Sensor element for thermal anemometry

US10473683B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10473683-B2
Application numberUS-201715482173-A
CountryUS
Kind codeB2
Filing dateApr 7, 2017
Priority dateApr 19, 2016
Publication dateNov 12, 2019
Grant dateNov 12, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A sensor element for thermal anemometry includes a semiconductor substrate and a thin-film diaphragm attached to the semiconductor substrate and having a front side and a rear side. A resistive heating element and a temperature-dependent resistor are attached to the front side of the thin-film diaphragm. In the area of the rear side of the thin-film diaphragm, the semiconductor substrate has a first recess. A silicon layer including a recess which merges with the first recess of the semiconductor substrate is located between the thin-film diaphragm and the semiconductor substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A sensor element for thermal anemometry, the sensor element comprising: a semiconductor substrate; a film diaphragm attached to the semiconductor substrate; a resistive heating element on a front side of the film diaphragm; a temperature-dependent resistor on the front side of the film diaphragm; a silicon layer between the film diaphragm and the semiconductor substrate, wherein a first recess, which is in the silicon layer, merges with a second recess, which is in the semiconductor substrate at a rear side of the film diaphragm; a first silicon oxide layer between the silicon layer and the semiconductor substrate; and wherein the film diaphragm includes a second silicon oxide layer formed in one piece with the first silicon oxide layer. 2. The sensor element of claim 1 , wherein the first silicon oxide layer coats the silicon layer. 3. The sensor element of claim 1 , wherein the silicon layer is an epitaxial silicon layer. 4. The sensor element of claim 1 , wherein the first silicon oxide layer is on a side of the silicon layer. 5. A sensor element for thermal anemometry, the sensor element comprising: a semiconductor substrate; a film diaphragm attached to the semiconductor substrate; a resistive heating element on a front side of the film diaphragm; a temperature-dependent resistor on the front side of the film diaphragm; a silicon layer between the film diaphragm and the semiconductor substrate, wherein a first recess, which is in the silicon layer, merges with a second recess, which is in the semiconductor substrate at a rear side of the film diaphragm; in an area of the first recess, a first silicon oxide layer coating the silicon layer; and wherein the film diaphragm includes a second silicon oxide layer formed in one piece with the first silicon oxide layer. 6. The sensor element of claim 5 , wherein the first silicon oxide layer is between the silicon layer and the semiconductor substrate. 7. An air mass flow meter comprising: a sensor element for thermal anemometry, the sensor element including: a semiconductor substrate; a film diaphragm attached to the semiconductor substrate; a resistive heating element on a front side of the film diaphragm; a temperature-dependent resistor on the front side of the film diaphragm; a silicon layer between the film diaphragm and the semiconductor substrate, wherein a first recess, which is in the silicon layer, merges with a second recess, which is in the semiconductor substrate at a rear side of the film diaphragm; and a first silicon oxide layer between the silicon layer and the semiconductor substrate; wherein the film diaphragm includes a second silicon oxide layer formed in one piece with the first silicon oxide layer; an activation circuit for electrically heating the film diaphragm using the heating element; and an evaluation circuit for determining a temperature of the film diaphragm using the temperature-dependent resistor. 8. The air mass flow meter of claim 7 , wherein the silicon layer is an epitaxial silicon layer.

Assignees

Inventors

Classifications

  • Thin-film arrangements · CPC title

  • Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function · CPC title

  • Thermal properties · CPC title

  • G01P5/12Primary

    using variation of resistance of a heated conductor · CPC title

  • Temperature sensors · CPC title

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What does patent US10473683B2 cover?
A sensor element for thermal anemometry includes a semiconductor substrate and a thin-film diaphragm attached to the semiconductor substrate and having a front side and a rear side. A resistive heating element and a temperature-dependent resistor are attached to the front side of the thin-film diaphragm. In the area of the rear side of the thin-film diaphragm, the semiconductor substrate has a …
Who is the assignee on this patent?
Bosch Gmbh Robert
What technology area does this patent fall under?
Primary CPC classification G01P5/12. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 12 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).