System and method for anti-ambipolar heterojunctions from solution-processed semiconductors

Patent metadata

Field	Value
Publication number	US-10491206-B2
Application number	US-201815897739-A
Country	US
Kind code	B2
Filing date	Feb 15, 2018
Priority date	Jan 9, 2015
Publication date	Nov 26, 2019
Grant date	Nov 26, 2019

Abstract

Van der Waals heterojunctions are extended to semiconducting p-type single-walled carbon nanotube (s-SWCNT) and n-type film that can be solution-processed with high spatial uniformity at the wafer scale. The resulting large-area, low-voltage p-n heterojunctions can exhibit anti-ambipolar transfer characteristics with high on/off ratios. The charge transport can be efficiently utilized in analog circuits such as frequency doublers and keying circuits that are widely used, for example, in telecommunication and wireless data transmission technologies.

First claim

We claim:

1. A method, comprising:
depositing a dielectric on a doped silicon wafer followed by solution deposition of an n-type oxide; and
performing photolithography for:
defining a source electrode;
defining n-type channels using oxalic acid;
defining a drain electrode; and
defining p-type nanomaterial channels, where a p-n heterojunction is defined by an overlap of the n-type oxide and the p-type nanomaterial channels.

2. The method of claim 1 , where the p-type nanomaterial channels comprise semiconducting single-walled carbon nanotubes (s-SWCNT).

3. The method of claim 1 , further comprising immersing in N-methyl-2-pyrrolidone to further remove photoresist and other photolithography residues.

4. The method of claim 1 , where the n-type oxide comprises amorphous indium gallium zinc oxide (a-IGZO) thin films.

5. The method of claim 1 , where the source electrode comprises a Mo electrode.

6. The method of claim 1 , where the drain electrode comprises a Ti/Au electrode.

7. The method of claim 1 , where the p-type nanomaterial channels are defined with reactive ion etching (RIE).

8. The method of claim 1 , where the dielectric comprises hafnia.

9. The method of claim 1 , where the dielectric is deposited on a degenerately doped silicon wafer using atomic layer deposition.

10. A method, comprising:
defining an n-type oxide, wherein the n-type oxide is priorly formed by a solution deposition process over a dielectric layer covering a doped silicon wafer;
defining a source electrode connected with the n-type oxide;
defining a p-type nanomaterial;
defining a drain electrode connected with the p-type nanomaterial; and
defining a p-n heterojunction by overlapping the n-type oxide and the p-type nanomaterial.

11. The method of claim 10 , where the gate-tunable p-n heterojunction comprises a p-type semiconducting single-walled carbon nanotube (s-SWCNT) of the p-type nanomaterial and an n-type oxide film of the n-type oxide.

12. The method of claim 11 , where the n-type oxide film is amorphous.

13. The method of claim 11 , where the s-SWCNTs and the n-type oxide film interact via van der Waals bonding.

14. The method of claim 10 , where the gate-tunable p-n heterojunction provides an anti-ambipolar transfer characteristic.

15. The method of claim 10 , further comprising providing a frequency doubler configured with a gate-tunable p-n heterojunction.

16. The method of claim 10 , where the p-type nanomaterial and the n-type oxide comprise at least one solution processed and one vapor deposited.

17. The method of claim 15 , wherein frequency doubling characteristics takes place when the gate-tunable p-n heterojunction is biased at a point of maximum current.

18. The method of claim 17 , wherein charge transport of opposite carrier types in series takes place at the p-n heterojunction.

19. The method of claim 1 , further comprising providing a frequency doubler configured with a gate-tunable p-n heterojunction biased at a point of maximum current.

20. The method of claim 19 , wherein charge transport of opposite carrier types in series takes place at the p-n heterojunction.

Assignees

• Univ Northwestern

Inventors

• Jariwala Deep M
• Sangwan Vinod K
• Xu Weichao
• Kim Hyungil
• Marks Tobin J
• Hersam Mark C

Classifications

• H03K7/06 Primary

  Frequency or rate modulation, i.e. PFM or PRM · CPC title

• H01L29/78693

  Electricity · mapped topic

• H01L51/105

  Electricity · mapped topic

• H01L27/286

  Electricity · mapped topic

• H01L51/0003

  Electricity · mapped topic