Gas-barrier multilayer film

Patent metadata

Field	Value
Publication number	US-10457788-B2
Application number	US-201013517196-A
Country	US
Kind code	B2
Filing date	Dec 22, 2010
Priority date	Dec 24, 2009
Publication date	Oct 29, 2019
Grant date	Oct 29, 2019

Abstract

A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).

First claim

The invention claimed is:

1. A gas-barrier multilayer film, wherein
(A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film,
the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin consisting of an ethylene-vinyl alcohol copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from the group consisting of coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 7.0% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c), and
the first inorganic thin film layer (A) and/or the second inorganic thin film layer (D) is a silicon oxide/aluminum oxide two-component inorganic oxide thin film, wherein the content of aluminum oxide is 20% by mass to 75% by mass.

2. The gas-barrier multilayer film according to claim 1 , wherein the inorganic layered compound (b) is smectite.

3. The gas-barrier multilayer film according to claim 1 , wherein the coupling agent is a silane coupling agent having at least one kind of organic functional group.

4. The gas-barrier multilayer film according to claim 1 , wherein the cross-linking agent is a cross-linking agent for a group capable of forming a hydrogen bond.

5. The gas-barrier multilayer film according to claim 1 , wherein the content of the additive (c) is from 0.3% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).

6. The gas-barrier multilayer film according to claim 1 , which has (B) an anchor coating layer between the first inorganic thin film layer (A) and the gas-barrier resin composition layer (C).

7. The gas-barrier multilayer film according to claim 6 , wherein an anchor coating agent composition for forming the anchor coating layer (B) comprises a silane coupling agent having at least one kind of organic functional group.

8. The gas-barrier multilayer film according to claim 7 , wherein the content of the silane coupling agent in the anchor coating agent composition is from 0.1% by mass to 10% by mass based on 100% by mass of the anchor coating agent composition.

9. The gas-barrier multilayer film according to claim 8 , wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

10. The gas-barrier multilayer film according to claim 7 , wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

11. The gas-barrier multilayer film according to claim 6 , wherein two or more repeating units are repeated where a multilayered structure comprising the anchor coating layer (B), the gas-barrier resin composition layer (C) and the second inorganic thin film layer (D) forms each of the units.

12. The gas-barrier multilayer film according to claim 1 , which has a primer coating layer between the plastic film and the first inorganic thin film layer (A).

Assignees

• Tsumagari Yumi
• Takatsu Yoji
• Inagaki Kyoko
• Okawa Takeshi
• Morihara Yoshiharu
• Matsuda Syuusei
• Toyo Boseki

Inventors

• Tsumagari Yumi
• Takatsu Yoji
• Inagaki Kyoko
• Okawa Takeshi
• Morihara Yoshiharu
• Matsuda Syuusei

Classifications

• C08J7/0423

  with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder · CPC title

• C08J2423/08

  Copolymers of ethene (C08J2423/16 takes precedence) · CPC title

• C08J2429/04

  Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids · CPC title

• Y02E10/50

  Photovoltaic [PV] energy · CPC title

• Y10T428/31663

  As siloxane, silicone or silane · CPC title