Process for producing a distributor plate for an electrochemical system and distributor plate for an electrochemical system

US10497945B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10497945-B2
Application numberUS-201715583349-A
CountryUS
Kind codeB2
Filing dateMay 1, 2017
Priority dateMay 2, 2016
Publication dateDec 3, 2019
Grant dateDec 3, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A process ( 30 ) for producing a distributor plate ( 1 ) for an electrochemical system, wherein the distributor plate ( 1 ) has at least one metal foil ( 2 ) having a first surface ( 3 ) and a second surface ( 4 ) and the process ( 30 ) has the following process steps: a) pretreatment ( 31 ) of the metal foil ( 2 ); b) mask formation ( 32 ) at least on the first surface ( 3 ) of the pretreated metal foil ( 2 ); c) structure formation ( 33 ) at least on the first surface ( 3 ) of the metal foil ( 2 ) provided with the mask ( 10 ), as a result of which a first fluid distributor structure ( 5 ) is formed; d) mask removal ( 36 ).

First claim

Opening claim text (preview).

What is claimed is: 1. A process ( 30 ) for producing a distributor plate ( 1 ) for an electrochemical system, wherein the distributor plate ( 1 ) has at least one metal foil ( 2 ) having a first surface ( 3 ) and a second surface ( 4 ), the process ( 30 ) comprising the following process steps: a) pretreatment ( 31 ) of the metal foil ( 2 ); b) mask formation ( 32 ) at least on the first surface ( 3 ) of the pretreated metal foil ( 2 ); c) structure formation ( 33 ) via electrochemical coating or wet-chemical or electrochemical etching at least on the first surface ( 3 ) of the metal foil ( 2 ) provided with the mask ( 10 ), as a result of which a raised first fluid distributor structure ( 5 ) is formed having a cylindrical or pseudocircular cylindrical shape; and d) mask removal ( 36 ). 2. The process ( 30 ) according to claim 1 , characterized in that a second fluid distributor structure ( 6 ) is formed by the structure formation ( 33 ) on the second surface ( 4 ) of the metal foil ( 2 ). 3. The process ( 30 ) according to claim 1 , characterized in that the pretreatment ( 31 ) of the metal foil includes chemical or electrochemical cleaning or degreasing. 4. The process ( 30 ) according to claim 1 , characterized in that lithography or a prefabricated mask ( 10 ) is used in a band plant ( 20 ) for mask formation ( 32 ). 5. The process ( 30 ) according to claim 1 , characterized in that the structure formation ( 33 ) is effected by electrochemical coating ( 34 ) or wet-chemical or electrochemical etching ( 35 ), with the structure formation ( 33 ) being effected by electrochemical coating ( 34 ) or wet-chemical or electrochemical etching ( 35 ) in the band plant ( 20 ). 6. The process according to claim 1 , further including the step of structure formation via electrochemical coating or wet-chemical or electrochemical etching on the second surface of the metal foil, as a result of which a second fluid distributor structure is formed. 7. The process according to claim 1 , wherein the distributor plate ( 1 ) has a thickness (D) of from 10 μm to 1000 μm. 8. The process according to claim 6 , wherein the distributor plate ( 1 ) has a thickness (D) of from 100 μm to 200 μm, with the first fluid distributor structure ( 5 ) having a height (H) or depth (T) relative to the first surface ( 3 ) of the metal foil ( 2 ) of from 0.1 μm to 100 μm, and with the second fluid distributor structure ( 6 ) having a height (H) or depth (T) relative to the second surface ( 4 ) of the metal foil ( 2 ) of from 0.1 μm to 100 μm. 9. The process according to claim 6 , wherein the distributor plate ( 1 ) has a thickness (D) of from 100 μm to 200 μm, with the first fluid distributor structure ( 5 ) having a height (H) or depth (T) relative to the first surface ( 3 ) of the metal foil ( 2 ) of from 1 μm to 10 μm, and with the second fluid distributor structure ( 6 ) having a height (H) or depth (T) relative to the second surface ( 4 ) of the metal foil ( 2 ) of from 1 μm to 10 μm.

Assignees

Inventors

Classifications

  • Metals or alloys · CPC title

  • Pretreatment of metallic surfaces to be electroplated · CPC title

  • using masking means · CPC title

  • characterised by the configuration of channels, e.g. by the flow field of the reactant or coolant · CPC title

  • having heating or cooling means, e.g. heaters or coolant flow channels · CPC title

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What does patent US10497945B2 cover?
A process ( 30 ) for producing a distributor plate ( 1 ) for an electrochemical system, wherein the distributor plate ( 1 ) has at least one metal foil ( 2 ) having a first surface ( 3 ) and a second surface ( 4 ) and the process ( 30 ) has the following process steps: a) pretreatment ( 31 ) of the metal foil ( 2 ); b) mask formation ( 32 ) at least on the first surface ( 3 ) of the pret…
Who is the assignee on this patent?
Bosch Gmbh Robert
What technology area does this patent fall under?
Primary CPC classification H01M8/026. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).