Interposer substrate and method for manufacturing the same

US10475765B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10475765-B2
Application numberUS-201715817450-A
CountryUS
Kind codeB2
Filing dateNov 20, 2017
Priority dateSep 5, 2017
Publication dateNov 12, 2019
Grant dateNov 12, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The disclosure provides an interposer substrate and a method for manufacturing the same. The method includes forming an insulating protection layer having a phosphorus compound on a substrate body, thereby providing toughness and strength as required when the thickness of the interposer substrate becomes too thin, and preventing substrate warpage when the substrate has a shrinkage stress or structural asymmetries.

First claim

Opening claim text (preview).

What is claimed is: 1. An interposer substrate, comprising: a substrate body having a first surface and a second surface opposite to the first surface and including at least one insulating layer and a wiring portion combined with the insulating layer, the wiring portion including a wiring layer formed on the insulating layer and a plurality of conductive posts disposed in the insulating layer and electrically connected to the wiring layer; and an insulating protection layer formed on the second surface and free from being formed on the first surface of the substrate body and including a phosphorous compound, wherein the insulating protection layer has a coefficient of thermal expansion (CTE) greater than the insulating layer. 2. The interposer substrate of claim 1 , wherein the insulating layer is made of a molding compound or a primer. 3. The interposer substrate of claim 1 , wherein the phosphorous compound contains phosphorous in a range of from 10000 ppm to 30000 ppm. 4. The interposer substrate of claim 1 , wherein the substrate body and the insulating protection layer have a total thickness of less than or equal to 180 μm. 5. A method for manufacturing an interposer substrate, comprising: providing a substrate body having a first surface and a second surface opposite to the first surface and including at least one insulating layer and a wiring portion combined with the insulating layer, the wiring portion including a wiring layer formed on the insulating layer and a plurality of conductive posts disposed in the insulating layer and electrically connected to the wiring layer; and forming on the second surface and free from forming on the first surface of the substrate body an insulating protection layer including a phosphorous compound, wherein the insulating protection layer has a coefficient of thermal expansion (CTE) greater than the insulating layer. 6. The method of claim 5 , wherein the insulating layer is made a molding compound or a primer. 7. The method of claim 5 , wherein the phosphorous compound contains phosphorous in a range of from 10000 ppm to 30000 ppm. 8. The method of claim 5 , wherein the substrate body and the insulating protection layer have a total thickness of less than or equal to 180 μm.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • Encapsulations, e.g. protective coatings · CPC title

  • Die-attach connectors and bond wires · CPC title

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What does patent US10475765B2 cover?
The disclosure provides an interposer substrate and a method for manufacturing the same. The method includes forming an insulating protection layer having a phosphorus compound on a substrate body, thereby providing toughness and strength as required when the thickness of the interposer substrate becomes too thin, and preventing substrate warpage when the substrate has a shrinkage stress or str…
Who is the assignee on this patent?
Phoenix Pioneer Technology Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10W72/0198. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 12 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).