Wire grid polarizer, method of manufacturing the same, and display device

US10502881B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10502881-B2
Application numberUS-201615519972-A
CountryUS
Kind codeB2
Filing dateMay 6, 2016
Priority dateFeb 2, 2016
Publication dateDec 10, 2019
Grant dateDec 10, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The present disclosure discloses a wire grid polarizer, a method of manufacturing the same and a display device. The method of manufacturing the wire grid polarizer includes: forming a plurality of cuboid-shaped projections that are arranged at equal intervals and parallel to each other on a surface of a substrate; performing an evaporating operation or a sputtering operation on each projection in a predetermined direction, and forming a metal layer on at least one large side surface of the projection to obtain a wire grid of the wire grid polarizer. The large side surface is the surface of the projection having the largest area, and in a plane which is perpendicular to both the large side surface and the substrate. The predetermined direction is of a preset angle with respect to the height direction of the projection, and the preset angle is less than 90 degrees.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a wire grid polarizer, comprising: forming a plurality of cuboid-shaped projections that are arranged at equal intervals and parallel to each other on a surface of a substrate; performing, in a first predetermined direction, which is formed by rotating counterclockwise by a preset angle from a height direction of a projection, an evaporating operation or a sputtering operation on each projection to form a metal layer on a first side surface and a top surface of the projection; performing, in a second predetermined direction, which is formed by rotating clockwise by the preset angle from the height direction of the projection, the evaporating operation or the sputtering operation on each projection to form the metal layer on a second side surface and the top surface of the projection; and etching completely the metal layer formed on the top surface of the projection by a mask to obtain a wire grid of the wire grid polarizer, wherein the first predetermined direction and a second determination direction is each of a preset angle θ with respect to a height direction of the projection, and the preset angle θ is less than 90 degrees. 2. The method according to claim 1 , wherein the forming a plurality of cuboid-shaped projections that are arranged at equal intervals and parallel to each other comprises: coating a resin layer on the surface of the substrate; embossing the resin layer using a nano-emboss mold and enabling the nano-emboss mold to be in contact with the substrate; and separating the nano-emboss mold from the resin layer and the substrate to obtain the plurality of projections. 3. The method according to claim 2 , wherein the preset angle θ meets the following condition: tan θ≥d/h, where d is a width of a gap between adjacent projections, and h is a height of each projection. 4. The method according to claim 2 , wherein the nano-emboss mold is a SiO 2 emboss mold. 5. The method according to claim 2 , further comprising: solidifying the plurality of projections. 6. The method according to claim 1 , wherein a width of a gap between adjacent wire grids and a width of the projection are identical, a wire width of the wire grid=a thickness of the metal layer=(the width of the gap between adjacent projections—the width of the projection)/2, and a cycle of the wire grid=the width of the gap between the projections/2+the width of the projection/2. 7. The method according to claim 6 , wherein the cycle of the wire grid is greater than or equal to 80 nm and less than or equal to 150 nm. 8. The method according to claim 7 , wherein the cycle of the wire grid is set to be in a range of 80 nm to 100 nm. 9. The method according to claim 1 , wherein a material of the metal layer comprises: aluminum, copper, or iron. 10. A wire grid polarizer manufactured using the method according to claim 1 . 11. A display device, comprising the wire grid polarizer according to claim 10 .

Assignees

Inventors

Classifications

  • Polarisers · CPC title

  • G02B5/3058Primary

    comprising electrically conductive elements, e.g. wire grids, conductive particles · CPC title

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

  • Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • polarizing · CPC title

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What does patent US10502881B2 cover?
The present disclosure discloses a wire grid polarizer, a method of manufacturing the same and a display device. The method of manufacturing the wire grid polarizer includes: forming a plurality of cuboid-shaped projections that are arranged at equal intervals and parallel to each other on a surface of a substrate; performing an evaporating operation or a sputtering operation on each projection…
Who is the assignee on this patent?
Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification G02B5/3058. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 10 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).