Current-perpendicular-to-plane magneto-resistance effect element
US-2017092307-A1 · Mar 30, 2017 · US
US10453482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10453482-B2 |
| Application number | US-201815988707-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 24, 2018 |
| Priority date | May 26, 2017 |
| Publication date | Oct 22, 2019 |
| Grant date | Oct 22, 2019 |
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A nonmagnetic spacer layer in a magnetoresistive effect element includes a nonmagnetic metal layer that is formed of Ag and at least one of a first insertion layer that is disposed on a bottom surface of the nonmagnetic metal layer and a second insertion layer that is disposed on a top surface of the nonmagnetic metal layer. The first insertion layer and the second insertion layer include an Fe alloy that is expressed by FeγX1-γ. Here, X denotes one or more elements selected from a group consisting of O, Al, Si, Ga, Mo, Ag, and Au, and γ satisfies 0<γ<1.
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What is claimed is: 1. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the spacer layer includes: a nonmagnetic metal layer including Ag, and at least one of a first insertion layer that is disposed on a bottom surface of the nonmagnetic metal layer and a second insertion layer that is disposed on a top surface of the nonmagnetic metal layer, and wherein the first insertion layer and the second insertion layer include an Fe alloy that is expressed by General Formula (1): Fe γ X 1-γ (1), where X denotes one or more elements selected from a group consisting of O, Al, Si, Ga, Mo, Ag, and Au, and γ satisfies 0<γ<1, wherein at least one of the first ferromagnetic layer and the second ferromagnetic layer includes a Heusler alloy that is expressed by General formula (2): Co 2 L α M β (2), where L denotes one or more elements selected from a group consisting of Mn and Fe, M denotes one or more elements selected from a group consisting of Si, Al, Ga, and Ge, 0.7≤α≤1.6 is satisfied, and 0.65≤β≤1.35, and wherein α and β in General formula (2) satisfy 2<α+β≤2.55. 2. The magnetoresistive effect element according to claim 1 , wherein γ in General Formula (1) satisfies 0.6 ≤γ≤0.9. 3. The magnetoresistive effect element according to claim 2 , wherein X in General formula (1) is one or more elements selected from a group consisting of Al, Si, and Ga. 4. The magnetoresistive effect element according to claim 3 , wherein α and β in General formula (2) satisfy: 0.85≤α≤1.55, and 0.75≤β≤1.25. 5. The magnetoresistive effect element according to claim 3 , wherein 1<α. 6. The magnetoresistive effect element according to claim 5 , wherein 0.2 nm≤t 1 ≤10 nm is satisfied where t 1 denotes a thickness of the first insertion layer, and wherein 0.2 nm≤t 2 ≤10 nm is satisfied where t 2 denotes a thickness of the second insertion layer. 7. The magnetoresistive effect element according to claim 1 , wherein α and β in General formula (2) satisfy: 0.85≤α≤1.55, and 0.75≤β≤1.25. 8. The magnetoresistive effect element according to claim 1 , wherein 0.2 nm ≤t 1 ≤10 nm is satisfied where t 1 denotes a thickness of the first insertion layer, and wherein 0.2 nm≤t 2 ≤10 nm is satisfied where t 2 denotes a thickness of the second insertion layer. 9. A magnetic head comprising the magnetoresistive effect element according to claim 1 . 10. A sensor comprising the magnetoresistive effect element according to claim 1 . 11. A high-frequency filter comprising the magnetoresistive effect element according to claim 1 . 12. An oscillator comprising the magnetoresistive effect element according to claim 1 . 13. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the spacer layer includes: a nonmagnetic metal layer including Ag, and at least one of a first insertion layer that is disposed on a bottom surface of the nonmagnetic metal layer and a second insertion layer that is disposed on a top surface of the nonmagnetic metal layer, wherein the first insertion layer and the second insertion layer include an Fe alloy that is expressed by General Formula (1): Fe γ X 1-γ (1), where X denotes one or more elements selected from a group consisting of Al, Ga and Ag, and γ satisfies 0.6 ≤γ≤0.9, wherein the first insertion layer is continued from one side to the other side of the magnetoresistive effect element in a transverse direction of the magnetoresistive effect element, wherein the second insertion layer is continued from one side to the other side of the magnetoresistive effect element in a transverse direction of the magnetoresistive effect element, wherein at least one of the first ferromagnetic layer and the second ferromagnetic layer includes a Heusler alloy that is expressed by General formula (2): Co 2 L α M β (2), where L denotes one or more elements selected from a group consisting of Mn and Fe, M denotes one or more elements selected from a group consisting of Si, Al, Ga, and Ge, 1<α, 0.65≤β≤1.35, and 2≤α+β≤2.6. 14. The magnetoresistive effect element according to claim 13 , wherein 0.2 nm≤t 1 ≤10 nm is satisfied where t 1 denotes a thickness of the first insertion layer, and wherein 0.2 nm≤t 2 ≤10 nm is satisfied where t 2 denotes a thickness of the second insertion layer. 15. A magnetoresistive effect element comprising: a first ferromagnetic layer; a second ferromagnetic layer; and a spacer layer that is disposed between the first ferromagnetic layer and the second ferromagnetic layer, wherein the spacer layer includes: a nonmagnetic metal layer including Ag, and at least one of a first insertion layer that is disposed on a bottom surface of the nonmagnetic metal layer and a second insertion layer that is disposed on a top surface of the nonmagnetic metal layer, wherein the first insertion layer and the second insertion layer include an Fe alloy that is expressed by General Formula (1): Fe γ X 1-γ (1), where X denotes one or more elements selected from a group consisting of Mo and Au, and γ satisfies 0.6≤γ≤0.9, and wherein at least one of the first ferromagnetic layer and the second ferromagnetic layer includes a Heusler alloy that is expressed by General formula (2): Co 2 L α M β (2), where L denotes one or more elements selected from a group consisting of Mn and Fe, M denotes one or more elements selected from a group consisting of Si, Al, Ga, and Ge, 0.7≤α1.6, 0.65≤β≤1.35, and 2<α+β≤2.55. 16. The magnetoresistive effect element according to claim 15 , wherein 1<α. 17. The magnetoresistive effect element according to claim 16 , wherein 0.2 nm≤t 1 ≤10 nm is satisfied where t 1 denotes a thickness of the first insertion layer, and wherein 0.2 nm≤t 2 ≤10 nm is satisfied where t 2 denotes a thickness of the second insertion layer.
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using multilayer structures, e.g. giant magnetoresistance sensors (thin magnetic films H01F10/00) · CPC title
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