Distributor plate for an electrochemical cell, and electrochemical cell
US-2024006626-A1 · Jan 4, 2024 · US
US10497945B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10497945-B2 |
| Application number | US-201715583349-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 1, 2017 |
| Priority date | May 2, 2016 |
| Publication date | Dec 3, 2019 |
| Grant date | Dec 3, 2019 |
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A process ( 30 ) for producing a distributor plate ( 1 ) for an electrochemical system, wherein the distributor plate ( 1 ) has at least one metal foil ( 2 ) having a first surface ( 3 ) and a second surface ( 4 ) and the process ( 30 ) has the following process steps: a) pretreatment ( 31 ) of the metal foil ( 2 ); b) mask formation ( 32 ) at least on the first surface ( 3 ) of the pretreated metal foil ( 2 ); c) structure formation ( 33 ) at least on the first surface ( 3 ) of the metal foil ( 2 ) provided with the mask ( 10 ), as a result of which a first fluid distributor structure ( 5 ) is formed; d) mask removal ( 36 ).
Opening claim text (preview).
What is claimed is: 1. A process ( 30 ) for producing a distributor plate ( 1 ) for an electrochemical system, wherein the distributor plate ( 1 ) has at least one metal foil ( 2 ) having a first surface ( 3 ) and a second surface ( 4 ), the process ( 30 ) comprising the following process steps: a) pretreatment ( 31 ) of the metal foil ( 2 ); b) mask formation ( 32 ) at least on the first surface ( 3 ) of the pretreated metal foil ( 2 ); c) structure formation ( 33 ) via electrochemical coating or wet-chemical or electrochemical etching at least on the first surface ( 3 ) of the metal foil ( 2 ) provided with the mask ( 10 ), as a result of which a raised first fluid distributor structure ( 5 ) is formed having a cylindrical or pseudocircular cylindrical shape; and d) mask removal ( 36 ). 2. The process ( 30 ) according to claim 1 , characterized in that a second fluid distributor structure ( 6 ) is formed by the structure formation ( 33 ) on the second surface ( 4 ) of the metal foil ( 2 ). 3. The process ( 30 ) according to claim 1 , characterized in that the pretreatment ( 31 ) of the metal foil includes chemical or electrochemical cleaning or degreasing. 4. The process ( 30 ) according to claim 1 , characterized in that lithography or a prefabricated mask ( 10 ) is used in a band plant ( 20 ) for mask formation ( 32 ). 5. The process ( 30 ) according to claim 1 , characterized in that the structure formation ( 33 ) is effected by electrochemical coating ( 34 ) or wet-chemical or electrochemical etching ( 35 ), with the structure formation ( 33 ) being effected by electrochemical coating ( 34 ) or wet-chemical or electrochemical etching ( 35 ) in the band plant ( 20 ). 6. The process according to claim 1 , further including the step of structure formation via electrochemical coating or wet-chemical or electrochemical etching on the second surface of the metal foil, as a result of which a second fluid distributor structure is formed. 7. The process according to claim 1 , wherein the distributor plate ( 1 ) has a thickness (D) of from 10 μm to 1000 μm. 8. The process according to claim 6 , wherein the distributor plate ( 1 ) has a thickness (D) of from 100 μm to 200 μm, with the first fluid distributor structure ( 5 ) having a height (H) or depth (T) relative to the first surface ( 3 ) of the metal foil ( 2 ) of from 0.1 μm to 100 μm, and with the second fluid distributor structure ( 6 ) having a height (H) or depth (T) relative to the second surface ( 4 ) of the metal foil ( 2 ) of from 0.1 μm to 100 μm. 9. The process according to claim 6 , wherein the distributor plate ( 1 ) has a thickness (D) of from 100 μm to 200 μm, with the first fluid distributor structure ( 5 ) having a height (H) or depth (T) relative to the first surface ( 3 ) of the metal foil ( 2 ) of from 1 μm to 10 μm, and with the second fluid distributor structure ( 6 ) having a height (H) or depth (T) relative to the second surface ( 4 ) of the metal foil ( 2 ) of from 1 μm to 10 μm.
Metals or alloys · CPC title
Pretreatment of metallic surfaces to be electroplated · CPC title
using masking means · CPC title
characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant · CPC title
having heating or cooling means, e.g. heaters or coolant flow channels · CPC title
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