Hollow silica particles, compositions comprising them and methods for making same
US-9469545-B2 · Oct 18, 2016 · US
Liquid composition for forming silica porous film and silica porous film formed from such liquid composition
US10457561B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10457561-B2 |
| Application number | US-201515124114-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 11, 2015 |
| Priority date | Mar 11, 2014 |
| Publication date | Oct 29, 2019 |
| Grant date | Oct 29, 2019 |
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Abstract
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A liquid composition for forming a silica porous film of the invention is prepared by mixing a hydrolyzate of tetramethoxysilane or tetraethoxysilane as a silicon alkoxide with a silica sol in which fumed silica particles having primary particles having a mean particle diameter of 40 nm or less and secondary particles having a mean particle diameter of 20 nm to 400 nm, that is greater than the mean particle diameter of the primary particles, are dispersed in a liquid medium, in which the mass ratio (A/B) of the SiO2 content (B) of the silica sol to the SiO2 content (A) in the hydrolyzate is in a range of 1/99 to 60/40.
First claim
Opening claim text (preview).
The invention claimed is: 1. A liquid composition for forming a silica porous film, comprising a hydrolyzate of tetramethoxysilane or tetraethoxysilane as a silicon alkoxide, and a silica sol in which fumed silica particles having primary particles having a mean particle diameter of 40 nm or less and secondary particles having a mean particle diameter of 20 nm to 400 nm, that is greater than the mean particle diameter of the primary particles, are dispersed in a liquid medium, wherein a mass ratio (A/B) between a SiO 2 content (A) in the hydrolyzate and a SiO 2 content (B) of the silica sol is in a range of 1/99 to 60/40, the hydrolyzate of tetramethoxysilane or tetraethoxysilane is obtained by a hydrolysis reaction of tetramethoxysilane or tetraethoxysilane in the presence of an acidic catalyst, a SiO 2 concentration of the hydrolyzate is 1% by mass to 20% by mass, and a SiO 2 concentration of the silica sol is 5% by mass to 40% by mass. 2. The liquid composition for forming a silica porous film according to claim 1 , wherein the SiO 2 concentration of the silica sol is 10% by mass to 35% by mass. 3. The liquid composition for forming a silica porous film according to claim 1 , wherein the liquid medium includes a propylene glycol monomethyl ether or a propylene glycol monomethyl ether acetate.
Assignees
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Classifications
by sol-gel transition · CPC title
Coating · CPC title
- C01B33/126Primary
Preparation of silica of undetermined type · CPC title
characterised by specific membranes · CPC title
Silica · CPC title
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- What does patent US10457561B2 cover?
- A liquid composition for forming a silica porous film of the invention is prepared by mixing a hydrolyzate of tetramethoxysilane or tetraethoxysilane as a silicon alkoxide with a silica sol in which fumed silica particles having primary particles having a mean particle diameter of 40 nm or less and secondary particles having a mean particle diameter of 20 nm to 400 nm, that is greater than the …
- Who is the assignee on this patent?
- Mitsubishi Materials Corp
- What technology area does this patent fall under?
- Primary CPC classification C01B33/126. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 29 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).