Organoaminosilane precursors and methods for depositing films comprising same

Patent metadata

Field	Value
Publication number	US-10453675-B2
Application number	US-201414483751-A
Country	US
Kind code	B2
Filing date	Sep 11, 2014
Priority date	Sep 20, 2013
Publication date	Oct 22, 2019
Grant date	Oct 22, 2019

Abstract

Described herein are precursors and methods for forming silicon-containing films. In one aspect, the precursor comprises a compound represented by one of following Formulae A through E below:

In one particular embodiment, the organoaminosilane precursors are effective for a low temperature (e.g., 350° C. or less), atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) of a silicon-containing film. In addition, described herein is a composition comprising an organoaminosilane described herein wherein the organoaminosilane is substantially free of at least one selected from the amines, halides (e.g., Cl, F, I, Br), higher molecular weight species, and trace metals.

First claim

The invention claimed is:

1. An organoaminosilane Formula A as below:

wherein R 1 is selected from the group consisting of a linear or branched C 1 to C 10 alkyl group, a linear or branched C 3 to C 10 alkenyl group, a linear or branched C 3 to C 10 alkynyl group, a C 3 to C 10 cyclic alkyl group, and a C 5 to C 10 aryl group; R 2 is selected from the group consisting of hydrogen, a linear or branched C 1 to C 10 alkyl group, a linear or branched C 3 to C 10 alkenyl group, a linear or branched C 3 to C 10 alkynyl group, a C 3 to C 10 cyclic alkyl group, and a C 5 to C 10 aryl group, R 3 is selected from the group consisting of a linear or branched C 1 to C 10 alkylene group, a linear or branched C 3 to C 6 alkenylene group, a linear or branched C 3 to C 6 alkynylene group, a C 3 to C 10 cyclic alkylene group, a C 3 to C 10 hetero-cyclic alkylene group, and a C 5 to C 10 hetero-arylene group; n in Formula A equals 1; m in Formula A equals 0; and wherein R 1 and R 2 may be linked together to form a ring.

2. The organoaminosilane of claim 1 wherein the compound is the compound having Formula A, wherein R 1 and R 2 are the same and selected from the group consisting of methyl, ethyl, iso-propyl, n-propyl, and sec-butyl, and wherein R 3 is selected from the group consisting of methylene and ethylene.

3. An organoaminosilane compound, wherein the compound is at least one selected from the group consisting of: 1 -dimethylamino- 1,3-disilapropane, di-isopropylamino-1,3-disilapropane, 1-di-secbutylamino-1,3-disilane propane, 1-di-isobutylamino-1,3-disilapropane, 1-di-tertpentylamino-1,3-disilapropane, 1-diethylamino- 1 , 3 -disilapropane, 1-dimethylamino-1,4-disilabutane, 1-di-isopropylamino-1,4-disilabutane, 1,3-bis(dimethylamino)-1,3-disilapropane, 1,3-bis(di-isopropylamino)-1,3-disilapropane, 1,3-bis(di-sec-butylamino)-1,3-disilapropane, 1,3-bis(di-isobutylamino-1,3-disilapropane, 1,3-bis(di-tert-pentylamino)-1,3-disilapropane, 1,3-bis(diethylamino)-1,3-disilapropane, 1,4-bis(dimethylamino)-1,4-disilabutane, 1,4-bis(diethylamino)-1,4-disilabutane, 1,4-bis(di-isopropylamino)-1,3-disilabutane, 1,4-bis(di-sec-butylamino)-1,4-disilabutane, 1,4-bis(di-isobutylamino)-1,4-disilabutane, 1,4-bis(iso-propyl-n-propyl-amino)-1,4-disilabutane, 1,3-bis(ethylmethylamino)-1,3-disilabutane, and 1,4-bis(ethylmethylamino)-1,4-disilabutane.

4. An organoaminosilane selected from the group consisting of 1-di-isopropylamino-1,4-disilabutane, 1-ethylmethylamino-1,4-disilabutane, 1-di-sec-butylamino-1,4-disilabutane, 1-phenylmethylamino-1,4-disilabutane, 2,6-dimethylpiperidino-1,4-disilabutane, phenylethylamino-1,4-disilabutane, 1-di-isopropylamino-1,3-disilapropane, 1-ethylmethylamino-1,3-disilapropane, 1-di-sec-butylamino-1,3-disilapropane, 1-phenylmethylamino-1,3-disilapropane, 2,6-dimethylpiperidino-1,3-disilapropane, and phenylethylamino-1,3-disilapropane.

5. An organoaminosilane selected from the group consisting of 1-dimethylamino-1,4-disilabutane, 1-diethylamino-1,4-disilabutane, 1-ethylmethylamino-1,4-disilabutane, 1-di-isopropylamino-1,4-disilabutane, 1-di-sec-butylamino-1,4-disilabutane, 1-phenylmethylamino-1,4-disilabutane, 2,6-dimethylpiperidino-1,4-disilabutane, phenylethylamino-1,4-disilabutane, 1-dimethylamino-1,3-disilapropane, 1-diethylamino-1,3-disilapropane, 1-ethylmethylamino-1,3-disilapropane opylamino-1,3-disilapropane, 1-di-sec-butylamino-1,3-disilapropane, 1-phenylmethylamino-1,3-disilapropane, 2,6-dimethylpiperidino-1,3-disilapropane, and phenylethylamino-1,3-disilapropane.

Assignees

• Versum Mat Us Llc

Inventors

• O'Neill Mark Leonard
• Xiao Manchao
• Lei Xinjian
• Ho Richard
• Chandra Haripin
• Macdonald Matthew R
• Wang Meiliang

Classifications

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/69215

  the material being a silicon oxide, e.g. SiO2 · CPC title

• H10P14/6927

  the material being a silicon oxynitride, e.g. SiON or SiON:H · CPC title

• H10P14/6922

  the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title

• H10P14/6905

  being a silicon carbide or silicon carbonitride and not containing oxygen, e.g. SiC or SiC:H · CPC title