Positive/negative phase shift bimetallic zone plate

Patent metadata

Field	Value
Publication number	US-10436722-B2
Application number	US-201415311879-A
Country	US
Kind code	B2
Filing date	May 22, 2014
Priority date	May 22, 2014
Publication date	Oct 8, 2019
Grant date	Oct 8, 2019

Abstract

The invention provides a positive/negative phase shift bimetallic zone plate and production method thereof, wherein the positive/negative phase shift bimetallic zone plate comprises: a first metallic material having a positive phase shift; a second metallic material having a negative phase shift at a working energy point; wherein the first metallic material and the second metallic material are alternately arranged, so that the second metallic material replaces the blank portion in a cycle of a traditional zone plate.

First claim

The invention claimed is:

1. A positive/negative phase shift bimetallic zone plate; comprising:
a first metallic material having a positive phase shift;
a second metallic material having a negative phase shift at a working energy point;
wherein the first metallic material and the second metallic material are alternately arranged, so that the second metallic material replaces the blank portion in a cycle of a traditional zone plate.

2. The positive/negative phase shift bimetallic zone plate of claim 1 , wherein the positive/negative phase shift bimetallic zone plate is annular, and the first metallic material and the second metallic material form a structure of alternate rings.

3. The positive/negative phase shift bimetallic zone plate of claim 1 , the first metallic material is selected from nickel, gold, germanium, titanium, vanadium, chromium, manganese, iron, copper, zinc.

4. The positive/negative phase shift bimetallic zone plate of claim 1 , the second metallic material is selected from titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, hafnium, tungsten, rhenium and osmium.

5. The positive/negative phase shift bimetallic zone plate of claim 1 , wherein in the case that the positive/negative phase shift bimetallic zone plate has the same thickness as that of a normal monometallic phase zone plate, the diffraction efficiency of the positive/negative phase shift bimetallic zone plate is higher than the diffraction efficiency of the normal monometallic phase zone plate in conventional ranges.

6. The positive/negative phase shift bimetallic zone plate of claim 1 , the positive/negative phase shift bimetallic zone plate is a vanadium-nickel, titanium-nickel, or vanadium-gold bimetallic zone plate.

7. A method of producing a positive/negative phase shift bimetallic zone plate, comprising following steps:
a. depositing a thin film of a first metallic material on a substrate;
b. forming a photoresist having a zone plate structure on the thin film of the first metallic material;
c. transferring the zone plate structure to the thin film of the first metallic material by performing etching via the formed photoresist having the zone plate structure, so as to form a zone plate structure of the first metallic material;
d. depositing the second metallic material at interspaces formed by the etching;
e. removing the photoresist, so as to form a positive/negative phase shift bimetallic zone plate structure.

8. The method of claim 7 , wherein the photoresist is coated by spin coating, and thereafter is subjected to electron beam exposure
or interference lithography, so as to form a photoresist having a zone plate structure.

9. The method of claim 7 , wherein the etching in step d is performed by argon ion etching or reactive ion etching.

10. The method of claim 7 , further comprising:
opening a window on the back side of the positive/negative phase shift bimetallic zone plate structure obtained in step e, to obtain the positive/negative phase shift bimetallic zone plate.

Assignees

• Univ Science & Technology China

Inventors

• Gao Kun
• Chen Jian
• Hu Renfang
• Wang Zhili
• Wang Dajiang
• Pan Zhiyun
• Chu Wangsheng
• Wei Shiqiang

Classifications

• G21K1/06

  using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title

• C23F1/00

  Etching metallic material by chemical means (manufacture of printing surfaces B41C; manufacture of printed circuits H05K) · CPC title

• G02B5/18

  Diffraction gratings {(holographic optical elements G02B5/32, G03H; integrally combined with optical fibres G02B6/02057; for coupling light guides G02B6/34; integrally combined with optical integrated light guides G02B6/12; grating systems G02B27/44)} · CPC title

• B05D1/005

  Spin coating · CPC title

• G21K7/00

  Gamma- or X-ray microscopes · CPC title