Imprint apparatus, method of manufacturing article, information processing apparatus, method of supporting map editing, and storage medium

US10493672B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10493672-B2
Application numberUS-201715632692-A
CountryUS
Kind codeB2
Filing dateJun 26, 2017
Priority dateJun 26, 2017
Publication dateDec 3, 2019
Grant dateDec 3, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter.

First claim

Opening claim text (preview).

What is claimed is: 1. An imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus comprising a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter. 2. The apparatus according to claim 1 , wherein the control unit includes a first display unit configured to display the first map and the second map on the user interface, and a second display unit configured to display the adjustment window on the user interface. 3. The apparatus according to claim 2 , wherein the first display unit superimposes and displays the first map and the second map on the user interface. 4. The apparatus according to claim 1 , further comprising an input unit configured to make a user input the value of the apparatus parameter via the user interface. 5. The apparatus according to claim 1 , wherein the control unit displays the first map so as to allow a user to change a supply position of the imprint material indicated in the first map via the user interface. 6. The apparatus according to claim 5 , wherein when a supply position of the imprint material indicated in the first map is changed, the control unit obtains a value of the apparatus parameter required to supply the imprint material to a supply position after the change, and displays the value of the apparatus parameter in the adjustment window. 7. The apparatus according to claim 1 , wherein the control unit superimposes and displays at least part of a pattern of the mold, the first map, and the second map on the user interface. 8. The apparatus according to claim 7 , wherein at least part of a pattern of the mold includes at least one of a circuit pattern to be formed on the substrate, a mark pattern used for alignment of the mold, and a boundary portion between the circuit pattern and the mark pattern. 9. The apparatus according to claim 1 , wherein the control unit superimposes and displays a region, on the substrate, to which supply of the imprint material is inhibited, the first map, and the second map on the user interface. 10. The apparatus according to claim 1 , wherein the control unit superimposes and displays a grid defining a position on the substrate to which the imprint material is configured to be supplied, the first map, and the second map on the user interface. 11. The apparatus according to claim 1 , further comprising a supply unit including a plurality of discharge outlets for discharging the imprint material onto the substrate and configured to supply the imprint material onto the substrate, wherein the control unit displays supply positions of the imprint material indicated in the first map and the second map on the user interface such that each specific discharge outlet, of the plurality of discharge outlets, from which the imprint material is supplied is identifiable. 12. The apparatus according to claim 11 , wherein the supply unit includes a plurality of dispensers respectively including the plurality of discharge outlets, wherein the control unit displays supply positions of the imprint material indicated in the first map and the second map on the interface such that each dispenser, of the plurality of dispensers, from which the imprint material is supplied is identifiable. 13. The apparatus according to claim 1 , further comprising a plurality of dispensers configured to supply the imprint material onto the substrate, wherein the control unit displays supply positions of the imprint material indicated in the first map and the second map on the interface such that each dispenser, of the plurality of dispensers, from which the imprint material is supplied is identifiable. 14. The apparatus according to claim 1 , wherein the apparatus parameter includes at least one of a position at which supply of the imprint material starts in a shot region on the substrate, a speed of a substrate stage which holds the substrate when the imprint material is supplied onto the substrate, an interval between a forward path and a backward path of the substrate stage when the imprint material is supplied onto the substrate, an interval between a plurality of dispensers which supply the imprint material onto the substrate, an interval between a plurality of discharge outlets which jet the imprint material onto the substrate, and a timing of supplying the imprint material onto the substrate. 15. A method of manufacturing an article, the method comprising: forming a pattern on a substrate by using an imprint apparatus; processing the substrate on which the pattern is formed in the forming; and manufacturing an article from the processed substrate, wherein the imprint apparatus forms a pattern of an imprint material on the substrate by using a mold and includes a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter. 16. An information processing apparatus which generates a user interface provided for an imprint apparatus for forming a pattern of an imprint material onto a substrate by using a mold, the apparatus comprising a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after the change of the value of the apparatus parameter. 17. A method which is used for an imprint apparatus for forming a pattern of an imprint material onto a substrate by using a mold and supports editing of a map indicating a supply position of the imprint material to be supplied onto the substrate, the method comprising: generating a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after the change of the value of the apparatus parameter; and a second step of providing the user interface generated in the generating. 18. A storage medium storing a program for causing an information processing apparatus to execute a method which is used for an imprint apparatus for forming a pattern of an imprint material onto a substrate by using a mold and supports editing of a map indicating a supply position of the imprint material to be supplied onto the substrate, the method comprising: generating a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustmen

Assignees

Inventors

Classifications

  • Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

  • Measuring, controlling or regulating {(for bank adjustment in calendering B29C43/245)} · CPC title

  • for applying liquid or other fluent material to surfaces by single means not covered by groups B05C1/00 - B05C7/00, whether or not also using other means · CPC title

  • Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • Alignment for proximity or contact printer (proximity or contact printers per se G03F7/7035) · CPC title

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What does patent US10493672B2 cover?
The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter whic…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification B29C43/56. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).