Additive deposition system and method

Patent metadata

Field	Value
Publication number	US-10500784-B2
Application number	US-201615001408-A
Country	US
Kind code	B2
Filing date	Jan 20, 2016
Priority date	Jan 20, 2016
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

An additive deposition system and method, the system including generating an aerosol of additive material that is charged and deposited onto a selectively charged substrate. Selectively charging the substrate includes uniformly charging a surface of the substrate, selectively removing charged from the substrate to create charged and neutral regions of the substrate surface. The charged regions of the substrate having a polarity opposite a polarity of the charged aerosol. The charged aerosol of additive material deposited onto the selectively charged portions of the substrate surface due to the potential difference between the charged substrate and charged aerosol. The system and method further including repeating the additive deposition process to create a multi-layer matrix of additive material.

First claim

The invention claimed is:

1. An additive deposition system, comprising:
an aerosol generation apparatus configured to generate an aerosol of additive material;
an aerosol charging apparatus to electrostatically charge the generated aerosol of additive material to a first polarity;
a selective charging apparatus to selectively alter an electrostatic charge of portions of a substrate layer surface;
the charged aerosol of additive material selectively deposited onto the charge altered portions of the substrate by an electrostatic force due to an electrostatic potential between the charged aerosol of additive material and the charge altered portions of the substrate, and
a support material deposition apparatus to deposit support material around the selectively deposited charged aerosol,
wherein the system repeatedly generates the aerosol, charges the aerosol, charges the substrate layer surface, deposits the charged aerosol, and deposits the support material to form a three-dimensional object.

2. The additive deposition system of claim 1 , wherein the aerosol generation apparatus comprises a pair of counter-rotating rollers that stretch filaments of liquid fluidized additive material between diverging surface of the rollers on a downstream side to generate an aerosol.

3. The additive deposition system of claim 1 , wherein the additive material is a polymer.

4. The additive deposition system of claim 1 , wherein the selective charging apparatus selectively alters the electrostatic charge of the portions of the substrate layer surface based on an input from one of a user or a computer program.

5. The additive deposition system of claim 1 , wherein selectively altering the electrostatic charge of the portions of the substrate layer surface includes altering at least one of a polarity or an electrostatic charge density.

6. The additive deposition system of claim 1 , wherein the selective charging apparatus selectively alters the electrostatic charge of the portions of the substrate layer to one of a polarity opposite the first polarity, a polarity similar the first polarity or a substantially neutral state by providing a charge opposite a charge opposite a current charge on the substrate layer.

7. The additive deposition system of claim 1 , wherein the selective charging apparatus is one of an ionographic print head or an ion deposition device.

8. The additive deposition system of claim 1 , including one or more selective charging apparatuses arranged to span a length of the substrate.

9. The additive deposition system of claim 1 , wherein the selective charging apparatus is configured to be translated along at least one axis substantially parallel to the substrate surface layer.

10. The additive deposition system of claim 1 , further including a substrate charging apparatus configured to electrostatically charge the substrate layer surface uniformly with an electrostatic charge having a second polarity.

11. The additive deposition system of claim 10 , wherein the first polarity and second polarity are substantially the same and the selective charging apparatus selectively alters the electrostatic charge of the portions of the substrate surface layer to at least one of a polarity opposite the first and second polarities and a substantially neutral state by providing a charge opposite a polarity of current charge on the substrate layer.

12. The additive deposition system of claim 10 , wherein the first polarity and the second polarity are substantially opposite and the selective charging apparatus selectively alters the electrostatic charge of the substrate surface layer to at least one of a polarity substantially similar the first and a substantially neutral state.

13. The additive deposition system of claim 10 , wherein the substrate charging apparatus is one of a corotron, a scorotron or a coronal discharge device.

14. The additive deposition system of claim 1 , further including an aerosol deposition passage located proximate to the substrate and configured to guide the charged aerosol parallel to the substrate across an opening disposed on the aerosol deposition passage, at least a portion of the charged aerosol directed nearby the opening and deposited onto the charged portions of the substrate surface layer by the electrostatic force.

15. The additive deposition system of claim 14 , further including an air stream configured to carry the generated aerosol of additive material from the aerosol generation apparatus, through the aerosol charging apparatus and the aerosol deposition passage.

16. The additive deposition system of claim 14 , further including an aerosol size selector configured to exclude generated aerosol based on a physical parameter including at least one of the aerosol size and weight.

17. The additive deposition system of claim 16 , having a recycle path through which the excluded generated aerosol is recycled back into the aerosol generation apparatus.

18. The additive deposition system of claim 1 , further including a substrate translation system configured to translate the substrate in at least one of a horizontal plane and a vertical plane.

19. The additive deposition system of claim 18 , further including a doctor blade positioned a distance from the substrate layer surface and configured to level the support material deposited about the deposited additive material.

Assignees

• Palo Alto Res Incorporated
• Palo Alto Res Ct Inc

Inventors

• Johnson David Mathew
• Beck Victor Alfred
• Elrod Scott A
• Biegelsen David K

Classifications

• B29C64/112

  using individual droplets, e.g. from jetting heads · CPC title

• B29C64/30

  Auxiliary operations or equipment · CPC title

• B29C64/245

  Platforms or substrates (support structures intended to be sacrificed after manufacture B29C64/40) · CPC title

• B29C64/209

  Heads; Nozzles · CPC title

• B29K2995/0003

  having particular electrical or magnetic properties, e.g. piezoelectric · CPC title