Circuit obfuscation using differing dielectric constants

US10499491B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10499491-B2
Application numberUS-201615364394-A
CountryUS
Kind codeB2
Filing dateNov 30, 2016
Priority dateJul 16, 2008
Publication dateDec 3, 2019
Grant dateDec 3, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An obfuscated radio frequency circuit may be manufactured to include a metallization layer, and a dielectric layer under the metallization layer. The dielectric layer may be made up of a plurality of dielectric substrates having different dielectric constants to obfuscate functions of the circuit.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of manufacturing a radio frequency circuit comprising: determining which functions of the radio frequency circuit are required; forming a plurality of dielectric substrates in a first dielectric layer, each of the plurality of dielectric substrates comprising a same width, having varying dielectric constants; forming a first metallization layer extending over the plurality of dielectric substrates in the first dielectric layer, wherein the dielectric constants of the plurality of dielectric substrates are selected such that the first metallization layer is functionally equivalent to a second metallization layer with varying widths that extends over a second dielectric layer with a constant dielectric constant. 2. The method of claim 1 wherein forming the plurality of dielectric substrates further comprises manufacturing the plurality of dielectric substrates to comprise different lengths. 3. The method of claim 1 wherein forming the plurality of dielectric substrates further comprises manufacturing the plurality of dielectric substrates to comprise a same height, with at least two of the plurality of dielectric substrates comprising different lengths. 4. The method of claim 1 wherein forming the first metallization layer further comprises manufacturing the first metallization layer to have a substantially uniform width along an entire length of the first metallization layer. 5. The method of claim 1 wherein forming the first metallization layer further comprises manufacturing the first metallization layer to have varying width portions along a length of the first metallization layer. 6. The method of claim 5 wherein forming the first metallization layer further comprises manufacturing a plurality of the varying width portions to have varying lengths. 7. The method of claim 1 further comprising manufacturing the radio frequency circuit to comprise at least one of a filter, a matching network, a LC network, a coupler, a hybrid, a power divider, a termination, or an antenna element that include the first metallization layer and the plurality of dielectric substrates.

Assignees

Inventors

Classifications

  • H05K1/024Primary

    Dielectric details, e.g. changing the dielectric material around a transmission line · CPC title

  • Auxiliary devices (coupling devices of the waveguide type H01P5/00) · CPC title

  • in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern · CPC title

  • with regions of different dielectrics in the same layer, e.g. in a printed capacitor for locally changing the dielectric properties · CPC title

  • Inorganic insulating substrates, e.g. ceramic, glass · CPC title

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Frequently asked questions

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What does patent US10499491B2 cover?
An obfuscated radio frequency circuit may be manufactured to include a metallization layer, and a dielectric layer under the metallization layer. The dielectric layer may be made up of a plurality of dielectric substrates having different dielectric constants to obfuscate functions of the circuit.
Who is the assignee on this patent?
Boeing Co
What technology area does this patent fall under?
Primary CPC classification H05K1/024. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).