Laser system and method forming an edge section of a high purity fused silica glass sheet

US10435324B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10435324-B2
Application numberUS-201715678665-A
CountryUS
Kind codeB2
Filing dateAug 16, 2017
Priority dateAug 18, 2016
Publication dateOct 8, 2019
Grant dateOct 8, 2019

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  1. Title

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A system and method for making an edge section of a thin, high purity fused silica glass sheet. The method includes a step of directing a laser to melt through the glass sheet with localized heating of a narrow portion of the glass sheet to form an edge section of the glass sheet, and continuing the edge section to form a closed loop defining a perimeter of the glass sheet. The method further includes rapidly cooling the glass sheet through the glass transition temperature as the melted glass of the edge section contracts and/or solidifies to form an unrefined-bullnose shape extending between first and second major surfaces of the glass sheet.

First claim

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What is claimed is: 1. A high purity fused silica glass sheet comprising: a first major surface; a second major surface opposite the first major surface; an edge section surrounding the first and second major surfaces and defining an outer perimeter of the silica glass sheet; at least 99.9 mole % silica, wherein the silica is at least generally amorphous, having less than 1% crystalline content by weight; and an average thickness between the first major surface and the second major surface of less than 500 μm; wherein the edge section, in cross section, has an unrefined-bullnose shape such that the edge section has a surface that is outwardly rounded between the first and second major surfaces and curvature of the surface of the edge section smoothly transitions, free of sharp edges and/or discontinuities in curvature that extend around the perimeter, between the first and second major surfaces but in neither a geometric circular arc nor with radiused corners directly connected by a straight portion that is orthogonal to the first and second major surfaces; wherein a roughness (Ra) of the first major surface is between 0.025 nm and 1 nm over at least one 0.023 mm 2 area of the first major surface, wherein the roughness (Ra) of the first major surface of the fused glass sheet is between 0.025 nm and 0.5 nm over at least one 0.023 mm 2 area of the first major surface, and the first major surface has a second Ra of between 1 μm and 2 μm as determined using a profilometer and a scan length of 5 mm. 2. A high purity fused silica glass sheet comprising: a first major surface; a second major surface opposite the first major surface; an edge section surrounding the first and second major surfaces and defining an outer perimeter of the silica glass sheet at least 99.9 mole % silica, wherein the silica is at least generally amorphous, having less than 1% crystalline content by weight; and an average thickness between the first major surface and the second major surface of less than 500 μm; wherein the edge section, in cross section, has an unrefined-bullnose shape such that the edge section has a surface that is outwardly rounded between the first and second major surfaces and curvature of the surface of the edge section smoothly transitions, free of sharp edges and/or discontinuities in curvature that extend around the perimeter, between the first and second major surfaces but in neither a geometric circular arc nor with radiused corners directly connected by a straight portion that is orthogonal to the first and second major surfaces; wherein a roughness (Ra) of the first major surface is between 0.025 nm and 1 nm over at least one 0.023 mm 2 area of the first major surface, wherein the first major surface includes a plurality of raised and recessed features each having a length and a width, wherein within at least one 0.023 mm 2 area of the first major surface, the maximum length and the maximum width of the raised features are less than 10 μm. 3. The high purity fused silica glass sheet of claim 2 , wherein a distance between a maximum peak height of the raised features and the maximum depth of the recessed features is between 1 nm and 100 nm within at least one 0.023 mm 2 area of the first major surface. 4. A high purity fused silica glass sheet comprising: a first major surface; a second major surface opposite the first major surface; an edge section surrounding the first and second major surfaces and defining an outer perimeter of the silica glass sheet at least 99.9 mole % silica, wherein the silica is at least generally amorphous, having less than 1% crystalline content by weight; and an average thickness between the first major surface and the second major surface of less than 500 μm; wherein the edge section, in cross section, has an unrefined-bullnose shape such that the edge section has a surface that is outwardly rounded between the first and second major surfaces and curvature of the surface of the edge section smoothly transitions, free of sharp edges and/or discontinuities in curvature that extend around the perimeter, between the first and second major surfaces but in neither a geometric circular arc nor with radiused corners directly connected by a straight portion that is orthogonal to the first and second major surfaces; wherein a roughness (Ra) of the first major surface is between 0.025 nm and 1 nm over at least one 0.023 mm 2 area of the first major surface, wherein the second major surface has a roughness, and the roughness of the second major surface is greater than the roughness of the first major surface. 5. A high purity fused silica glass sheet comprising: a first major surface; a second major surface opposite the first major surface; an edge section comprising an outwardly protruding surface extending between the first and second major surfaces and defining an outer perimeter of the silica glass sheet, wherein the edge section and a centroid of the first major surface differ in fictive temperature from one another by at least 20° C.; at least 99.9 mole % silica, wherein a sodium (Na) content of silica glass sheet is less than 50 ppm; and an average thickness between the first major surface and the second major surface of less than 500 μm. 6. The high purity fused silica glass sheet of claim 5 , wherein the fictive temperature of the edge section is localized, changing more than 10° C. on the first major surface of the sheet 1 mm from the outermost extent of the edge section. 7. The high purity fused silica glass sheet of claim 5 , wherein a roughness (Ra) of the first major surface of the fused glass sheet is between 0.025 nm and 0.5 nm over at least one 0.023 mm 2 area of the first major surface, wherein the sheet is fully sintered and further comprises a plurality of voids located on at least one of the first major surface, the second major surface and an internal area between the first and second major surfaces such that the density of the fully sintered silica glass sheet is greater than 1.8 g/cc and less than 2.203 g/cc, wherein at least some of the voids are on the first major surface forming depressions located on the first major surface. 8. The high purity fused silica glass sheet of claim 7 , wherein the second major surface has a roughness, and the roughness of the second major surface is greater than the roughness of the first major surface. 9. The high purity fused silica glass sheet of claim 5 , wherein the first major surface includes a plurality of raised and recessed features each having a length and a width, wherein within at least one 0.023 mm 2 area of the first major surface, the maximum length and the maximum width of the raised features are less than 10 μm. 10. The high purity fused silica glass sheet of claim 9 , wherein a distance between a maximum peak height of the raised features and the maximum depth of the recessed features is between 1 nm and 100 nm within at least one 0.023 mm 2 area of the first major surface. 11. The high purity fused silica glass sheet of claim 5 , wherein the edge section, in cross section, has an unrefined-bullnose shape such that the surface of the edge section is outwardly rounded between the first and second major surfaces and curvature of the surface of the edge section smoothly transitions, free of sharp edges and/or discontinuities in curvature, between the first and second major surfaces but in neither a geometric circular arc nor with radiused corners directly connected by a straight portion that is orthogonal to the first and second major surfaces. 12. The high purity fused silica glass sheet of claim 11 , wherein the unrefined-bullnose shape is skewed such th

Assignees

Inventors

Classifications

  • Deposition substrates, e.g. targets · CPC title

  • Pure silica glass, e.g. pure fused quartz · CPC title

  • Deposition reactors therefor · CPC title

  • Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering · CPC title

  • Doped silica-based glasses · CPC title

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What does patent US10435324B2 cover?
A system and method for making an edge section of a thin, high purity fused silica glass sheet. The method includes a step of directing a laser to melt through the glass sheet with localized heating of a narrow portion of the glass sheet to form an edge section of the glass sheet, and continuing the edge section to form a closed loop defining a perimeter of the glass sheet. The method further i…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03B19/1453. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 08 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).