 10, 2017
Priority date	Feb 16, 2016
Publication date	Dec 17, 2019
Grant date	Dec 17, 2019

Abstract

Provided is a pump apparatus, having an upstream pump, a filter, and a downstream pump being inserted into a processing liquid flow path in this order. The downstream pump has an inlet higher in level than an outlet of the upstream pump and higher in level than an outlet of the filter. That is, the downstream pump is disposed higher in level than the upstream pump and the filter. Accordingly, this allows a processing liquid to flow upward. Even when air bubbles are generated in the processing liquid, buoyancy causes the air bubbles to move upward in the processing liquid flow path and collect the air bubbles on a downstream side. Consequently, the air bubbles are readily vented from the processing liquid flow path.

First claim

What is claimed is:

1. A pump apparatus for supplying a processing liquid, the pump apparatus comprising:
a filter inserted into a processing liquid flow path through which the processing liquid flows;
an upstream pump disposed upstream of the filter and inserted into the processing liquid flow path;
a downstream pump disposed downstream of the filter and inserted into the processing liquid flow path, the downstream pump having an inlet higher in level than an outlet of the upstream pump and higher in level than an outlet of the filter; and
a return flow path connected between the downstream pump and the upstream pump for returning the processing liquid from a return outlet of the downstream pump to a return inlet of the upstream pump,
the outlet of the upstream pump being disposed higher in level than an inlet of the upstream pump and the return inlet of the upstream pump,
the return inlet of the upstream pump being disposed at the same level as or higher in level than the inlet of the upstream pump,
the return outlet of the downstream pump being disposed higher in level than a supply outlet of the downstream pump.

2. The pump apparatus according to claim 1 , wherein
the processing liquid flow path is connected to the inlet of the downstream pump while extending from the outlet of the filter at least either horizontally or upward without extending downward.

3. The pump apparatus according to claim 1 , wherein
the supply outlet of the downstream pump is connected to the processing liquid flow path, and
the supply outlet is disposed lower in level than an upper end of an intra-pump flow path of the downstream pump.

4. The pump apparatus according to claim 1 , wherein
the filter includes a vent that exhausts air bubbles.

5. The pump apparatus according to claim 1 , wherein
the return outlet is disposed at a level to contact the upper end of the intra-pump flow path of the downstream pump.

6. The pump apparatus according to claim 1 , wherein
an inlet of the filter is disposed higher in level than the outlet of the upstream pump.

7. A substrate treating apparatus for treating a substrate,
the substrate treating apparatus comprising:
a nozzle that dispenses a processing liquid to the substrate; and
a pump apparatus that supplies the processing liquid to the nozzle, wherein
the pump apparatus comprising:
a filter inserted into a processing liquid flow path through which the processing liquid flows;
an upstream pump disposed upstream of the filter and inserted into the processing liquid flow path;
a downstream pump disposed downstream of the filter and inserted into the processing liquid flow path, the downstream pump having an inlet higher in level than an outlet of the upstream pump and higher in level than an outlet of the filter; and
a return flow path connected between the downstream pump and the upstream pump for returning the processing liquid from a return outlet of the downstream pump to a return inlet of the upstream pump,
the outlet of the upstream pump being disposed higher in level than an inlet of the upstream pump and the return inlet of the upstream pump,
the return inlet of the upstream pump being disposed at the same level as or higher in level than the inlet of the upstream pump,
the return outlet of the downstream pump being disposed higher in level than a supply outlet of the downstream pump.

Assignees

• Screen Holdings Co Ltd

Inventors

• Kashiyama Masahito

Classifications

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• B05B15/40 Primary

  Filters located upstream of the spraying outlets · CPC title

• F04B53/06

  Venting · CPC title