Submicron particle removal from gas streams

Patent metadata

Field	Value
Publication number	US-10500535-B2
Application number	US-201716300434-A
Country	US
Kind code	B2
Filing date	May 9, 2017
Priority date	May 9, 2016
Publication date	Dec 10, 2019
Grant date	Dec 10, 2019

Abstract

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.

First claim

The invention claimed is:

1. A method for removing submicron particles from a gas stream containing submicron particles said stream being off-gas from urea finishing, the method comprising: contacting the gas stream in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m 3 /h)/(m 3 /h),
whereby the method comprises treatment in two Venturi stages in series, wherein each of said two Venturi stages comprises a horizontally placed Venturi ejector, wherein said Venturi stages are placed above each other, and whereby the two Venturi stages are connected by a scrubbing column.

2. The method of claim 1 , wherein the gas stream is the off-gas from a urea granulator.

3. The method of claim 1 wherein the gas stream is the off-gas from a urea prilling tower.

4. The method of claim 3 wherein the residence time between the first and the downstream second Venturi ejector is at least 0.4 s.

5. The method of claim 4 wherein the residence time between the first and the downstream second Venturi ejector is more than 0.8 s.

6. The method of claim 1 , wherein the gas stream contains a concentration of submicron particles greater than 20 mg/Nm 3 .

7. The method of claim 1 wherein the Venturi ejector comprises a nozzle positioned for spraying scrubbing liquid in a direction parallel with the gas flow through the gas inlet of the Venturi ejector.

8. The method of claim 1 wherein a basic reagent is added selected from the group consisting of: caustic, lime, limestone, hydrated lime, fly ash, magnesium oxide, soda ash, sodium bicarbonate, sodium carbonate, and mixtures thereof.

9. The method of claim 1 wherein an acidic reagent is added selected from the group consisting of: acetic acid, boric acid, carbonic acid, citric acid, hydrochloric acid, hydrofluoric acid, nitric acid, oxalic acid, phosphoric acid, sulfuric acid, and mixtures thereof.

10. The method of claim 9 , wherein the method comprises acid scrubbing and dust scrubbing, both carried out at the top of a natural draft urea prilling tower.

11. The method of claim 1 , further comprising the step of urea prilling in a natural draft urea tower and wherein said Venturi ejector is positioned at the top of said prilling tower, and wherein the static pressure at the exit of at least one Venturi ejector is larger than at the entrance of the Venturi ejector.

12. The method of claim 1 , comprising subsequently:
A) providing a gas stream,
B) spraying an aqueous solution into the gas stream,
C) passing the gas stream through a first ejector Venturi scrubber having a throat, wherein an aqueous scrubbing liquid is sprayed into the gas stream in the direction of the throat,
D) spraying an aqueous solution into the gas stream, and
F) passing the gas stream through a second ejector Venturi scrubber having a throat, wherein an aqueous scrubbing liquid is sprayed into the gas stream in the direction of the throat.

13. A method for removing submicron particles from a gas stream, according to claim 12 , comprising subsequently:
providing a gas stream comprising off-gas from a urea prilling tower,
spraying an aqueous solution comprising 20 wt. % to 55 wt. % urea into the gas stream,
passing the gas stream through a first ejector Venturi scrubber having a throat, wherein an aqueous scrubbing liquid comprising 20 wt. % to 55 wt. % urea is sprayed into the gas stream in the direction of the throat,
spraying an aqueous solution comprising 0 wt. % to 5 wt. % urea into and co-currently with the gas stream,
passing the gas stream through a mist eliminator,
passing the gas stream through a second ejector Venturi scrubber having a throat, wherein an aqueous scrubbing liquid comprising 0 wt. % to 5 wt. % urea is sprayed into the gas stream in the direction of the throat,
spraying an aqueous solution comprising 0 wt. % to 5 wt. % urea into the gas stream, and
passing the gas stream through a mist eliminator.

14. A gas stream treatment system, comprising two Venturi stages in series, wherein each of said Venturi stages comprises a horizontally placed Venturi ejector comprising a converging part, a throat, and a diverging tube part, and a nozzle for spraying into said throat, wherein said Venturi stages are placed above each other, and wherein each Venturi stage comprises a scrubbing liquid recirculation loop comprising a pump for pressurizing and recirculating scrubbing liquid to said nozzle, wherein the Venturi stages have separate recirculation loops, further comprising a sprayer between a first and a downstream second Venturi stage, for spraying an aqueous solution having a higher water concentration than the scrubbing liquid of the first Venturi stage.

15. A urea prilling tower having a gas stream treatment system at the top of the prilling tower, said gas stream treatment system comprising two Venturi stages in series, wherein each of said Venturi stages comprises a horizontally placed Venturi ejector comprising a converging part, a throat, and a diverging tube part, and a nozzle for spraying into said throat, wherein said Venturi stages are placed above each other, and wherein each Venturi stage comprises a scrubbing liquid recirculation loop comprising a pump for pressurizing and recirculating scrubbing liquid to said nozzle, wherein the Venturi stages have separate recirculation loops.

16. A natural draft urea prilling tower, having a gas stream treatment system at the top of the prilling tower, wherein the gas stream treatment system comprises at least two Venturi ejector scrubbers in series.

17. The natural draft urea prilling tower of claim 16 , wherein the gas stream treatment section comprises two Venturi stages in series, wherein each of said Venturi stages comprises a horizontally placed Venturi ejector comprising a converging part, a throat, and a diverging tube part, and a nozzle for spraying into said throat, wherein said Venturi stages are placed above each other, and wherein each Venturi stage comprises a scrubbing liquid recirculation loop comprising a pump for pressurizing and recirculating scrubbing liquid to said nozzle, wherein the Venturi stages have separate recirculation loops.

18. A method of modifying an existing prilling tower, comprising installing a the gas stream treatment system comprising two Venturi stages in series, wherein each of said Venturi stages comprises a horizontally placed Venturi ejector comprising a converging part, a throat, and a diverging tube part, and a nozzle for spraying into said throat, wherein said Venturi stages are placed above each other, and wherein each Venturi stage comprises a scrubbing liquid recirculation loop comprising a pump for pressurizing and recirculating scrubbing liquid to said nozzle, wherein the Venturi stages have separate recirculation loops on top of the prilling tower.

19. The method of claim 18 , wherein the existing prilling tower is a natural draft urea prilling tower.

Assignees

• Stamicarbon

Inventors

• Higgins Brian Sayre
• Tate Iii John Marshall
• YATES Robert Arthur
• Pomerleau Marcel Julien
• HEON Jon Michael
• Dirkx Wilfried Marc Renaat
• Coloma González Juan

Classifications

• B01D2251/50

  Inorganic acids · CPC title

• Y02P20/582

  Recycling of unreacted starting or intermediate materials · CPC title

• B01D2247/106

  using a structured demister, e.g. tortuous channels · CPC title

• B01D2251/602

  Oxides · CPC title

• C05C9/005

  Post-treatment · CPC title