Laser device and extreme ultraviolet light generation device

Patent metadata

Field	Value
Publication number	US-10481422-B2
Application number	US-201916377412-A
Country	US
Kind code	B2
Filing date	Apr 8, 2019
Priority date	Nov 18, 2016
Publication date	Nov 19, 2019
Grant date	Nov 19, 2019

Abstract

A laser device includes: a plurality of optical shutters (61, 62); a power source device (303n) configured to generate high voltage to be applied to the optical shutters (61, 62); a high-voltage side wire (63h) connecting the power source device (303n) and each of the optical shutters (61, 62); a ground-side wire (63g) grounding each of the optical shutters (61, 62); and a high-voltage side shared wire (64h) and a ground-side shared wire (64g) connecting the optical shutters (61, 62) in parallel. One of the high-voltage side wire (63h) and the ground-side wire (63g) is connected with the optical shutter (61) disposed on the most upstream side in the traveling direction of the laser beam, and the other of the high-voltage side wire (63h) and the ground-side wire (63g) is connected with the optical shutter (62) disposed on the most downstream side in the traveling direction of the laser beam.

First claim

What is claimed is:

1. A laser device, comprising:
a plurality of optical shutters disposed in series with each other on an optical path of a laser beam and configured to open and close in response to application of high voltage;
a power source device configured to generate the high voltage to be applied to the optical shutters;
a high-voltage side wire connecting the power source device and each optical shutter;
a ground-side wire grounding each optical shutter; and
a high-voltage side shared wire and a ground-side shared wire electrically connecting the optical shutters in parallel with each other,
one of the high-voltage side wire and the ground-side wire being connected with an optical shutter disposed on a most upstream side in a traveling direction of the laser beam among the optical shutters, and
another of the high-voltage side wire and the ground-side wire being connected with an optical shutter disposed on a most downstream side in the traveling direction of the laser beam among the optical shutters.

2. The laser device according to claim 1 , further comprising a delay circuit configured to receive a trigger signal instructing application of the high voltage and generate a synchronizing signal instructing the power source device to apply the high voltage a predetermined delay time after the trigger signal.

3. The laser device according to claim 2 , wherein the delay circuit sets the delay time to be a time for correcting variation in timing of the high voltage application due to wiring lengths of the high-voltage side shared wire and the ground-side shared wire.

4. The laser device according to claim 1 , wherein the high-voltage side shared wire and the ground-side shared wire have lengths equal to each other.

5. The laser device according to claim 1 , wherein the optical shutters include at least three optical shutters, and a plurality of the high-voltage side shared wires and a plurality of the ground-side shared wires connecting the optical shutters are provided.

6. The laser device according to claim 5 , wherein the high-voltage side shared wires have lengths equal to each other.

7. The laser device according to claim 5 , wherein the high-voltage side shared wires have such lengths that a timing at which the laser beam is incident on each of the at least three optical shutters coincides with the timing of the high voltage application to the optical shutter on which the laser beam is incident.

8. The laser device according to claim 5 , wherein the ground-side shared wires have lengths equal to each other.

9. The laser device according to claim 1 , wherein the power source device includes a high voltage source, and a switch circuit configured to control application of high voltage generated by the high voltage source to each optical shutter.

10. The laser device according to claim 1 , wherein each optical shutter includes an EO pockels cell.

11. The laser device according to claim 1 , further comprising a master oscillator configured to emit the laser beam, and an amplifier configured to amplify the laser beam emitted by the master oscillator.

12. The laser device according to claim 11 , wherein each optical shutter is disposed on a downstream side of the master oscillator and the amplifier in the traveling direction of the laser beam.

13. The laser device according to claim 11 , comprising a plurality of the amplifiers, wherein
the optical shutters are provided on a downstream side of the respective amplifiers in the traveling direction of the laser beam, so that the optical shutters are provided in a plurality of pairs with the respective amplifiers.

14. The laser device according to claim 1 , wherein
the high-voltage side wire is connected with an optical shutter disposed on the most upstream side in the traveling direction of the laser beam among the optical shutters, and
the ground-side wire is connected with an optical shutter disposed on the most downstream side in the traveling direction of the laser beam among the optical shutters.

15. The laser device according to claim 1 , wherein
the ground-side wire is connected with an optical shutter disposed on the most upstream side in the traveling direction of the laser beam among the optical shutters, and
the high-voltage side wire is connected with an optical shutter disposed on the most downstream side in the traveling direction of the laser beam among the optical shutters.

16. An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a droplet made of a target material with a laser beam, the extreme ultraviolet light generation device comprising the laser device according to claim 1 as a light source configured to emit the laser beam.

Assignees

• Gigaphoton Inc

Inventors

• Niwano Motoki

Classifications

• G02F1/0305 Primary

  Constructional arrangements (G02F1/0327 - G02F1/05 take precedence) · CPC title

• H01S3/10

  Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/006

  Electricity · mapped topic

• H05G2/005

  Electricity · mapped topic