Cationic silicon (II) compounds and method for the production thereof

US10457696B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10457696-B2
Application numberUS-201616098274-A
CountryUS
Kind codeB2
Filing dateMay 11, 2016
Priority dateMay 11, 2016
Publication dateOct 29, 2019
Grant dateOct 29, 2019

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The invention relates to a method for producing cationic silicon (II) compounds of general formula I (R a Si) + HA −   (I) by reacting the silicon (II) compounds of general formula II (R b− H)(R a Si) +   (II) with a hydride acceptor compound A, wherein R a , (R b− H) and A have the definitions described in claim 1; to the cationic silicon (II) compounds of general formula I and use thereof as catalysts.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing cationic silicon (II) compounds of general formula I, comprising: (R a Si) + HA −   (I) reacting the silicon (II) compounds of general formula II (R b− H)(R a Si) +   (II) with a compound A, where R a is a carbon-containing radical, which may additionally comprise heteroatoms, bound to the cationic silicon atom via a covalent bond, ionic bond or via one or more π bonds with the cationic silicon atom, (R b− H) is a p-bonded singly negatively charged radical of general formula III, R x are monovalent or polyvalent organic radicals, which may also be bonded to one another to form a fused ring, with the proviso that at least one of the radicals R x is an organic radical bonded via carbon bearing at least one hydrogen atom, and A is a compound which, as an electrophile, is capable of accepting electron pairs, wherein said compound has formula MX 3 where M is=B, Al or Ga, and where X is a C6-C20 aryl radical substituted by halogen. 2. The method of claim 1 , wherein the radicals R x are each independently hydrogen, linear or branched, acyclic or cyclic, saturated or mono- or polyunsaturated C1-C20 alkyl or C6-C20 aryl radicals. 3. The method of claim 1 , wherein R a is a p-bonded cyclopentadienyl radical substituted by the radicals R y (R y 5 Cp) wherein R y are monovalent or polyvalent organic radicals, which may be bonded to one another to also form fused rings. 4. The method of claim 1 , wherein said reacting the silicon (II) compounds of general formula II with the compound A is carried out in aprotic solvents selected from the group consisting of hydrocarbons, chlorohydrocarbons, ethers, nitriles, organosilanes and organosiloxanes. 5. A cationic silicon (II) compound of general formula I (R a Si) + HA −   (I) where R a is a carbon-containing radical, which may additionally comprise heteroatoms, bound to the cationic silicon atom via a covalent bond, ionic bond or via one or more p bonds with the cationic silicon atom and A is a compound which, as an electrophile, is capable of accepting electron pairs, having formula MX 3 where M is=B, Al or Ga, and where X is a C6-C20 aryl radical substituted by halogen. 6. The cationic silicon (II) compounds of general formula 1as claimed in claim 5 , wherein said cationic silicon (II) compounds are catalysts.

Assignees

Inventors

Classifications

  • C07F17/00Primary

    Metallocenes · CPC title

  • containing organo-metallic compounds or metal hydrides · CPC title

  • C07F7/0803Primary

    Compounds with Si-C or Si-Si linkages · CPC title

  • Cyclic compounds, e.g. cyclopentadienyls · CPC title

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What does patent US10457696B2 cover?
The invention relates to a method for producing cationic silicon (II) compounds of general formula I (R a Si) + HA −   (I) by reacting the silicon (II) compounds of general formula II (R b− H)(R a Si) +   (II) with a hydride acceptor compound A, wherein R a , (R b− H) and A have the definitions described in claim 1; to the cationic silicon (II) compounds of general formul…
Who is the assignee on this patent?
Wacker Chemie Ag
What technology area does this patent fall under?
Primary CPC classification C07F17/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 29 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).