Auto-focus system

US10455137B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10455137-B2
Application numberUS-201414444607-A
CountryUS
Kind codeB2
Filing dateJul 28, 2014
Priority dateJul 28, 2014
Publication dateOct 22, 2019
Grant dateOct 22, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A distance measuring system is provided for auto focusing a camera of an inspection system for inspecting a planar surface that is patterned. The system includes a pattern generator, an image sensor, an optical element(s) and a processor. The pattern generator projects a spatially random pattern toward the planar surface at an oblique angle. The optical element(s) forms the image of the reflected pattern on the image sensor and the image sensor captures an image of the spatially random pattern reflected off the planar surface. The processor processes the image of the spatially random pattern and provides auto-focus information.

First claim

Opening claim text (preview).

What is claimed is: 1. A distance measuring system for auto focusing a camera of an inspection system for inspecting a planar surface that includes a patterned object, the distance measuring system comprising: a pattern generator that generates a spatially random pattern and projects the spatially random pattern toward the planar surface at an oblique angle; an image sensor that captures an image of the spatially random pattern reflected off the planar surface; at least one optical element that forms the image of the reflected pattern on the image sensor; and a processor that obtains distance information between the image sensor and the planar surface based on at least one of shifting and scaling of at least one feature of the spatially random pattern, and that provides auto-focus information based on the distance information, wherein the pattern generator is configured to project the spatially random pattern such that the shifting or scaling of the projected spatially random pattern captured in the image changes non-linearly in response to different distances between the image sensor and the planar surface, wherein the processor detects the nonlinear changes of the shifting or scaling of the spatially random pattern in the image and determines changes in distance between the image sensor and the planar surface using the nonlinear changes to determine the auto-focus information, and wherein the spatially random pattern is uncorrelated with the pattern of the patterned object. 2. The system according to claim 1 , wherein the pattern generator includes a laser diode that illuminates in a light range that is other than a range used for inspecting the planar surface. 3. The system according to claim 1 , wherein the pattern generator includes an illuminator that provides a coherent light beam and a diffuser for generating the spatially random pattern. 4. The system according to claim 3 , wherein the pattern generator includes at least one lens through which the spatially random pattern is projected and wherein distance between the illuminator with the diffuser and the at least one lens is defined to yield divergence of the rays that are projected onto the planar surface. 5. The system according to claim 1 , wherein the pattern generator includes more than one coherent illumination source, each source generating a unique spatially random pattern. 6. The system according to claim 5 , wherein each coherent illumination source illuminates through a dedicated diffuser. 7. The system according to claim 5 , wherein each illuminator projects at a different angle. 8. The system according to claim 1 , wherein the pattern generator is configured to generate a speckle pattern. 9. The system according to claim 1 , wherein the pattern generator projects the spatially random pattern over an area larger than a field of view of the image sensor. 10. The system according to claim 1 , wherein the at least one optical element is the imaging optics used for capturing images of the planar surface for inspection. 11. The system according to claim 1 , wherein the at least one optical element includes microscope optics and wherein the pattern generator projects the spatially random pattern toward the planar surface through an objective lens of the microscope optics. 12. The system according to claim 1 , wherein the image sensor captures the image of the spatially random pattern in a region of interest mode. 13. The system according to claim 12 , wherein the image sensor switches from capturing the image of the spatially random pattern in a region of interest mode to capturing a second image for inspection of the planar surface in a full frame mode, wherein the image captured in the region of interest mode is smaller than the image captured in the full frame mode. 14. The system according to claim 1 , wherein the pattern generator includes a laser beam source and a holographic mask. 15. The system according to claim 1 , wherein the non-linear changes of the projected spatially random pattern includes non-uniform scaling or non-uniform translation of the spatially random pattern in the image in response to different distances between the image sensor and the planar surface. 16. A distance measuring system for auto focusing a camera of an inspection system for inspecting a planar surface that includes a patterned object, the distance measuring system comprising: a pattern generator that generates a spatially random pattern and projects the spatially random pattern toward the planar surface at an oblique angle; an image sensor that captures an image of the spatially random pattern reflected off the planar surface; at least one optical element that forms the image of the reflected pattern on the image sensor; a processor that processes the image of the spatially random pattern captured by the image sensor and provides auto-focus information based on at least one of shifting and scaling of at least one feature of the spatially-random pattern; and a memory for storing at least one calibration image of the spatially random pattern reflected off the planar surface, wherein the processor performs correlation between the image of the spatially random pattern and the calibration image of the spatially random pattern, wherein the pattern generator is configured to project the spatially random pattern such that the shifting or scaling of the projected spatially random pattern captured in the image changes non-linearly in response to different distances between the image sensor and the planar surface, wherein the processor detects the nonlinear changes of the shifting or scaling of the spatially random pattern in the image and determines changes in distance between the image sensor and the planar surface using the nonlinear changes to determine the auto-focus information, and wherein the spatially random pattern is uncorrelated with the pattern of the patterned object. 17. The system according to claim 16 , wherein the non-linear changes of the projected spatially random pattern includes non-uniform scaling or non-uniform of the spatially random pattern in the image in response to different distances between the image sensor and the planar surface. 18. An auto-focus system for auto focusing a camera of an inspection system with respect to a planar surface having a patterned object for inspection comprises: a pattern generator that generates a spatially random pattern and projects the pattern generated toward a planar surface at an oblique angle; a camera that captures an image of the spatially random pattern reflected off the planar surface; a processor that obtains distance information between the image sensor and the planar surface based on at least one of shifting and scaling of at least one feature of the spatially random pattern, and that provides auto-focus information based on the distance information; an actuator for changing a working distance between the camera and the planar surface; and a controller that controls operation of the actuator in response to the auto-focus information provided by the processor, wherein the pattern generator is configured to project the spatially random pattern such that the shifting or scaling of the projected spatially random pattern captured in the image changes non-linearly in response to different distances between the image sensor and the planar surface, wherein the processor detects the nonlinear changes of the shifting or scaling of the spatially random pattern in the image and determines changes in distance between the image sensor and th

Assignees

Inventors

Classifications

  • using active means, e.g. light emitter {(including both an active and a passive focus detecting device G02B7/285; using ultrasound G02B7/40)} · CPC title

  • Receivers · CPC title

  • Constructional features, e.g. arrangements of optical elements · CPC title

  • controlled by a microcomputer (cameras with interchangeable lenses G03B17/14) · CPC title

  • using multiple transmitters · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10455137B2 cover?
A distance measuring system is provided for auto focusing a camera of an inspection system for inspecting a planar surface that is patterned. The system includes a pattern generator, an image sensor, an optical element(s) and a processor. The pattern generator projects a spatially random pattern toward the planar surface at an oblique angle. The optical element(s) forms the image of the reflect…
Who is the assignee on this patent?
Orbotech Ltd
What technology area does this patent fall under?
Primary CPC classification G01S17/48. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 22 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).