Press system and control method for press system

US10486384B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10486384-B2
Application numberUS-201615557509-A
CountryUS
Kind codeB2
Filing dateMar 9, 2016
Priority dateApr 30, 2015
Publication dateNov 26, 2019
Grant dateNov 26, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A press system includes: a detection unit configured to detect a press load applied for pressing a workpiece; a reference waveform generation unit configured to generate a reference waveform for comparison, based on a load waveform of the press load detected by the detection unit; and a determination unit configured to determine whether a press abnormality is present, based on the load waveform of the press load detected by the detection unit and the reference waveform. The press system generates the reference waveform, and therefore, the state of press working can be determined by a simple method.

First claim

Opening claim text (preview).

The invention claimed is: 1. A press system comprising: a press machine including a detection unit configured to detect a press load applied by the press machine to a workpiece; a reference waveform generation unit configured to generate a reference waveform for comparison, based on a load waveform of the press load detected by the detection unit; and a determination unit configured to determine whether a press abnormality is present, based on the load waveform of the press load detected by the detection unit and the reference waveform, wherein the reference waveform generation unit is configured to generate, when the detection unit detects a same load waveform of the press load a plurality of times, the reference waveform based on the same load waveform. 2. The press system according to claim 1 , wherein the detection unit is configured to detect respective press loads at a plurality of locations, the reference waveform generation unit is configured to generate a plurality of reference waveforms for the respective plurality of locations, based on respective load waveforms of the press loads detected at the plurality of locations by the detection unit, and the determination unit is configured to determine whether a press abnormality is present, based on the load waveforms of the press loads detected at the plurality of locations by the detection unit, and the reference waveforms for the respective plurality of locations. 3. The press system according to claim 1 , wherein the reference waveform generation unit is configured to generate, when the detection unit successively detects a same load waveform of the press load a plurality of times, the reference waveform based on the same load waveform. 4. The press system according to claim 1 , further comprising an acceptance unit configured to allow selection of one of a mode for registering the reference waveform in response to an instruction from a user and a mode for generating the reference waveform by the reference waveform generation unit. 5. The press system according to claim 1 , further comprising a count unit configured to count the number of times the press load is applied, based on a result of determination by the determination unit. 6. The press system according to claim 1 , further comprising an abnormality notification unit configured to provide notification of an abnormality based on a result of determination by the determination unit. 7. The press system according to claim 1 , further comprising an abnormality notification unit configured to provide notification of an abnormality when the detection unit detects a different load waveform of a press load a predetermined number of times. 8. The press system according to claim 7 , wherein the predetermined number of times is set to a numerical value larger than the number of stations for dies of the press system. 9. The press system according to claim 1 , wherein the reference waveform generation unit is configured to generate and update, when the detection unit detects a same load waveform of the press load a plurality of times, the reference waveform at predetermined intervals based on the same load waveform. 10. The press system according to claim 9 , further comprising a registration unit configured to store, in a storage unit, the reference waveform generated at the predetermined intervals. 11. A control method for a press system, the control method comprising: detecting a press load applied by a press machine to a workpiece; generating a reference waveform for comparison, based on a load waveform of the detected press load; and determining whether a press abnormality is present, based on the load waveform of the detected press load and the reference waveform, wherein the generating of the reference waveform includes generating the reference waveform when a same load waveform of the press load is detected a plurality of times, based on the same load waveform. 12. A press system comprising: a press machine including a detection unit configured to detect a press load applied by the press machine to a workpiece; a storage unit configured to store a load waveform of the detected press load; a setting unit configured to set a representative load waveform of the press load based on a plurality of load waveforms of press loads stored in a predetermined period; and a display unit configured to indicate the representative load waveform of the press load that is set by the setting unit, wherein the display unit is configured to superimpose and indicate respective representative load waveforms of press loads that are set by the setting unit for respective predetermined periods different from one another in time. 13. The press system according to claim 12 , wherein the representative load waveform of the press load is an average waveform of the plurality of load waveforms of press loads in the predetermined period, and the predetermined period is set to one month. 14. A control method for a press system, the control method comprising: detecting a press load applied by a press machine to a workpiece; storing a load waveform of the detected press load; setting a representative load waveform of the press load based on a plurality of load waveforms of press loads stored in a predetermined period; and indicating the set representative load waveform of the press load, wherein the indicating includes superimposing and indicating respective representative load waveforms of press loads that are set for respective predetermined periods different from one another in time. 15. The control method for a press system according to claim 14 , wherein the representative load waveform of the press load is an average waveform of the plurality of load waveforms of press loads in the predetermined period, and the predetermined period is set to one month.

Assignees

Inventors

Classifications

  • Arrangements for preventing distortion of, or damage to, presses or parts thereof · CPC title

  • Press load monitoring means (B30B15/281 takes precedence) · CPC title

  • electric · CPC title

  • overload limiting devices (in general F16H35/10) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10486384B2 cover?
A press system includes: a detection unit configured to detect a press load applied for pressing a workpiece; a reference waveform generation unit configured to generate a reference waveform for comparison, based on a load waveform of the press load detected by the detection unit; and a determination unit configured to determine whether a press abnormality is present, based on the load waveform…
Who is the assignee on this patent?
Komatsu Ind Corp
What technology area does this patent fall under?
Primary CPC classification B30B15/0094. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).