Chemically sharpening blades

US10478984B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10478984-B2
Application numberUS-201715845351-A
CountryUS
Kind codeB2
Filing dateDec 18, 2017
Priority dateMar 2, 2015
Publication dateNov 19, 2019
Grant dateNov 19, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for forming a cutting tool includes masking a metal base with one or more masks, the one or more masks including at least one variable permeability mask, and chemically etching the masked metal base to form a blade of the cutting tool.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a metal base, the method comprising applying a first mask and a second mask to a first side of the metal base to form a first window between the first mask and the second mask; applying a third mask and a fourth mask to a second side of the metal base to form a second window between the third mask and the fourth mask; applying a first variable permeability mask adjacent to the third mask of the second side of the metal base; and chemically etching the metal base at the first window and the second window in a first stage to form a first void on the first side and a second void on the second side. 2. The method of claim 1 , wherein the first variable permeability mask is in contact with the third mask. 3. The method of claim 1 , wherein the first variable permeability mask is continuous with the third mask. 4. The method of claim 1 , further comprising applying a fifth mask to cover the second side of the metal base including the second void. 5. The method of claim 4 , wherein the first void includes a trench which will isolate a residual end of the metal base for removal in the second etching stage. 6. The method of claim 4 , further comprising applying a sixth mask on the first side of the metal base and a second variable permeability mask adjacent to the sixth mask. 7. The method of claim 6 , wherein the second variable permeability mask is located between the sixth mask and the first void. 8. The method of claim 7 , wherein a space between the second variable permeability mask and the first void is larger than the second variable permeability mask. 9. The method of claim 6 , further comprising chemically etching the first void to create a blade surface in the metal base with an inflection point defined by a juncture of a distal convex portion and a proximal concave portion. 10. The method of claim 9 , wherein chemically etching the first void of the metal base removes material from only the first side of the metal base. 11. The method of claim 9 , wherein chemically etching the first void of the metal base includes forming a blade to include two bevels, the two bevels being located on the top and bottom sides of the blade, respectively. 12. The method of claim 1 , wherein chemically etching the metal base removes material from both of the first side and the second side of the metal base.

Assignees

Inventors

Classifications

  • having a special cutting edge section or blade section · CPC title

  • Blades for hand knives · CPC title

  • B26D1/0006Primary

    Cutting members therefor · CPC title

  • characterised by the shape of the cutting edge, e.g. wavy · CPC title

  • Chemical milling · CPC title

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Frequently asked questions

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What does patent US10478984B2 cover?
A method for forming a cutting tool includes masking a metal base with one or more masks, the one or more masks including at least one variable permeability mask, and chemically etching the masked metal base to form a blade of the cutting tool.
Who is the assignee on this patent?
Hutchinson Technology
What technology area does this patent fall under?
Primary CPC classification B26D1/0006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Nov 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).