Fingerprint recognition device, method for fabricating the same and display device

Patent metadata

Field	Value
Publication number	US-10489628-B2
Application number	US-201715570166-A
Country	US
Kind code	B2
Filing date	May 12, 2017
Priority date	Jul 26, 2016
Publication date	Nov 26, 2019
Grant date	Nov 26, 2019

Abstract

A fingerprint recognition device, a method for fabricating the same, and a display device are disclosed. The first electrically conductive connection member is arranged between the drain of the TFT and photosensitive members, and the photosensitive members are connected with the drain of the TFT through the first electrically conductive connection member. Even when the surface of the drain becomes rough after first vias are formed in the insulating layer, it is the first electrically conductive connection member that is electrically connected with the photosensitive members. The first electrically conductive connection member has a smooth surface. This prevents the effect of formation of first vias in the insulating layer on the optical property of photosensitive members, thus improving performance of the fingerprint recognition device.

First claim

What is claimed is:

1. A fingerprint recognition device, comprising: a base plate, TFTs which are arranged on the base plate, an insulating layer which covers each TFT, and photosensitive members which are arranged above the insulating layer and correspond with each TFT in a one-to-one manner,
wherein the fingerprint recognition device further comprises a first electrically conductive connection member which is arranged between a drain of each TFT and a corresponding photosensitive member, the insulating layer is provided with first vias in a region corresponding with the drain of each TFT, the first vias penetrate the insulating layer, the first electrically conductive connection member is arranged in the first vias, and the photosensitive members are electrically connected with the drain of a corresponding TFT through the first electrically conductive connection member, and
wherein the fingerprint recognition device further comprises reference signal lines which correspond with and are electrically connected with each photosensitive member in a one-to-one manner, and the reference signal lines are arranged in a same layer as the gate of the TFT.

2. The fingerprint recognition device of claim 1 , further comprising a shielding layer which is arranged over the insulating layer and covers an active layer of each TFT, wherein the shielding layer and the first electrically conductive connection member are arranged in a same layer and comprise a same material.

3. The fingerprint recognition device of claim 2 , wherein the TFTs are arranged in a matrix, and the fingerprint recognition device further comprises:
scan lines which correspond with each row of the TFTs in a one-to-one manner and are electrically connected with a gate of each TFT in the corresponding row; and
fingerprint recognition lines which correspond with each column of TFTs in a one-to-one manner and are electrically connected with a source of each TFT in the corresponding column.

4. The fingerprint recognition device of claim 1 , further comprising: an insulating protection layer which covers the photosensitive members and the shielding layer, and a second electrically conductive connection member which is arranged over the insulating protection layer and corresponds with each photosensitive member in a one-to-one manner,
wherein the second electrically conductive connection member is electrically connected with the photosensitive members through second vias which penetrate the insulating protection layer, and the photosensitive members are electrically connected with the reference signal lines through the corresponding second electrically conductive connection member.

5. The fingerprint recognition device of claim 4 , wherein both the source and the drain of the TFT are arranged over the active layer, and a gate insulating layer and the gate are arranged in sequence below the active layer, and
the fingerprint recognition device further comprises a third electrically conductive connection member which is arranged between the reference signal lines and the second electrically conductive connection member, wherein the second electrically conductive connection member is electrically connected with the reference signal lines through the third electrically conductive connection member.

6. The fingerprint recognition device of claim 5 , wherein the third electrically conductive connection member and the shielding layer are arranged in a same layer and comprise a same material, the second electrically conductive connection member is electrically connected with the third electrically conductive connection member through third vias which penetrate the insulating protection layer, and the third electrically conductive connection member is electrically connected with the reference signal lines through fourth vias which penetrate the insulating layer and the gate insulating layer.

7. The fingerprint recognition device of claim 5 , further comprising an etching barrier layer which is arranged between the active layer and the drain of the TFT,
wherein the third electrically conductive connection member comprises a first sub-connection member and a second sub-connection member, the first sub-connection member and the shielding layer are arranged in a same layer and comprise a same material, and the second sub-connection member and the drain of the TFT are arranged in a same layer and comprise a same material, and
wherein the second electrically conductive connection member is electrically connected with the first sub-connection member through third vias which penetrate the insulating protection layer, the first sub-connection member is electrically connected with the second sub-connection member through fifth vias which penetrate the insulating layer, and the second sub-connection member is electrically connected with the reference signal lines through fourth vias which penetrate the etching barrier layer and the gate insulating layer.

8. The fingerprint recognition device of claim 4 , further comprising a fourth electrically conductive connection member which is arranged between the second electrically conductive connection member and the photosensitive members, and which is arranged below the insulating protection layer, wherein the second electrically conductive connection member is electrically connected with the photosensitive members through the fourth electrically conductive connection member.

9. The fingerprint recognition device of claim 8 , wherein the second electrically conductive connection member and the fourth electrically conductive connection member are made from a transparent electrically conductive oxide.

10. A display device, comprising the fingerprint recognition device claim 1 .

11. A method for fabricating a fingerprint recognition device, comprising:
forming a pattern comprising TFTs on a base plate;
forming a pattern comprising an insulating layer which covers each TFT, wherein the insulating layer is provided with first vias in a region corresponding with a drain of each TFT, and the first vias penetrate the insulating layer;
forming a pattern comprising a first electrically conductive connection member in each of the first vias, wherein the first electrically conductive connection member is electrically connected with a drain of the TFT; and
forming a pattern comprising photosensitive members which correspond with each TFT in a one-to-one manner on the insulating layer, wherein the photosensitive members are electrically connected with the drain of corresponding TFT through the first vias,
wherein forming the pattern comprising TFTs on the base plate comprises forming a pattern comprising gates and reference signal lines on the base plate, and the reference signal lines correspond with and are electrically connected with each photosensitive member in a one-to-one manner.

12. The method of claim 11 , wherein forming the pattern comprising the first electrically conductive connection member comprises:
forming a shielding film on the base plate on which the pattern comprising the insulating layer has been formed; and
patterning the shielding film, to forming a pattern comprising a shielding layer in a region where an active layer of each TFT is located and the pattern comprising the first electrically conductive connection member in each of the first vias.

13. The method of claim 12 , wherein the TFTs are arranged in a matrix, and the method further comprises:
forming a pattern comprising scan lines which correspond with each row of the TFTs in a one-to-one manner and are electrically connected with a gate of each TFT in the corresponding row, and a pattern comprising fingerprint

Assignees

• Boe Technology Group Co Ltd

Inventors

• Liu Yingming
• Dong Xue
• Lv Jing
• Wang Haisheng
• Wu Chunwei
• Ding Xiaoliang
• Liao Feng
• Ren Qingrong
• Xu Rui
• Li Changfeng
• Jia Yanan
• Zhao Lijun
• Guo Yuzhen

Classifications

• H01L27/14636

  Electricity · mapped topic

• G06K9/0004 Primary

  Physics · mapped topic

• H01L27/14623

  Electricity · mapped topic

• H01L27/14685

  Electricity · mapped topic

• H01L21/84

  Electricity · mapped topic